EP0147074A2
Expired / Lapsed
EP
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Method of developing a positive photoresist layer, and composition for use therein
Assignee: ATK Launch Systems LLC
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Filing: 1984-11-28
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Granted: —
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Expires: 2004-11-28
Abstract
Abstract A method of developing a positive photoresist layer which has been image-wise-exposed comprising contacting the layer with an alkaline developing composition to remove exposed areas of the layer, the developing composition comprising a solution containing a cyclic quaternary ammonium hydroxide developing agent in a sufficient concentration to remove exposed areas of the layer. The present invention also includes a developing composition for use in the method.
Inventors
- 👤 Susan B. Poulin
- 👤 Ann Beal Salamone
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 00:01
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
56 words
A method of developing a positive photoresist layer which has been image-wise-exposed comprising contacting the layer with an alkaline developing composition to remove exposed areas of the layer, characterised in that the developing composition comprises a solution containing a cyclic quaternary ammonium hydroxide' developing agent in a sufficient concentration to remove exposed areas of the layer.
Claim 2
Independent Claim
56 words
A method of developing a positive photoresist layer which has been image-wise-exposed comprising contacting the layer with an alkaline developing composition to remove exposed areas of the layer, characterised in that the developing composition comprises a solution containing a cyclic quaternary ammonium hydroxide' developing agent in a sufficient concentration to remove exposed areas of the layer.
Claim 3
Dependent Claim
67 words
A method according to claim 1, wherein the cyclic quaternary ammonium hydroxide is a derivative of pyridine, purine, pyrrole, carbazole, an isopyrrole, diazepine, pyrazole, azepine, triazole, indole, oxazole, indolemine, isoxazole, isobenzazole, thiazole, pyrindine, an isothiazole, pyranol-pyrrole, an oxidiazole, isoindazole, dioxazole, indoxazine, pyridazine, benzoxazole, pyrimidine, anthranil, pyrazine, quinoline, piperazine, isoquinoline, triazine, cinnoline, oxazine, quinazoline, isoxazine, naphthridine, oxathiazine, pyrido-pyridine, oxadiazine, benzoxazine, morpholine, benzisoxazine, acridine, imidazoline, an oxatriazole, or pyrrolidone.
Claim 4
Dependent Claim
23 words
A method according to claim 1 or claim 2, wherein the quaternary nitrogen of the'cyclic quaternary ammonium hydroxide is within an aromatic ring.
Claim 5
Dependent Claim
18 words
A method according to claim 3, wherein the cyclic quaternary ammonium hydroxide is an N-alkyl substituted pyridinium hydroxide.
Claim 6
Dependent Claim
21 words
A method according to claim 4, wherein the alkyl group on the quaternary nitrogen is of one to four carbon atoms.
Claim 7
Dependent Claim
17 words
. A method according to claim 5, wherein the cyclic quaternary ammonium hydroxide is N-methyl pyridinium hydroxide.
Claim 8
Independent Claim
25 words
A method according to any preceding claim, wherein the normality of the developing agent within the developing composition is from 0.1 N to 6.0 N.
Claim 9
Dependent Claim
24 words
A method according to claim 7, wherein the normality of the developing agent within the developing composition is from 0.2 N to 0.5 N.
Claim 10
Independent Claim
19 words
A method according to any preceding claim, wherein the developing composition comprises an aqueous solution of the developing agent.
Claim 11
Independent Claim
15 words
A method according to any preceding claim, wherein the developing composition also includes a surfactant.
Claim 12
Dependent Claim
27 words
A positive photoresist developing composition comprising a solution of a cyclic quaternary ammonium hydroxide developing agent, the solution having a normality from 0.1 N to 6.0 N.
Claim 13
Dependent Claim
27 words
A positive photoresist developing composition comprising a solution of a cyclic quaternary ammonium hydroxide developing agent, the solution having a normality from 0.1 N to 6.0 N.
Claim 14
Dependent Claim
66 words
A composition according to claim 11, wherein the cyclic quaternary ammonium hydroxide is a derivative of pyridine, purine, pyrrole, carbazole, an isopyrrole, diazepine, pyrazole, azepine, triazole, indole, oxazole, indolemine, isoxazole, isobenzazole, thiazole, pyrindine, an isothiazole, pyranol-pyrrole, an oxadiazole, isoindazole, dioxazole, indoxazine, pyridazine, .benzoxazole, pyrimidine,-ahthranil, pyrazine, quinoline, piperazine, isoquinoline, traizine, cinnoline, oxazine, quinazoline, isoxazine, naphthridine, oxathiazine, pyrido-pyridine, oxadiazine, benzoxazine, morpholine, benzisoxazine, acridine, imidazoline, an oxatriazole, or pyrrolidone.
Claim 15
Dependent Claim
24 words
A composition according to claim 11 or claim 12, wherein the quaternary nitrogen of the cyclic quaternary ammonium hydroxide is within an aromatic ring.
Claim 16
Dependent Claim
18 words
A composition according to claim 13, wherein the cyclic quaternary ammonium hydroxide is an N-alkyl substituted pyridinium hydroxide.
Claim 17
Dependent Claim
21 words
A composition according to claim 14, wherein the alkyl group on the quaternary nitrogen is of one to four carbon atoms.
Claim 18
Dependent Claim
16 words
'A composition according to claim 15, wherein the cyclic quaternary ammonium hydroxide is N-methyl pyridinium hydroxide.
Claim 19
Dependent Claim
29 words
A composition according to any one of claims 11 to 16, wherein the normality of the developing agent within the developing composition is from 0.2 N to 0.5 N.
Claim 20
Dependent Claim
20 words
A composition according to any one of claims 11 to 17, which comprises an aqueous solution of the developing agent.
Claim 21
Dependent Claim
16 words
A composition according to any one of claims 11 to 18, which also includes a surfactant.
Claim 22
Dependent Claim
17 words
An etchant or RTV stripper comprising a composition according to any one of claims 11 to 19.
Claim 23
Independent Claim
22 words
A method of etching or RTV stripping comprising the use of a composition according to any one of claims 11 to 19.
References Cited (Backward Citations)
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