US4891488A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Processing apparatus and method
Assignee: Texas Instruments Inc
•
Filing: 1987-07-16
•
Granted: 1990-01-02
•
Expires: 2007-07-16
Abstract
Abstract A process module wherein radiant heating is combined with the capability for generating a plasma in proximity to the wafer face. It is useful to clamp the slice to a susceptor which is of the same material as the wafer, or at least has essentially the same thermal coefficient of expansion. The susceptor is directly heated by a radiant heater, but the rate of temperature change is slow enough that no large thermal gradients between the susceptor and the wafer develop.
Inventors
- 👤 Cecil J. Davis
- 👤 Rhett B. Jucha
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 18:38
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/30; H10P72/33; H10P72/3306; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H10P72/04; H10P72/0431; H10P72/0436; H10P72/3308
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
90 words
A vacuum process module capable of receiving a workpiece comprising: (a) a process chamber; (b) a support device including an RF electrode capable of supporting a workpiece with a face to be processed facing downward in said chamber; said electrode comprising silicon in the area said workpiece is to be supported; (c) an in situ plasma generator including said electrode; (d) a separately controlled radiant heater; and (e) a transparent vacuum wall between said radiant heater and said electrode which forms a portion of the boundary of the process chamber.
Claim 2
Dependent Claim
90 words
A vacuum process module capable of receiving a workpiece comprising: (a) a process chamber; (b) a support device including an RF electrode capable of supporting a workpiece with a face to be processed facing downward in said chamber; said electrode comprising silicon in the area said workpiece is to be supported; (c) an in situ plasma generator including said electrode; (d) a separately controlled radiant heater; and (e) a transparent vacuum wall between said radiant heater and said electrode which forms a portion of the boundary of the process chamber.
Claim 3
Dependent Claim
22 words
The module as set forth in claim 1 wherein said in situ generator and said heater are separately controlled to operate singly.
Claim 4
Dependent Claim
24 words
The module as set forth in claim 1 wherein said in situ generator and said heater are separately controlled to operate in any combination.
Claim 5
Dependent Claim
19 words
The module as set forth in claim 1 wherein said radiant heater is located above said workpiece during processing.
Claim 6
Dependent Claim
31 words
The module as set forth in claim 1 wherein said in situ plasma is generated below said workpiece and said in situ plasma generator has electrodes above and below said workpiece.
References Cited (Backward Citations)
US3439238A
Cited
US3765763A
Cited
US4306292A
Cited
US4292384A
Cited
US4253907A
Cited
US4250428A
Cited
US4293249A
Cited
US4430547A
Cited
US4465898A
Cited
US4447469A
Cited
US4439243A
Cited
US4439244A
Cited
US4615905A
Cited
US4493977A
Cited
US4547648A
Cited
US4629635A
Cited
US4579609A
Cited
US4609103A
Cited
US4584207A
Cited
US4632057A
Cited
US4673456A
Cited
US4684542A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-01-01 | 1993-07-03 | 1994-01-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-01-01 | 1997-07-03 | 1998-01-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-01-01 | 2001-07-03 | 2002-01-02 | $7700.00 | Window Closed / Lapsed |