US4147545A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photolithographic developing composition with organic lithium compound
Assignee: Polychrome Corp
•
Filing: 1972-11-02
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Granted: 1979-04-03
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Expires: 1992-11-02
Abstract
Abstract A developer composition for photosensitive coatings on substrates, particularly lithographic printing plates sensitized with substantially water-insoluble diazonium compounds, which is comprised of an aqueous solution of a substantially water-soluble organo-lithium salt, e.g., lithium naphthenate, lithium benzoate, lithium ricinoleate, etc. The novel developers quickly remove unexposed areas of the plate and yet do not detrimentally dissolve the exposed areas of the plate.
Inventors
- 👤 William Rowe
- 👤 Eugene Golda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 16:32
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322; Y; Y10; Y10S; Y10S516/00; Y10S516/01; Y10S516/02; Y10S516/03; Y10S516/06
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
65 words
A composition adapted for developing exposed diazo-sensitized photosensitive coatings on a substrate to remove therefrom non-image areas which comprises an aqueous solution of a water-miscible solvent and lithium benzoate wherein the concentration of said lithium salt is from 5% to 25% by weight of the total weight of the ingredients of said composition, said solution having a pH of from about 5 to about 12.
Claim 2
Dependent Claim
65 words
A composition adapted for developing exposed diazo-sensitized photosensitive coatings on a substrate to remove therefrom non-image areas which comprises an aqueous solution of a water-miscible solvent and lithium benzoate wherein the concentration of said lithium salt is from 5% to 25% by weight of the total weight of the ingredients of said composition, said solution having a pH of from about 5 to about 12.
Claim 3
Dependent Claim
32 words
A developer composition according to claim 1 wherein said diazo-sensitized photosensitive coating on a substrate is a negative-acting lithographic plate, the light-sensitive coating of which is substantially water-insoluble and substantially solvent soluble.
Claim 4
Dependent Claim
32 words
A developer composition according to claim 1 wherein said diazo-sensitized photosensitive coating on a substrate is a positive-acting lithographic plate, and the aqueous solution has a pH of at least about 12.
Claim 5
Dependent Claim
32 words
A developer composition according to claim 1 wherein said diazo-sensitized photosensitive coating on a substrate is a negative-acting proofing system, the light-sensitive coating of which is substantially water-insoluble and substantially solvent soluble.
Claim 6
Dependent Claim
32 words
A developer composition according to claim 1 wherein said diazo-sensitized photosensitive coating on a substrate is a positive-acting proofing system, and the pH of the aqueous solution is at least about 12.
Claim 7
Dependent Claim
29 words
A developer composition according to claim 1 wherein said coating contains a reaction product of a diazo-aromatic polymer and a hydroxyl containing compound or a sulfonic acid containing compound.
Claim 8
Dependent Claim
20 words
A developer composition according to claim 6 wherein the diazo-aromatic polymer is that obtained from para-diazo-diphenylamine and reactive carbonyl-containing compounds.
Claim 9
Dependent Claim
53 words
A developer composition according to claim 1 wherein said composition contains up to about 10% by weight of a solvent for said photosensitive coating that is miscible in water, up to about 5% by weight of a nonionic, anionic or cationic surfactant, or up to about 5% of phosphoric acid or oxalic acid.
Claim 10
Dependent Claim
74 words
A composition adapted for developing exposed diazo-sensitized photosensitive coatings on a substrate to remove therefrom non-image areas which comprise an aqeous solution of from 5% to 25% by weight of the total weight of the ingredients in the composition, of lithium benzoate and up to about 10% by weight of the total weight of the ingredients in the composition, of a water-miscible solvent, said solution having a pH from about 5 to about 12.
Claim 11
Dependent Claim
74 words
A composition adapted for developing exposed diazo-sensitized photosensitive coatings on a substrate to remove therefrom non-image areas which comprise an aqeous solution of from 5% to 25% by weight of the total weight of the ingredients in the composition, of lithium benzoate and up to about 10% by weight of the total weight of the ingredients in the composition, of a water-miscible solvent, said solution having a pH from about 5 to about 12.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-04-02 | 1982-10-02 | 1983-04-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-04-02 | 1986-10-02 | 1987-04-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-04-02 | 1990-10-02 | 1991-04-03 | $7700.00 | Window Closed / Lapsed |