Patent US6142801A successfully refreshed from Google Patents.
Patent US5378585A successfully refreshed from Google Patents.
US5378585A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Resist composition having a siloxane-bond structure
Assignee: Panasonic Holdings Corp
•
Filing: 1993-10-13
•
Granted: 1995-01-03
•
Expires: 2013-10-13
Abstract
Abstract The present invention provides a composition having sensitivity to light or radiation. The composition comprises a polymer having a siloxane-bond structure which undergoes polymerization reaction when irridiated with light or radiation, and a sensitizing agent. The present invention also provides a process for forming a pattern, preparing a photomask and a semiconductor device by using the composition of the present invention.
Inventors
- 👤 Hisashi Watanabe
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 22:03
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/0758; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/117; Y10S430/126; Y10S430/128
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
137 words
A composition having sensitivity to light or radiation, consisting essentially of: a polymer having a siloxane-bond structure and a sensitizing agent, wherein said polymer having a siloxane-bond structure undergoes a polymerization reaction when irradiated with light or radiation, and has a structure selected from the group of structures represented by the following general formula I: ##STR3## wherein R 1 , R 2 , R 3 , and R 4 are independently a hydrogen atom, a hydroxyl group, a lower alkyl group having 1 to 5 carbon atoms, a lower alkoxyl group having 1 to 5 carbon atoms, or a trialkylsilyl group; at least one group selected from the group consisting of R 3 and R 4 is a lower alkoxyl group having 1 to 5 carbon atoms; and n 1 is an integer of 1 or more.
Claim 2
Dependent Claim
137 words
A composition having sensitivity to light or radiation, consisting essentially of: a polymer having a siloxane-bond structure and a sensitizing agent, wherein said polymer having a siloxane-bond structure undergoes a polymerization reaction when irradiated with light or radiation, and has a structure selected from the group of structures represented by the following general formula I: ##STR3## wherein R 1 , R 2 , R 3 , and R 4 are independently a hydrogen atom, a hydroxyl group, a lower alkyl group having 1 to 5 carbon atoms, a lower alkoxyl group having 1 to 5 carbon atoms, or a trialkylsilyl group; at least one group selected from the group consisting of R 3 and R 4 is a lower alkoxyl group having 1 to 5 carbon atoms; and n 1 is an integer of 1 or more.
Claim 3
Dependent Claim
19 words
A composition having sensitivity to light or radiation according to claim 1, wherein said lower alkoxyl group is saturated.
Claim 4
Dependent Claim
149 words
A composition having sensitivity to light or radiation consisting essentially of: a polymer having a siloxane-bond structure and a sensitizing agent, wherein said polymer having a siloxane-bond structure undergoes a polymerization reaction when irradiated with light or radiation, and has a structure selected from the group of structures represented by the following general formula II: ##STR4## wherein R 5 , R 6 , R 7 , R 8 , R 9 and R 10 are independently a hydrogen atom, a hydroxyl group, a lower alkyl group having 1 to 5 carbon atoms, a lower alkoxyl group having 1 to 5 carbon atoms, or a trialkylsilyl group; at least one group selected from the group consisting of R 7 , R 8 , R 9 , and R 10 is a lower alkoxyl group having 1 to 5 carbon atoms; and n 2 is an integer of 1 or more.
Claim 5
Dependent Claim
149 words
A composition having sensitivity to light or radiation consisting essentially of: a polymer having a siloxane-bond structure and a sensitizing agent, wherein said polymer having a siloxane-bond structure undergoes a polymerization reaction when irradiated with light or radiation, and has a structure selected from the group of structures represented by the following general formula II: ##STR4## wherein R 5 , R 6 , R 7 , R 8 , R 9 and R 10 are independently a hydrogen atom, a hydroxyl group, a lower alkyl group having 1 to 5 carbon atoms, a lower alkoxyl group having 1 to 5 carbon atoms, or a trialkylsilyl group; at least one group selected from the group consisting of R 7 , R 8 , R 9 , and R 10 is a lower alkoxyl group having 1 to 5 carbon atoms; and n 2 is an integer of 1 or more.
Claim 6
Dependent Claim
39 words
A composition having sensitivity to light or radiation according to claim 3, wherein at least one group selected from the group consisting of R 5 and R 6 is a lower alkoxyl group having 1 to 5 carbon atoms.
Claim 7
Dependent Claim
19 words
A composition having sensitivity to light or radiation according to claim 3, wherein said lower alkoxyl group is saturated.
Claim 8
Dependent Claim
169 words
A composition having sensitivity to light or radiation consisting essentially of: a polymer having a siloxane-bond structure and a sensitizing agent, wherein said polymer having a siloxane-bond structure undergoes a polymerization reaction when irradiated with light or radiation, and has a structure selected from the group of structures represented by the following general formula III: ##STR5## wherein R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , and R 18 are independently a hydrogen atom, a hydroxyl group, a lower alkyl group having 1 to 5 carbon atoms, a lower alkoxyl group having 1 to 5 carbon atoms, or a trialkylsilyl group; at least one group selected from the group consisting of R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 and R 18 is a lower alkoxyl group having 1 to 5 carbon atoms; and n 3 and m are independently integers of 1 or more.
Claim 9
Dependent Claim
169 words
A composition having sensitivity to light or radiation consisting essentially of: a polymer having a siloxane-bond structure and a sensitizing agent, wherein said polymer having a siloxane-bond structure undergoes a polymerization reaction when irradiated with light or radiation, and has a structure selected from the group of structures represented by the following general formula III: ##STR5## wherein R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , and R 18 are independently a hydrogen atom, a hydroxyl group, a lower alkyl group having 1 to 5 carbon atoms, a lower alkoxyl group having 1 to 5 carbon atoms, or a trialkylsilyl group; at least one group selected from the group consisting of R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 and R 18 is a lower alkoxyl group having 1 to 5 carbon atoms; and n 3 and m are independently integers of 1 or more.
Claim 10
Dependent Claim
19 words
A composition having sensitivity to light or radiation according to claim 6, wherein said lower alkoxyl group is saturated.
References Cited (Backward Citations)
US3779778A
Cited
US4600685A
Cited
EP0076656A2
Cited
US4442197A
Cited
EP0090924A2
Cited
US4491628A
Cited
JPS5968735A
Cited
JPS6052845A
Cited
US4722881A
Cited
US4759616A
Cited
JPS6250811A
Cited
JPS6259296A
Cited
US4665006A
Cited
US5158854A
Cited
JPS6346094A
Cited
JPS63236028A
Cited
JPS63279245A
Cited
EP0315954A2
Cited
JPH0215864A
Cited
JPH0215863A
Cited
EP0422570A2
Cited
EP0464614A2
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-01-02 | 1998-07-04 | 1999-01-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-01-02 | 2002-07-04 | 2003-01-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-01-02 | 2006-07-04 | 2007-01-03 | $7700.00 | Window Closed / Lapsed |