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US5380622A Expired / Lapsed US ⏱️ 0.0 years remaining

Production of negative relief copies

Assignee: BASF SE
•
Filing: 1991-04-22
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Granted: 1995-01-10
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Expires: 2011-04-22
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Abstract

Abstract Negative relief copies are produced by imagewise exposure of a recording plate consisting of a substrate and a photosensitive layer which is applied thereon and contains, as photosensitive compounds, esters of 1,2-naphthoquinone-2-diazide-4- and/or -5-sulfonic acid or -carboxylic acid, heating of the exposed plate, uniform exposure of the plate and development of the relief copy by dissolving the alkali-soluble components from the recording layer by means of an aqueous alkaline developer, by a process in which the photosensitive layer of the recording plate contains a reaction product of a) from 50 to 99% by weight of an oligomeric or polymeric condensate of a 1 ) from 0.5 to 1 mol of an alkyl- and/or alkoxy-substituted monohydric, dihydric or trihydric hydroxybenzene, a 2 ) from 0 to 0.5 mol of phenol and a 3 ) from 0.5 to 1.5 mol of a C 1 -C 12 -carbonyl compound, the sum of the amounts of a 1 ) and a 2 ) being 1 mol, and b) from 1 to 50% by weight of 1,2-naphthoquinone-2-diazide-4-sulfonic acid or -carboxylic acid or a functional derivative of these acids, where up to 20% by weight of these compounds may be replaced with the corresponding esters of the 5-sulfonic or -carboxylic acid.

Inventors

  • 👤 Joachim Roser

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 23:40
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 250 words
A process for the production of negative copies by imagewise exposure of a recording plate consisting of a substrate and a photosensitive layer which is applied thereon and consists essentially of, as photosensitive compounds, ester of 1,2-naphthoquinone-2-diazide-4-sulfonic acid-4- and -5-sulfonic acid or -4-sulfonic acid and 5-carboxylic acid, polymeric, water-insoluble, resin-like binders which are soluble in aqueous alkaline solutions, and optionally at least one assistant from the group consisting of resins for adjustment to specific developers, monomeric 1,2-naphthoquinone-2-diazide-5-sulfonic esters, dyes and assistants for improving the developability, which comprises heating of the exposed plate, uniform exposure of the plate and development by dissolving the alkali-soluble components from the recording layer by means of an aqueous alkaline developer to form said negative relief copies, wherein said esters are obtained by reacting a) from 50 to 99% by weight of an oligomeric or polymeric condensate of a 1 ) from 0.5 to 1 mol of an alkyl- and/or alkoxy substituted monohydric, dihydric or trihydric hydroxybenzene, a 2 ) from 0 to 0.5 mol of phenol and a 3 ) from 0.5 to 1.5 mol of a C 1 -C 12 -carbonyl compound, the sum of the amounts of a 1 and a 2 being 1 mol, and b) from 1 to 50% by weight of 1,2-naphthoquinone-2-diazide-4-sulfonic acid or -carboxylic acid or a functional derivative of these acids, where up to 20% by weight of said compounds b) is optionally replaced by the corresponding 5-sulfonic or -carboxylic acid or a functional derivative of these acids.
Claim 2
Dependent Claim 250 words
A process for the production of negative copies by imagewise exposure of a recording plate consisting of a substrate and a photosensitive layer which is applied thereon and consists essentially of, as photosensitive compounds, ester of 1,2-naphthoquinone-2-diazide-4-sulfonic acid-4- and -5-sulfonic acid or -4-sulfonic acid and 5-carboxylic acid, polymeric, water-insoluble, resin-like binders which are soluble in aqueous alkaline solutions, and optionally at least one assistant from the group consisting of resins for adjustment to specific developers, monomeric 1,2-naphthoquinone-2-diazide-5-sulfonic esters, dyes and assistants for improving the developability, which comprises heating of the exposed plate, uniform exposure of the plate and development by dissolving the alkali-soluble components from the recording layer by means of an aqueous alkaline developer to form said negative relief copies, wherein said esters are obtained by reacting a) from 50 to 99% by weight of an oligomeric or polymeric condensate of a 1 ) from 0.5 to 1 mol of an alkyl- and/or alkoxy substituted monohydric, dihydric or trihydric hydroxybenzene, a 2 ) from 0 to 0.5 mol of phenol and a 3 ) from 0.5 to 1.5 mol of a C 1 -C 12 -carbonyl compound, the sum of the amounts of a 1 and a 2 being 1 mol, and b) from 1 to 50% by weight of 1,2-naphthoquinone-2-diazide-4-sulfonic acid or -carboxylic acid or a functional derivative of these acids, where up to 20% by weight of said compounds b) is optionally replaced by the corresponding 5-sulfonic or -carboxylic acid or a functional derivative of these acids.
Claim 3
Dependent Claim 16 words
A process as defined in claim 1, wherein component a 1 ) is p-cresol or p-tert-butylphenol.
Claim 4
Dependent Claim 14 words
A process as defined in claim 1, wherein component a 3 ) is formaldehyde.
Claim 5
Dependent Claim 21 words
A process as defined in claim 1, wherein the amount of component a 3 ) is from 0.8 to 1.2 mol.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1998-01-09 1998-07-11 1999-01-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2002-01-09 2002-07-11 2003-01-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2006-01-09 2006-07-11 2007-01-10 $7700.00 Window Closed / Lapsed

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