US4828751A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Solvent composition for cleaning silicon wafers
Assignee: PCR Inc
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Filing: 1987-08-28
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Granted: 1989-05-09
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Expires: 2007-08-28
Abstract
Abstract There is provided an improved solvent especially adapted for cleaning silicon wafers and consisting essentially of a haloalkylhydrocarbon and a partially fluorinated alcohol. This solvent provides excellent cleaning and drying of the wafer.
Inventors
- 👤 Paul W. Kremer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 17:02
CPC Classifications
C; C11; C11D; C11D7/00; C11D7/50; C11D7/5004; C11D7/5018
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
69 words
A solvent composition useful for cleaning silicon wafers consisting essentially of (a) from about 30 parts to about 90 parts by weight of a perhalogenated haloalkylhydrocarbon containing from 5 to 12 carbon atoms and (b) from about 10 to about 70 parts by weight of a partially fluorinated alcohol containing from 2 to 4 carbon atoms, the total of components (a) and (b) being about 100 parts by weight.
Claim 2
Dependent Claim
69 words
A solvent composition useful for cleaning silicon wafers consisting essentially of (a) from about 30 parts to about 90 parts by weight of a perhalogenated haloalkylhydrocarbon containing from 5 to 12 carbon atoms and (b) from about 10 to about 70 parts by weight of a partially fluorinated alcohol containing from 2 to 4 carbon atoms, the total of components (a) and (b) being about 100 parts by weight.
Claim 3
Dependent Claim
16 words
A composition as defined in claim 1 which is water free at the time of use.
Claim 4
Dependent Claim
25 words
A solvent composition as defined in claim 1 wherein the solvent composition has a boiling point in the range of from 40° to 120° C.
Claim 5
Dependent Claim
14 words
A solvent composition as defined in claim 1 wherein component (a) is a fluoroalkylhydrocarbon.
Claim 6
Dependent Claim
14 words
A solvent composition as defined in claim 1 wherein component (a) is a fluorochloroalkylhydrocarbon.
Claim 7
Dependent Claim
13 words
A solvent composition as defined in claim 4 wherein the fluoroalkylhydrocarbon is perfluoroheptane.
Claim 8
Dependent Claim
13 words
A solvent composition as defined in claim 4 wherein the fluoroalkylhydrocarbon is perfluorohexane.
Claim 9
Dependent Claim
15 words
A solvent composition as defined in claim 1 wherein the partially fluorinated alcohol in trifluoroethanol.
Claim 10
Dependent Claim
15 words
A solvent composition as defined in claim 1 wherein the partially fluorinated alcohol is 3,3,3-trifluoropropanol.
Claim 11
Dependent Claim
15 words
A solvent composition as defined in claim 1 wherein the partially fluorinated alcohol is 2,2,3,3,3-pentafluoropropanol.
Claim 12
Dependent Claim
18 words
A solvent composition as defined in claim 1 wherein the partially fluorinated alcohol is a partially fluorinated n-butanol.
Claim 13
Dependent Claim
18 words
A solvent composition as defined in claim 1 wherein component (a) is perfluorohexane and component (b) is 3,3,3-trifluoropropanol.
Claim 14
Dependent Claim
21 words
A solvent composition as defined in claim 1 consisting of (a) 70 parts of perfluoroheptane and (b) 30 parts of trifluoroethanol.
Claim 15
Dependent Claim
23 words
A solvent composition as defined in claim 1 consisting of (a) 30 parts of perfluorohexanes and (b) 70 parts of partially fluorinated n-propanol.
Claim 16
Dependent Claim
15 words
A solvent composition as defined in claim 1 wherein the partially fluorinated alcohol is 2,2,3,3-tetrafluoropropanol.
Claim 17
Dependent Claim
14 words
A solvent composition as defined in claim 1 wherein component (a) is a perfluorododecane.
Claim 18
Independent Claim
92 words
The method of cleaning and drying semiconductor wafers which comprises the steps of rinsing the wafer with a solvent consisting essentially of (a) from about 30 to about 90 parts by weight of a haloalkylhydrocarbon containing from 5 to 12 carbon atoms and (b) from about 10 to about 70 parts by weight of a partially fluorinated alcohol containing from 2 to 4 carbon atoms, the total of components (a) and (b) being about 100 parts by weight; and heating the solvent coated wafer to a temperature sufficient to volatilize the solvent.
Claim 19
Independent Claim
92 words
The method of cleaning and drying semiconductor wafers which comprises the steps of rinsing the wafer with a solvent consisting essentially of (a) from about 30 to about 90 parts by weight of a haloalkylhydrocarbon containing from 5 to 12 carbon atoms and (b) from about 10 to about 70 parts by weight of a partially fluorinated alcohol containing from 2 to 4 carbon atoms, the total of components (a) and (b) being about 100 parts by weight; and heating the solvent coated wafer to a temperature sufficient to volatilize the solvent.
Claim 20
Dependent Claim
47 words
A solvent composition useful for cleaning silicon wafers consisting essentially of from about 30 parts to about 90 parts by weight of perfluoroheptane and from about 10 to about 70 parts by weight of trifluoroethanol, the total of the said components being about 100 parts by weight.
Claim 21
Dependent Claim
47 words
A solvent composition useful for cleaning silicon wafers consisting essentially of from about 30 parts to about 90 parts by weight of perfluoroheptane and from about 10 to about 70 parts by weight of trifluoroethanol, the total of the said components being about 100 parts by weight.
References Cited (Backward Citations)
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US4303558A
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US4465610A
Cited
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GB2188059A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-05-08 | 1992-11-07 | 1993-05-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-05-08 | 1996-11-07 | 1997-05-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-05-08 | 2000-11-07 | 2001-05-09 | $7700.00 | Window Closed / Lapsed |