US4863829A — Positive type high gamma-value photoresist compos…

Claim 1

Independent Claim 160 words

A positive type photoresist composition comprising a mixture of a novolak resin and a photo-sensitive o-quinonediazide compound, wherein said novolak resin is one which is obtained by the addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, said phenol being at least one compound represented by the formula: ##STR4## wherein R is hydrogen, a methyl group of an ethyl group, said compound being such that the average carbon number in the substituent per one nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, and said o-quinonediazide compound and said novolak resin being present in a weight ratio of 1:1 to 1:6, said composition in a photoresist use providing a gamma-value of above about 1.6.

Claim 2

Dependent Claim 160 words

A positive type photoresist composition comprising a mixture of a novolak resin and a photo-sensitive o-quinonediazide compound, wherein said novolak resin is one which is obtained by the addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, said phenol being at least one compound represented by the formula: ##STR4## wherein R is hydrogen, a methyl group of an ethyl group, said compound being such that the average carbon number in the substituent per one nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, and said o-quinonediazide compound and said novolak resin being present in a weight ratio of 1:1 to 1:6, said composition in a photoresist use providing a gamma-value of above about 1.6.

Claim 3

Dependent Claim 182 words

A positive type photoresist composition comprising a mixture of a novolak resin and a photo-sensitive o-quinonediazide compound, wherein said novolak resin is one which is obtained by the partial addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, and by the subsequent addition condensation reaction which is performed at pH 4 or below by using an acid catalyst, said phenol being at least one compound represented by the formula: ##STR5## wherein R is hydrogen, a methyl group of an ethyl group, said compound being such that the average carbon number in the substituent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, and said o-quinonediazide compound and said novolak resin being present in a weight ratio of 1:1 to 1:6, said composition in a photoresist use providing a gamma-value of above about 1.6.

Claim 4

Dependent Claim 182 words

A positive type photoresist composition comprising a mixture of a novolak resin and a photo-sensitive o-quinonediazide compound, wherein said novolak resin is one which is obtained by the partial addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, and by the subsequent addition condensation reaction which is performed at pH 4 or below by using an acid catalyst, said phenol being at least one compound represented by the formula: ##STR5## wherein R is hydrogen, a methyl group of an ethyl group, said compound being such that the average carbon number in the substituent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, and said o-quinonediazide compound and said novolak resin being present in a weight ratio of 1:1 to 1:6, said composition in a photoresist use providing a gamma-value of above about 1.6.

Claim 5

Dependent Claim 24 words

A positive type photoresist composition as recited in claim 1, wherein the phenol is a phenol containing more than 95 mol % of m-cresol.

Claim 6

Dependent Claim 24 words

A positive type photoresist composition as recited in claim 2, wherein the phenol is a phenol containing more than 95 mol % of m-cresol.

Claim 7

Dependent Claim 37 words

A positive type photoresist composition as recited in claim 1, wherein the divalent metal which is more electropositive than hydrogen is selected from the group consisting of Zn, Mn, Cd, Co, Mg, Pb, Ba, Ca, and Sr.

Claim 8

Dependent Claim 34 words

A positive type photoresist composition as recited in claim 1, wherein the divalent metal which is more electropositive than hydrogen is selected from the group consisting of Zn, Mn, Cd, Co, Mg, and Pb.

Claim 9

Dependent Claim 37 words

A positive type photoresist composition as recited in claim 2, wherein the divalent metal which is more electropositive than hydrogen is selected from the group consisting of Zn, Mn, Cd, Co, Mg, Pb, Ba, Ca, and Sr.

Claim 10

Dependent Claim 34 words

A positive type photoresist composition as recited in claim 2, wherein the divalent metal which is more electropositive than hydrogen is selected from the group consisting of Zn, Mn, Cd, Co, Mg, and Pb.

Claim 11

Dependent Claim 32 words

A positive type photoresist composition as recited in claim 1, wherein the organic acid salt of a divalent metal which is more electropositive than hydrogen is an organic acid salt of zinc.

Claim 12

Dependent Claim 32 words

A positive type photoresist composition as recited in claim 2, wherein the organic acid salt of a divalent metal which is more electropositive than hydrogen is an organic acid salt of zinc.

Claim 13

Dependent Claim 25 words

A positive type photoresist composition as recited in claim 1, wherein the organic acid salt is an acetate, a formate, a lactate, or a benzoate.

Claim 14

Dependent Claim 18 words

A positive type photoresist composition as recited in claim 1, wherein the organic acid salt is an acetate.

Claim 15

Dependent Claim 25 words

A positive type photoresist composition as recited in claim 2, wherein the organic acid salt is an acetate, a formate, a lactate, or a benzoate.

