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US4964919A Expired / Lapsed US ⏱️ 0.0 years remaining

Cleaning of silicon wafers with an aqueous solution of KOH and a nitrogen-containing compound

Assignee: DuPont Electronic Materials Holding Inc
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Filing: 1988-12-27
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Granted: 1990-10-23
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Expires: 2008-12-27
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Abstract

Abstract Composition of matter and method of cleaning silicon wafers; the composition of matter is an aqueous solution of potassium hydroxide and a nitrogen-containing compound, preferably tetramethylammonium hydroxide. The wafer is immersed in the solution, rinsed and dried.

Inventors

  • 👤 Charles C. Payne

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 15:18
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; H10P72/0411; H10P72/0416

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 40 words
A composition of matter for cleaning silicon IC wafers consisting essentially of an aqueous solution of about 10% by weight potassium hydroxide and 2.5% by weight of a nitrogen-containing compound selected from the group consisting of tetramethylammonium hydroxide and taurine.
Claim 2
Dependent Claim 40 words
A composition of matter for cleaning silicon IC wafers consisting essentially of an aqueous solution of about 10% by weight potassium hydroxide and 2.5% by weight of a nitrogen-containing compound selected from the group consisting of tetramethylammonium hydroxide and taurine.
Claim 3
Dependent Claim 26 words
A method of cleaning silicon wafers comprising the steps of immersing the wafer in a solution claimed in claim 1; afterwards rinsing and drying the wafer.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-10-22 1994-04-23 1994-10-23 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-10-22 1998-04-23 1998-10-23 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-10-22 2002-04-23 2002-10-23 $7700.00 Window Closed / Lapsed

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