US3765763A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Automatic slice processing
Assignee: Texas Instruments Inc
•
Filing: 1969-07-29
•
Granted: 1973-10-16
•
Expires: 1989-07-29
Abstract
Abstract In an electronic component manufacturing system, slices are transported in serial fashion between a plurality of work stations. As the slices move through the system, each work station performs a separate manufacturing operation on each slice. The manufacturing operations are performed in immediate succession and within the same time interval so that the slices are processed rapidly and so that slices do not accumulate between the work stations. The slices are maintained in sequence throughout the system so that the operation of the system is more easily controlled.
Inventors
- 👤 J Nygaard
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 17:59
CPC Classifications
B; B23; B23Q; B23Q41/00; B23Q41/06; H; H10; H10P; H10P72/00; H10P72/06; H10P72/0612; H10P72/30; H10P72/32; H10P72/3208; H10P72/33; H10P72/3314
Claims Analysis
Total Claims: 30
Claim 1
Independent Claim
249 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a first spraying work station for individually cleaning semiconductor slices; ii. a second spraying work station for individually coating said semiconductor slices with a photoresist material; iii. a heating work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a third spraying work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station; wherein said first, second and third spraying stations include: i. a spindle; ii. means for individually positioning semiconductor slices on said spindle; iii. means for securing such individual semiconductor slices to said spindle; iv. a chamber; v. means for lowering said spindle including the secured semiconductor slice into said chamber; vi. means for rotating said spindle including the secured semiconductor slice once said spindle has been lowered into said chamber; and vii. a nozzle positioned in relation to said lowered spindle including the secured semiconductor slice such that a solution released from said nozzle is sprayed onto the semiconductor slice while it is rotating.
Claim 2
Dependent Claim
249 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a first spraying work station for individually cleaning semiconductor slices; ii. a second spraying work station for individually coating said semiconductor slices with a photoresist material; iii. a heating work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a third spraying work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station; wherein said first, second and third spraying stations include: i. a spindle; ii. means for individually positioning semiconductor slices on said spindle; iii. means for securing such individual semiconductor slices to said spindle; iv. a chamber; v. means for lowering said spindle including the secured semiconductor slice into said chamber; vi. means for rotating said spindle including the secured semiconductor slice once said spindle has been lowered into said chamber; and vii. a nozzle positioned in relation to said lowered spindle including the secured semiconductor slice such that a solution released from said nozzle is sprayed onto the semiconductor slice while it is rotating.
Claim 3
Dependent Claim
61 words
The system of claim 1 wherein said means for conveying and said means for positioning include means for generating an air cushion and propelling jet along said predetermined path to carry semiconductor slices from work station to work station and said means for securing includes means for generating a vacuum to overcome said air cushion and thereby secure said semiconductor slice.
Claim 4
Dependent Claim
200 words
A manufacturing system coMprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a first spraying work station for individually cleaning semiconductor slices; ii. a second spraying work station for individually coating said semiconductor slices with a photoresist material; iii. a heating work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a third spraying work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station wherein said means for conveying includes means for generating an air cushion and propelling jet along said predetermined path to carry semiconductor slices from work station to work station and wherein each work station includes means for generating a vacuum to overcome said air cushion and thereby stop a semiconductor slice at such work station.
Claim 5
Dependent Claim
200 words
A manufacturing system coMprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a first spraying work station for individually cleaning semiconductor slices; ii. a second spraying work station for individually coating said semiconductor slices with a photoresist material; iii. a heating work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a third spraying work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station wherein said means for conveying includes means for generating an air cushion and propelling jet along said predetermined path to carry semiconductor slices from work station to work station and wherein each work station includes means for generating a vacuum to overcome said air cushion and thereby stop a semiconductor slice at such work station.
Claim 6
Dependent Claim
190 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a first spraying work station for individually cleaning semiconductor slices; ii. a second spraying work station for individually coating said semiconductor slices with a photoresist material; iii. a heating work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a third spraying work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station wherein said means for conveying includes an air track having holes formed therein through which compressed air is directed to carry a semiconductor slice from work station to work station and said heating work station includes means for heating a portion of said air track.
Claim 7
Dependent Claim
190 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a first spraying work station for individually cleaning semiconductor slices; ii. a second spraying work station for individually coating said semiconductor slices with a photoresist material; iii. a heating work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a third spraying work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station wherein said means for conveying includes an air track having holes formed therein through which compressed air is directed to carry a semiconductor slice from work station to work station and said heating work station includes means for heating a portion of said air track.
