Patent US5164034A successfully refreshed from Google Patents.
US5164034A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus and method for processing substrate
Assignee: Tokyo Electron Ltd
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Filing: 1991-09-19
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Granted: 1992-11-17
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Expires: 2011-09-19
Abstract
Abstract A substrate processing apparatus comprising a housing section for housing substrates to be processed, a first chamber for performing anisotropic etching treatment, conveyor means for conveying the substrates from the housing section to the first chamber, and a second chamber for performing at least one of isotropic etching treatment and ashing treatment with respect to a substrate which has been subjected to the anisotropic etching treatment in the first chamber. And a method of processing substrates, comprising the steps of performing anisotropic etching treatment in a first chamber with respect to the substrates, and performing at least one of isotropic etching treatment and ashing treatment in a second chamber with respect to the substrates which have been subjected to the anisotropic etching treatment in the first chamber and have been kept unexposed to the atmosphere, the isotropic etching treatment and the ashing treatment being performed simultaneously or in succession.
Inventors
- 👤 Izumi Arai
- 👤 Yoshifumi Tahara
- 👤 Yoshio Ishikawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 02:20
CPC Classifications
H; H10; H10P; H10P95/00; H10P72/00; H10P72/04; H10P72/0451; H10P72/0468; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; H10P50/69; H10P50/691; H10P50/692; H10P72/0402; H10P72/0418; H10P72/0421
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
181 words
A substrate processing apparatus, comprising: a housing section for housing a substrate to be processed; a first chamber including a first capacitive coupling electrode means for an anisotropic etching treatment, said first capacitive coupling electrode means including a pair of mutually facing parallel plate electrodes; conveyor means for conveying the substrates from said housing section into said first chamber; a second chamber including a processing vessel for applying an ashing treatment and an isotropic etching treatment to the substrate; a stage disposed in an inner lower part of said processing vessel for supporting the substrate; and a second capacitive coupling electrode means for generating plasma within the processing vessel; wherein said second capacitive coupling electrode means includes a pair of ring shaped electrodes disposed in an upper outside region of the processing vessel so as not to be exposed to the plasma generated within the processing vessel, and the inner diameter of the processing vessel in the region at which the pair of ring shaped electrodes are disposed is smaller than that in the region at which said stage is disposed.
Claim 2
Dependent Claim
181 words
A substrate processing apparatus, comprising: a housing section for housing a substrate to be processed; a first chamber including a first capacitive coupling electrode means for an anisotropic etching treatment, said first capacitive coupling electrode means including a pair of mutually facing parallel plate electrodes; conveyor means for conveying the substrates from said housing section into said first chamber; a second chamber including a processing vessel for applying an ashing treatment and an isotropic etching treatment to the substrate; a stage disposed in an inner lower part of said processing vessel for supporting the substrate; and a second capacitive coupling electrode means for generating plasma within the processing vessel; wherein said second capacitive coupling electrode means includes a pair of ring shaped electrodes disposed in an upper outside region of the processing vessel so as not to be exposed to the plasma generated within the processing vessel, and the inner diameter of the processing vessel in the region at which the pair of ring shaped electrodes are disposed is smaller than that in the region at which said stage is disposed.
Claim 3
Dependent Claim
27 words
The substrate processing apparatus according to claim 1, wherein said conveyor means is a multi-joint robot for conveying the substrates among the housing, alignment and processing sections.
Claim 4
Dependent Claim
27 words
The substrate processing apparatus according to claim 2, wherein said multi-joint robot is provided with an arm having a holder system which is a vacuum suction system.
Claim 5
Dependent Claim
14 words
The apparatus according to claim 1, wherein said processing vessel is made of glass.
Claim 6
Dependent Claim
36 words
The substrate processing apparatus according to claim 1, wherein the small diameter portion in the upper region of the processing vessel is coaxial with the large diameter portion in the lower region of the processing vessel.
Claim 7
Dependent Claim
29 words
The substrate processing apparatus according to claim 1, wherein the inner surfaces of the upper and lower regions of the processing vessel are smooth and form a continuous plane.
Claim 8
Dependent Claim
22 words
The substrate processing apparatus according to claim 1, further comprising vertical driving means for vertically driving said stage within the processing vessel.
Claim 9
Dependent Claim
39 words
The substrate processing apparatus according to claim 1, further comprising an intermediate chamber disposed between the first and second chambers, the atmosphere within said intermediate chamber being inert, and a substrate transfer means being disposed within said intermediate chamber.
Claim 10
Dependent Claim
24 words
The substrate processing apparatus according to claim 1, further comprising temperature control means for controlling the temperature of the stage within the processing chamber.
Claim 11
Dependent Claim
31 words
The substrate processing apparatus according to claim 9, wherein said temperature control means utilizes, in combination, a heater for heating the stage and a water cooling system for cooling the stage.
Claim 12
Dependent Claim
31 words
The substrate processing apparatus according to claim 1, wherein an inlet port for a process gas is formed in the small diameter portion in the upper region of the processing vessel.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-11-17 | 1996-05-18 | 1996-11-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-11-17 | 2000-05-18 | 2000-11-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-11-17 | 2004-05-18 | 2004-11-17 | $7700.00 | Window Closed / Lapsed |