Claim 16

Dependent Claim 18 words

A positive type photoresist composition as recited in claim 2, wherein the organic acid salt is an acetate.

Claim 17

Dependent Claim 164 words

A positive type photoresist composition comprising a mixture of a novolak resin and a photo-sensitive o-quinonediazide compound in a weight ratio of from 1:1 to 6:1 and additionally a solvent, an epoxy resin, a plasticizer and a dye, wherein said novolak resin is one which is obtained by the addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, said phenol being at least one compound represented by the formula: ##STR6## wherein R is hydrogen, a methyl group or an ethyl group, said compound being such that the average carbon number in the substituent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, said composition in a photoresist use providing a gamma-value of above about 1.6.

Claim 18

Dependent Claim 164 words

A positive type photoresist composition comprising a mixture of a novolak resin and a photo-sensitive o-quinonediazide compound in a weight ratio of from 1:1 to 6:1 and additionally a solvent, an epoxy resin, a plasticizer and a dye, wherein said novolak resin is one which is obtained by the addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, said phenol being at least one compound represented by the formula: ##STR6## wherein R is hydrogen, a methyl group or an ethyl group, said compound being such that the average carbon number in the substituent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, said composition in a photoresist use providing a gamma-value of above about 1.6.

Claim 19

Dependent Claim 185 words

A positive type photoresist composition comprising a mixture of a novolak resin and a photo-sensitive o-quinonediazide compound in a weight ratio of from 1:1 to 6:1 and additionally a solvent, an epoxy resin, a plasticizer and a dye, wherein said novolak resin is one which is obtained by the partial addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, and by the subsequent addition condensation reaction which is performed at pH 4 or below by using an acid catalyst; said phenol being at least one compound represented by the formula: ##STR7## wherein R is hydrogen, a methyl group or an ethyl group, said compound being such that the average carbon number in the substituent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, said composition in a photoresist use providing a gamma-value of above about 1.6.

Claim 20

Dependent Claim 185 words

A positive type photoresist composition comprising a mixture of a novolak resin and a photo-sensitive o-quinonediazide compound in a weight ratio of from 1:1 to 6:1 and additionally a solvent, an epoxy resin, a plasticizer and a dye, wherein said novolak resin is one which is obtained by the partial addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, and by the subsequent addition condensation reaction which is performed at pH 4 or below by using an acid catalyst; said phenol being at least one compound represented by the formula: ##STR7## wherein R is hydrogen, a methyl group or an ethyl group, said compound being such that the average carbon number in the substituent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, said composition in a photoresist use providing a gamma-value of above about 1.6.

Claim 21

Dependent Claim 38 words

A positive type photoresist composition as recited in claim 15, wherein the photosensitive o-quinonediazide compound is one obtained by condensing naphthoquinonediazidosulfonyl chloride or benzoquinonediazidosulfonyl chloride with a compound having hydroxyl groups in the presence of a weak alkali.

Claim 22

Dependent Claim 38 words

A positive type photoresist composition as recited in claim 16, wherein the photosensitive quinonediazide compound is one obtained by condensing naphthoquinonediazidosulfonyl chloride or benzoquinonediazidosulfonyl chloride with a compound having hydroxyl groups in the presence of a weak alkali.

Claim 23

Dependent Claim 37 words

A positive type photoresist compoistion as recited in claim 15, wherein the epoxy resin is added in an amount of 1 to 20 wt % based on the total weight of the novolak resin and quinonediazide compound.

Claim 24

Dependent Claim 37 words

A positive type photoresist composition as recited in claim 16, wherein the epoxy resin is added in an amount of 1 to 20 wt % based on the total weight of the novolak resin and quinonediazide compound.

Claim 25

Dependent Claim 31 words

A positive type photoresist composition as recited in claim 15, wherein the solvent is ethyl cellosolve acetate, methyl cellosolve acetate, ethyl cellosolve, methyl cellosolve, butyl acetate, methyl isobutyl ketone, or xylene.

Claim 26

Dependent Claim 31 words

A positive type photoresist composition as recited in claim 16, wherein the solvent is ethyl cellosolve acetate, methyl cellosolve acetate, ethyl cellosolve, methyl cellosolve, butyl acetate, methyl isobutyl ketone, or xylene.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	1992-09-04	1993-03-06	1993-09-05	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	1996-09-04	1997-03-06	1997-09-05	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2000-09-04	2001-03-06	2001-09-05	$7700.00	Window Closed / Lapsed

Positive type high gamma-value photoresist composition with novolak resin possessing

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