Claim 8
Dependent Claim
237 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a first spraying work station for individually cleaning semiconductor slices; ii. a second spraying work station for individually coating said semiconductor slices with a photoresist material; iii. a heating work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a third spraying work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; vi. an etch tank work station, said etch tank work station including: a. a tank for containing an etch solution; b. a plurality of ramps extending from a portion of a conveyor means into different portions of said tank; c. means for transporting semiconductor slices through said tank at a uniform rate, said means for transporting being mounted in said tank; and d. means for selecting which one of said plurality of ramps a semiconductor slice is conveyed through in accordance with tHe requirements of each particular slice transported through said tank; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station;
Claim 9
Dependent Claim
237 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a first spraying work station for individually cleaning semiconductor slices; ii. a second spraying work station for individually coating said semiconductor slices with a photoresist material; iii. a heating work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a third spraying work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; vi. an etch tank work station, said etch tank work station including: a. a tank for containing an etch solution; b. a plurality of ramps extending from a portion of a conveyor means into different portions of said tank; c. means for transporting semiconductor slices through said tank at a uniform rate, said means for transporting being mounted in said tank; and d. means for selecting which one of said plurality of ramps a semiconductor slice is conveyed through in accordance with tHe requirements of each particular slice transported through said tank; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station;
Claim 10
Dependent Claim
199 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices wherein said semiconductor slices each have a plurality of binary coded notches on their respective edges, including: i. a slice reader work station for generating a signal responsive to the binary coded notches on said semiconductor slices as they respectively pass therethrough whereby said semiconductor slices are conveyed through said manufacturing system in their respective order; ii. a first spraying work station for individually cleaning semiconductor slices; iii. a second spraying work station for individually coating said semiconductor slices with a photoresist material; iv. a heating work station for curing said photo-resist material on said slices; v. an aligning and exposing work station for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; vi. a third work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station.
Claim 11
Dependent Claim
199 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices wherein said semiconductor slices each have a plurality of binary coded notches on their respective edges, including: i. a slice reader work station for generating a signal responsive to the binary coded notches on said semiconductor slices as they respectively pass therethrough whereby said semiconductor slices are conveyed through said manufacturing system in their respective order; ii. a first spraying work station for individually cleaning semiconductor slices; iii. a second spraying work station for individually coating said semiconductor slices with a photoresist material; iv. a heating work station for curing said photo-resist material on said slices; v. an aligning and exposing work station for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; vi. a third work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station.
Claim 12
Dependent Claim
49 words
The system of claim 6 wherein said slice reader work station includes: a. an energy source; b. an energy sensor; and c. means for individually rotating said semiconductor slices relative to said energy source and energy sensor, whereby individual signals are generated responsive to the notches of said slices.
Claim 13
Dependent Claim
132 words
A manufacturing system comprising: a. a plurality of concurrently operating semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material; ii. a work station for curing said photoresist material on said slices; iii. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mark; iv. a developing work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and b. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station.
Claim 14
Dependent Claim
132 words
A manufacturing system comprising: a. a plurality of concurrently operating semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material; ii. a work station for curing said photoresist material on said slices; iii. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mark; iv. a developing work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and b. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station.
Claim 15
Dependent Claim
186 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material; ii. a work station for curing said photoresist material on said slices; iii. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; iv. a developing work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station wherein said means for conveying includes means for generating an air cushion and propelling jet along said predetermined path to carry said semiconductor slices from work station to work station and wherein each work station includes means for geNerating a vacuum to overcome said air cushion and thereby stop a semi-conductor slice at such work station.
Claim 16
Dependent Claim
186 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material; ii. a work station for curing said photoresist material on said slices; iii. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; iv. a developing work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station wherein said means for conveying includes means for generating an air cushion and propelling jet along said predetermined path to carry said semiconductor slices from work station to work station and wherein each work station includes means for geNerating a vacuum to overcome said air cushion and thereby stop a semi-conductor slice at such work station.
Claim 17
Dependent Claim
176 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material: ii. a work station for curing said photoresist material on said slices; iii. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; iv. a developing work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station wherein said means for conveying includes an air track having holes formed therein through which compressed air is directed to carry said semiconductor slice from work station to work station and said work station for curing includes means for heating a portion of said air track.
