Positive resist quaternary ammonium hydroxide containing developer with cationic and nonionic surfactant

Claim 1

A positive resist developer comprising an aqueous solution containing: a quaternary ammonium hydroxide acting as an active developing agent in an amount sufficient to develop a positive resist, wherein said quarternary ammonium hydroxide is represented by the general formula: ##STR5## wherein R a and R c are respectively alkyl groups each having 1 to 4 carbon atoms, and R d is an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 3 carbon atoms; a cationic surfactant in an amount sufficient to suppress dissolution of a non-exposed portion of the positive resist, wherein said cationic surfactant is represented by the following general formula: ##STR6## wherein R e is an alkyl group having 8 to 18 carbon atoms, R f and R h are respectively alkyl groups each having 1 to 4 carbon atoms, R g is an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 4 carbon atoms, and X is a halogen atom, or by the general formula: ##STR7## wherein R j is an alkyl group having 12 to 16 carbon atoms, R i is a hydrogen atom or methyl group, and X is halogen atom; and a water-soluble nonionic surfactant in an amount sufficient to prevent trailing of the positive resist and roughening of a resulting resist pattern during development thereof, wherein said nonionic surfactant is selected from the group consisting of polyoxyethylene ethers and esters of fatty acids of polyhydric alcohols of the following general formulas: ##STR8## wherein R and R" are respectively alkyl groups each having 12 to 18 carbon atoms, R' is an alkyl group having 8 or 9 carbon atoms, and m and n are the numbers of the respective repeating units.