EP0422570A2
Expired / Lapsed
EP
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Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions
Assignee: International Business Machines Corp
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Filing: 1990-10-08
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Granted: —
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Expires: 2010-10-08
Abstract
Abstract An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: wherein X is CH=CH₂ or -(-CH₂-)- n 0-(-R) with R being H or wherein each R I , R II and R III individually is selected from the group of alkyl, alkenyl, aryl, wherein each R IV , R V and R VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.
Inventors
- 👤 Edward Darko Babich
- 👤 Jeffrey Donald Gelorme
- 👤 Michael Hatzakis
- 👤 Jane Margaret Shaw
- 👤 Kevin Jay Stewart
- 👤 David Frank Witman
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 13:52
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0755; G03F7/027; G03F7/028; G03F7/029; G03F7/0757; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/127; Y10S502/00; Y10S502/522
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
127 words
Ultraviolet light sensitive photoinitiator composition suitable for cationic polymerization reactions which comprises: A) at least one anthracene derivative represented by the formula: wherein X is CH=CH₂ or -(-CH₂-)- n 0-(-R) with R being selected for group of H, and wherein each R I , R II and R III individually is selected from the group of alkyl, alkenyl aryl, wherein each R IV , R V and R VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and n is an integer of 1 to 2; B) an onium salt; and C) an organic solvent wherein the weight ratio of A:B is about 1:2 to about 1:10.
Claim 2
Dependent Claim
127 words
Ultraviolet light sensitive photoinitiator composition suitable for cationic polymerization reactions which comprises: A) at least one anthracene derivative represented by the formula: wherein X is CH=CH₂ or -(-CH₂-)- n 0-(-R) with R being selected for group of H, and wherein each R I , R II and R III individually is selected from the group of alkyl, alkenyl aryl, wherein each R IV , R V and R VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and n is an integer of 1 to 2; B) an onium salt; and C) an organic solvent wherein the weight ratio of A:B is about 1:2 to about 1:10.
Claim 3
Dependent Claim
25 words
Composition of claim 1 wherein said anthracene derivative is selected from the group of 9-anthracene methanol; 9-vinyl anthracene; and the trimethylsiloxy ether of 9-anthracene methanol.
Claim 4
Dependent Claim
14 words
Composition of claims 1 and 2 wherein said onium salt includes triphenyl sulfonium hexafluoroantimonate.
Claim 5
Dependent Claim
13 words
Composition of claim 3 wherein said onium salt is a 50/50 mixture of
Claim 6
Dependent Claim
131 words
Ultraviolet light sensitive composition comprising: A) a cationically polymerizable material; B) an onium salt in an amount sufficient to cause polymerization of the cationically polymerizable material; and C) an anthracene derivative represent by the formula: wherein X is CH=CH₂ or -(-CH₂-)- n 0-(-R) with R being selected from the group of H, wherein each R I , R II and R III individually is selected from the group of alkyl, alkenyl, aryl, wherein each R IV , R V and R VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and n is an integer of 1 to 2; and wherein the weight of B:C is about 1:2 to about 1:10.
Claim 7
Dependent Claim
131 words
Ultraviolet light sensitive composition comprising: A) a cationically polymerizable material; B) an onium salt in an amount sufficient to cause polymerization of the cationically polymerizable material; and C) an anthracene derivative represent by the formula: wherein X is CH=CH₂ or -(-CH₂-)- n 0-(-R) with R being selected from the group of H, wherein each R I , R II and R III individually is selected from the group of alkyl, alkenyl, aryl, wherein each R IV , R V and R VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and n is an integer of 1 to 2; and wherein the weight of B:C is about 1:2 to about 1:10.
Claim 8
Dependent Claim
25 words
Composition of claim 5 wherein said anthracene derivative is selected from the group of 9-anthracene methanol; 9-vinyl anthracene; and the trimethylsiloxy ether of 9-anthracene methanol.
Claim 9
Dependent Claim
14 words
Composition of claims 5 and 6 wherein said onium salt includes triphenyl sulfonium hexa-fluoroantimonate.
Claim 10
Dependent Claim
13 words
Composition of claim 7 wherein said onium salt is a 50/50 mixture of
Claim 11
Dependent Claim
17 words
Composition of claim 5 wherein said cationically polymerizable material is an epoxy polymer or a silicone polymer.
Claim 12
Dependent Claim
22 words
Composition of claims 5 and 9 wherein said polymerizable silicone polymer is represented by the formula: wherein x is 1 to 100.
Claim 13
Dependent Claim
15 words
Composition of claims 5 and 9 wherein said silicone polymer is represented by the formula:
Claim 14
Dependent Claim
174 words
Method for forming a pattern of a photoresist which comprises: A) providing on a substrate an uncured film of 1) a cationic polymerizable material; 2) an onium salt in an amount sufficient to cause polymerization of said cationic polymerizable material; and 3) an anthracene derivative represented by the formula: wherein X is CH=CH₂ or -(-CH₂-)- n 0-(-R) with R being selected from the group of H, wherein each R I , R II and R III individually is selected from the group of alkyl, alkenyl, aryl, wherein each R IV , R V and R VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and n is an integer of 1 to 2; and wherein the weight ratio of 2:3 is about 1:2 to about 1:10; B) imagewise exposing said uncured film to ultraviolet light in a pattern to thereby cause cationic polymerization of the film in said pattern; and C) developing said photoresist.
Claim 15
Dependent Claim
174 words
Method for forming a pattern of a photoresist which comprises: A) providing on a substrate an uncured film of 1) a cationic polymerizable material; 2) an onium salt in an amount sufficient to cause polymerization of said cationic polymerizable material; and 3) an anthracene derivative represented by the formula: wherein X is CH=CH₂ or -(-CH₂-)- n 0-(-R) with R being selected from the group of H, wherein each R I , R II and R III individually is selected from the group of alkyl, alkenyl, aryl, wherein each R IV , R V and R VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and n is an integer of 1 to 2; and wherein the weight ratio of 2:3 is about 1:2 to about 1:10; B) imagewise exposing said uncured film to ultraviolet light in a pattern to thereby cause cationic polymerization of the film in said pattern; and C) developing said photoresist.
Claim 16
Dependent Claim
18 words
Method of claim 12 wherein the wavelength of the ultraviolet light is about 300 to about 400 nanometers.
Claim 17
Dependent Claim
16 words
Method of claim 12 wherein said cationic polymerizable material is an epoxy or a silicone polymer.
Claim 18
Dependent Claim
10 words
Method of claim 12 wherein said radiation is electron-beam radiation.
Claim 19
Dependent Claim
73 words
Epoxy functional organosilicon polymer having a structural formula selected from the group: wherein each R¹, R², R³, R⁴, R⁵, R⁶, R⁷, R⁸, R⁹, R¹⁰, R¹¹ and R¹² radical is individually selected from the group of hydrogen, monovalent hydrocarbon radicals, epoxy groups, mercapto radical, and cyanoalkyl radicals; each a is an integer from 0 to 12, Z is an integer from 1 to 10² and each x is an integer from 0 to 2.
Claim 20
Dependent Claim
73 words
Epoxy functional organosilicon polymer having a structural formula selected from the group: wherein each R¹, R², R³, R⁴, R⁵, R⁶, R⁷, R⁸, R⁹, R¹⁰, R¹¹ and R¹² radical is individually selected from the group of hydrogen, monovalent hydrocarbon radicals, epoxy groups, mercapto radical, and cyanoalkyl radicals; each a is an integer from 0 to 12, Z is an integer from 1 to 10² and each x is an integer from 0 to 2.
References Cited (Backward Citations)
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