US3617459A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Rf sputtering method and apparatus for producing insulating films of varied physical properties
Assignee: International Business Machines Corp
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Filing: 1967-09-15
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Granted: 1971-11-02
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Expires: 1987-09-15
Abstract
Abstract An RF sputtering method wherein the potential of the workpiece relative to the plasma is the sputtering chamber is adjusted to provide a control over the physical characteristics of the resulting sputtered films. The apparatus has an insulated target electrode, an insulated workpiece holder electrode, and a conductive surface in contact with the plasma generated by impressing an RF voltage across the target electrode and workpiece holder electrode. An impedance is provided between the workpiece holder electrode and the conductive surface. The impedance provides a control of the workpiece holder voltage.
Inventors
- 👤 Joseph S Logan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 18:23
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3435; C23C14/345; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
85 words
The apparatus of claim 1 wherein the source of RF power is arranged with a first terminal in electrical contact with said target holder electrode, a second terminal of opposite polarity in electrical contact with said third electrode, and said substrate holder in electrical contact with said second terminal through said impedance means, the resultant apparatus in use adapted to provide a control for the substrate holder voltage magnitude and for the phase angle of the substrate voltage with respect to target holder electrode voltage.
Claim 2
Dependent Claim
24 words
The apparatus of claim 2 further including a means to monitor the DC voltage potential between said workpiece holder electrode and said third electrode.
Claim 3
Dependent Claim
13 words
The apparatus of claim 1 wherein said impedance means includes a variable inductance.
Claim 4
Dependent Claim
13 words
The apparatus of claim 1 wherein said impedance means includes a variable capacitance.
Claim 5
Dependent Claim
21 words
The apparatus of claim 1 wherein said thiRd electrode includes a metal baseplate positioned adjacent and beneath said workpiece holder electrode.
Claim 6
Dependent Claim
16 words
The apparatus of claim 6 wherein said third electrode further includes metal sidewalls of said chamber.
Claim 7
Dependent Claim
18 words
The apparatus of claim 7 wherein said third electrode further includes a metal top plate for said chamber.
Claim 8
Dependent Claim
18 words
The apparatus of claim 8 wherein said third electrode further includes shield means for said workpiece holder electrode.
Claim 9
Dependent Claim
116 words
In a method for sputtering a dielectric material by RF-stimulated glow discharge whereby power from an RF power source is impressed across a target electrode associated with a source of material, and the combination of a substrate holder electrode supporting workpieces to be coated and a conductive surface insulated from said target electrode and substrate holder electrode and in contact with the resultant generated plasma in the environment of the target electrode and substrate holder electrode, the improvement comprising, imposing an impedance between said substrate holder electrode and said conductive surface, adjusting the impedance to vary the substrate holder RF voltage magnitude, and the phase of the substrate holder voltage with respect to the target electrode.
Claim 10
Dependent Claim
24 words
The method of claim 10 wherein net impedance of the imposed impedance and the stray impedance of the apparatus is essentially an inductive reactance.
Claim 11
Dependent Claim
21 words
The method of claim 1 wherein the inversion characteristics of the sputtered film are controlled by DC grounding the substrate holder.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-11-01 | 1975-05-03 | 1975-11-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-11-01 | 1979-05-03 | 1979-11-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-11-01 | 1983-05-03 | 1983-11-02 | $7700.00 | Window Closed / Lapsed |