Metal ion-free photoresist developer composition

Claim 1

An aqueous metal ion-free developer composition comprising a metal ion-free alkali and metal ion-free surfactant comprising one or more quaternary ammonium compounds having the general formula: wherein R 1 comprises a saturated or unsaturated, straight or branched hydrocarbon chain having from 6 to 20 carbons, and from zero to 3 oxygens, provided that each oxygen can be separated from others by at least one carbon, and which is alkoxy-substituted or unsubstituted; R 2 and R 3 are the same or different and each comprises alkyl of from 1 to 3 carbons; or (R 0) H wherein R 5 is alkylene of 1 to 3 carbons and n is an integer from 1 to 20; or R 2 and R 3 together comprise a cycloaliphatic hydrocarbon of from 2 to 8 carbons with from zero to 2 heteroatom selected from O, N, and S, provided that each heteroatom be separated from another and from the quaternary nitrogen by at least one carbon; or R 2 and R 3 together comprise a cycloaromatic hydrocarbon of from 2 to 8 carbons with from zero to two nitrogen heteroatoms, provided that each nitrogen atom be separated from another and from the quaternary nitrogen by at least one carbon; R 4 comprises a saturated or unsaturated, straight or branched hydrocarbon having from 1 to 10 carbon atoms, (R 5 0) n H as defined above, phenalkyl, wherein the alkyl moiety has from O to 3 carbons, or wherein m is from 1 to 4 R 2 and R 3 are as defined above, and R 6 is saturated or unsaturated, straight or branched hydrocarbon having from 1 to 10 carbon atoms or (R 0) H as defined above, or phenalkyl having an alkyl group of from O to 3 carbon atoms; and X comprises halo, hydroxy, or silicate, or the corresponding amino oxide of said quaternary ammonium compounds.