Patent US5313094A successfully refreshed from Google Patents.
US5313094A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Thermal dissipation of integrated circuits using diamond paths
Assignee: International Business Machines Corp
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Filing: 1992-01-28
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Granted: 1994-05-17
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Expires: 2012-01-28
Abstract
Abstract A heat dissipation apparatus for dissipation of thermal energy from an isolated active silicon region to an underlying supportive substrate is disclosed. Such an apparatus comprises a diamond filled trench having walls extending through the isolated active silicon region, an underlying insulative layer, and into the supportive substrate, whereby said diamond filled trench provides a high thermal conductive path from said active silicon region to said substrate.
Inventors
- 👤 Klaus D. Beyer
- 👤 Chang-Ming Hsieh
- 👤 Louis L. Hsu
- 👤 David E. Kotecki
- 👤 Tsoring-Dih Yuan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 13:51
CPC Classifications
H; H10; H10W; H10W74/00; H10W74/10; H10W74/131; H10W74/134; H10W40/00; H10W40/20; H10W40/25; H10W40/254
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
132 words
A silicon-on-insulator heat dissipation apparatus comprising: a silicon substrate; an insulation layer disposed on said substrate; an active semiconductor region disposed on said insulation layer; a chemical vapor deposited (CVD) diamond filled trench having walls extending from top to bottom through said active semiconductor region, said insulation layer and into said substrate; a CVD diamond filled cavity positioned below and in contact with the bottom of said CVD diamond filled trench, said CVD diamond filled cavity further having walls extending laterally beyond the diamond filled trench walls into said substrate; and, a thin passivation layer on the order of 300 Å formed on the walls of said trench and said cavity, whereby said diamond filled trench and cavity provide a high thermal conductive path from said active semiconductor region to said substrate.
Claim 2
Dependent Claim
132 words
A silicon-on-insulator heat dissipation apparatus comprising: a silicon substrate; an insulation layer disposed on said substrate; an active semiconductor region disposed on said insulation layer; a chemical vapor deposited (CVD) diamond filled trench having walls extending from top to bottom through said active semiconductor region, said insulation layer and into said substrate; a CVD diamond filled cavity positioned below and in contact with the bottom of said CVD diamond filled trench, said CVD diamond filled cavity further having walls extending laterally beyond the diamond filled trench walls into said substrate; and, a thin passivation layer on the order of 300 Å formed on the walls of said trench and said cavity, whereby said diamond filled trench and cavity provide a high thermal conductive path from said active semiconductor region to said substrate.
Claim 3
Dependent Claim
140 words
A silicon-on-insulator heat dissipation apparatus comprising: a silicon substrate; an insulation layer of insulation material disposed on said substrate; an active semiconductor region disposed on said insulation layer; a chemical vapor deposited (CVD) diamond filled trench having walls extending from top to bottom through said active semiconductor region, said insulation layer and into said substrate; a CVD diamond filled cavity positioned below and in contact with the bottom of said CVD diamond filled trench, said CVD diamond filled cavity further having walls extending laterally beyond the diamond filled trench walls into said substrate; and, a thin passivation layer on the order of 300 Å formed on the walls of said diamond filled trench only at said active semiconductor region, whereby aid diamond filled trench and cavity provide a high thermal conductive path from said active semiconductor region to said substrate.
Claim 4
Dependent Claim
140 words
A silicon-on-insulator heat dissipation apparatus comprising: a silicon substrate; an insulation layer of insulation material disposed on said substrate; an active semiconductor region disposed on said insulation layer; a chemical vapor deposited (CVD) diamond filled trench having walls extending from top to bottom through said active semiconductor region, said insulation layer and into said substrate; a CVD diamond filled cavity positioned below and in contact with the bottom of said CVD diamond filled trench, said CVD diamond filled cavity further having walls extending laterally beyond the diamond filled trench walls into said substrate; and, a thin passivation layer on the order of 300 Å formed on the walls of said diamond filled trench only at said active semiconductor region, whereby aid diamond filled trench and cavity provide a high thermal conductive path from said active semiconductor region to said substrate.
Claim 5
Dependent Claim
23 words
A silicon-on-insulator heat dissipation apparatus according to claims 1 or 2, further comprising an insulative cap disposed on said CVD diamond filled trench.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-05-16 | 1997-11-15 | 1998-05-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-05-16 | 2001-11-15 | 2002-05-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-05-16 | 2005-11-15 | 2006-05-17 | $7700.00 | Window Closed / Lapsed |