Patent CA512689A successfully refreshed from Google Patents.
US5228968A
Expired / Lapsed
US
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Cathode sputtering system with axial gas distribution
Assignee: Balzers und Leybold Deutschland Holding AG
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Filing: 1992-04-02
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Granted: 1993-07-20
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Expires: 2012-04-02
Abstract
Abstract A gas inlet (3), a substrate holder (10) with a substrate (11) and a gas outlet (5) are located on a common axis (4) in the vacuum casing (I) of a cathode sputtering system. This results in a symmetrical flow inside the cathode station (2) and a concentric uniformity of the gas pressure. These conditions result in a particularly even coating of the substrate (11) by means of sputtering.
Inventors
- 👤 Jaroslav Zejda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 11:18
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; H01J37/32449; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3464; G; G11; G11B; G11B5/00; G11B5/84; G11B5/851; H01J37/34
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
80 words
Cathode sputtering system comprising an outer casing which serves as vacuum chamber, said casing having opposed ends, substrate holding means between said ends and having a central axis through said ends, at least one cathode with an associated target located symmetrically with respect to said axis, gas inlet means located symmetrically with respect to said axis at one of said opposite ends, and gas outlet means located symmetrically with respect to said axis at the other of said opposed ends.
Claim 2
Dependent Claim
80 words
Cathode sputtering system comprising an outer casing which serves as vacuum chamber, said casing having opposed ends, substrate holding means between said ends and having a central axis through said ends, at least one cathode with an associated target located symmetrically with respect to said axis, gas inlet means located symmetrically with respect to said axis at one of said opposite ends, and gas outlet means located symmetrically with respect to said axis at the other of said opposed ends.
Claim 3
Dependent Claim
24 words
Cathode sputtering system as in claim 1 comprising two said cathodes with associated targets located, on axially opposite sides of said substrate holding means.
Claim 4
Dependent Claim
36 words
Cathode sputtering system as in claim further comprising a masking located concentric to said axis between each said cathode and said casing, thereby creating an annular outer flow channel between each said masking and said casing.
Claim 5
Dependent Claim
31 words
Cathode sputtering system as in claim 3 wherein each said masking has open axially opposed ends, thereby creating an annular inner flow channel between each said masking and said flow channel.
Claim 6
Dependent Claim
21 words
Cathode sputtering system as in claim 3 wherein said gas inlet means comprises a ring manifold formed integrally with said masking.
Claim 7
Dependent Claim
26 words
Cathode sputtering system as in claim 1 wherein said gas inlet means comprises a bore hole through the center of each cathode and the associated target.
Claim 8
Dependent Claim
28 words
Cathode sputtering system as in claim 1 wherein said casing is cylindrical, said casing having a central axis which coincides with the axis of said substrate holding means.
Claim 9
Dependent Claim
25 words
Cathode sputtering system as in claim 1 wherein said gas inlet means comprises a ring manifold located between each target and said substrate holding means.
Claim 10
Dependent Claim
28 words
Cathode sputtering system as in claim 1 wherein at least one of said inlet means and said outlet means comprises a hole in said casing on said axis.
Claim 11
Dependent Claim
25 words
Cathode sputtering system as in claim 9 wherein both said inlet means and said outlet means comprise a hole in said casing on said axis.
Claim 12
Dependent Claim
18 words
Cathode sputtering system as in claim 1 wherein said casing has a circular cross section between said ends.
Claim 13
Dependent Claim
14 words
Cathode sputtering system as in claim 11 wherein said casing has a cylindrical shape.
References Cited (Backward Citations)
US4006070A
Cited
US4183197A
Cited
US4412906A
Cited
US4572842A
Cited
US4558388A
Cited
US4715319A
Cited
US4946576A
Cited
US4871434A
Cited
US4988422A
Cited
JPS63303061A
Cited
US4931169A
Cited
JPH0310072A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-07-19 | 1997-01-18 | 1997-07-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-07-19 | 2001-01-18 | 2001-07-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-07-19 | 2005-01-18 | 2005-07-20 | $7700.00 | Window Closed / Lapsed |