US4946576A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for the application of thin layers to a substrate
Assignee: Balzers und Leybold Deutschland Holding AG
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Filing: 1989-02-14
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Granted: 1990-08-07
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Expires: 2009-02-14
Abstract
Abstract The invention concerns apparatus for the application of thin layers on a substrate by means of a cathode sputtering process. A mechanical shutter is provided between a cathode to be sputtered and an anode, which shutter divides the space between the cathode and the substrate to be coated. In addition, glow discharge means is provided both between the anode and the shutter.
Inventors
- 👤 Anton Dietrich
- 👤 Klaus Hartig
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 05:02
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/0021; C23C14/0036; C23C14/0047; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; H01J37/3405
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
173 words
A sputtering apparatus for application of thin layers on a substrate comprising: a cathode adapted to be sputtered; a substrate to be coated; an anode having an opening of a first size located adjacent said substrate and forming a first shutter; a second shutter between said cathode and said anode, said second shutter dividing the space between said cathode and said substrate into a first region located between said cathode and said second shutter and a second region located between said anode and said second shutter, wherein only said second region is adapted to receive a reactive gas, said second shutter having an opening of a second size, smaller than said anode opening; first means for generating a first glow discharge located in said first region; second means for generating a second glow discharge located in said second region separated and independent from said first glow discharge by said second shutter; and exhaust means connected to said first region and coupled through said second shutter to said second region for exhausting gases therefrom.
Claim 2
Dependent Claim
173 words
A sputtering apparatus for application of thin layers on a substrate comprising: a cathode adapted to be sputtered; a substrate to be coated; an anode having an opening of a first size located adjacent said substrate and forming a first shutter; a second shutter between said cathode and said anode, said second shutter dividing the space between said cathode and said substrate into a first region located between said cathode and said second shutter and a second region located between said anode and said second shutter, wherein only said second region is adapted to receive a reactive gas, said second shutter having an opening of a second size, smaller than said anode opening; first means for generating a first glow discharge located in said first region; second means for generating a second glow discharge located in said second region separated and independent from said first glow discharge by said second shutter; and exhaust means connected to said first region and coupled through said second shutter to said second region for exhausting gases therefrom.
Claim 3
Dependent Claim
54 words
A sputtering apparatus as set forth in claim 1 including an inlet for the reactive gas comprising a space formed by the anode and the second shutter which is open in the direction of the substrate, the inlet being located so that the second glow discharge is arranged between the inlet and the substrate.
Claim 4
Dependent Claim
44 words
A sputtering apparatus as set forth in claim 1 wherein the cathode is connected to a potential of about -400 volts, the anode is connected to a potential of about +30 to 100 volts and the second shutter is connected to a common ground.
Claim 5
Dependent Claim
56 words
A sputtering apparatus as set forth in claim 1 including a narrow gap defined by a physical space between the first shutter and the substrate whose cross-sectional area is no greater than approximately 20 percent of the cross-sectional area of an opening associated with the exhaust means for exhausting gas from the first and second regions.
Claim 6
Dependent Claim
26 words
A sputtering apparatus as set forth in claim 1 disposed within a housing with other sputtering apparatus and separated from the other sputtering apparatus by plates.
Claim 7
Dependent Claim
24 words
A sputtering apparatus as set forth in claim 5 wherein the plates are arranged perpendicularly to the tangents of a drum supporting the substrate.
Claim 8
Dependent Claim
22 words
A sputtering apparatus as set forth in claim 6 wherein the drum is part of a multi-part conveying device for the substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-08-06 | 1994-02-05 | 1994-08-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-08-06 | 1998-02-05 | 1998-08-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-08-06 | 2002-02-05 | 2002-08-07 | $7700.00 | Window Closed / Lapsed |