Claim 18
Dependent Claim
176 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material: ii. a work station for curing said photoresist material on said slices; iii. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; iv. a developing work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station wherein said means for conveying includes an air track having holes formed therein through which compressed air is directed to carry said semiconductor slice from work station to work station and said work station for curing includes means for heating a portion of said air track.
Claim 19
Dependent Claim
146 words
A manufacturing system comprising: A. a plurality of concurrently operating semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually cleaning said semiconductor slices prior to coating said slices; ii. a work station for individually coating semiconductor slices with a photoresist material; iii. a work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a developing work station for removing portions of the photoresist layer on said individual slices which portions where not exposed to light at said aligning and exposing work station; B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station.
Claim 20
Dependent Claim
146 words
A manufacturing system comprising: A. a plurality of concurrently operating semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually cleaning said semiconductor slices prior to coating said slices; ii. a work station for individually coating semiconductor slices with a photoresist material; iii. a work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a developing work station for removing portions of the photoresist layer on said individual slices which portions where not exposed to light at said aligning and exposing work station; B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station.
Claim 21
Dependent Claim
223 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material; ii. a work station for curing said photoresist material on said slices; iii. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; iv. a developing work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; v. an etch tank work station, said etch tank work station including: a. a tank for containing an etch solution; b. a plurality of ramps extending from a portion of said conveyor means into different portions of said tank; c. means for transporting said semiconductor slices through said tank at a uniform rate, said means for transporting being mounted in said tank; and d. means for selecting which one of said plurality of ramps a semiconductor slice is conveyed through in accordance with the requirements of each particular slice transported through said tank; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station.
Claim 22
Dependent Claim
223 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material; ii. a work station for curing said photoresist material on said slices; iii. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; iv. a developing work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; v. an etch tank work station, said etch tank work station including: a. a tank for containing an etch solution; b. a plurality of ramps extending from a portion of said conveyor means into different portions of said tank; c. means for transporting said semiconductor slices through said tank at a uniform rate, said means for transporting being mounted in said tank; and d. means for selecting which one of said plurality of ramps a semiconductor slice is conveyed through in accordance with the requirements of each particular slice transported through said tank; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station.
Claim 23
Dependent Claim
185 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor Slices wherein said semiconductor slices each have a plurality of binary coded notches on their respective edges, including: i. a slice reader work station for generating a signal responsive to the binary coded notches on said semiconductor slices as they respectively pass therethrough whereby said semiconductor slices are conveyed through said manufacturing system in their respective order; ii. a work station for individually coating semiconductor slices with a photoresist material; iii. a work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a developing work station for removing portions of the photoresist layer on said individual slices which portions are not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station.
Claim 24
Dependent Claim
185 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor Slices wherein said semiconductor slices each have a plurality of binary coded notches on their respective edges, including: i. a slice reader work station for generating a signal responsive to the binary coded notches on said semiconductor slices as they respectively pass therethrough whereby said semiconductor slices are conveyed through said manufacturing system in their respective order; ii. a work station for individually coating semiconductor slices with a photoresist material; iii. a work station for curing said photoresist material on said slices; iv. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; v. a developing work station for removing portions of the photoresist layer on said individual slices which portions are not exposed to light at said aligning and exposing work station; and B. means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station.
Claim 25
Dependent Claim
49 words
The system of claim 13 wherein said slice reader work station includes: a. an energy source; b. an energy sensor; and c. means for individually rotating said semiconductor slices relative to said energy source and energy sensor, whereby individual signals are generated responsive to the notches of said slices.
Claim 26
Dependent Claim
180 words
A manufacturing system comprising: a. a plurality of concurrently operating semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material; ii. a work station for curing said photoresist material; iii. an aligning and exposing work statiOn for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; iv. a work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; b. means for conveying a series of individual semiconductor slices along a predetermined path from work station to work station; and c. computer means controlling all of said processing stations and said means for conveying and being programmed to regulate the initiation, progress, and termination of each operation performed on each individual slice at each process station and to regulate the progress of each individual slice along said predetermined path of said means for conveying.
Claim 27
Dependent Claim
180 words
A manufacturing system comprising: a. a plurality of concurrently operating semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material; ii. a work station for curing said photoresist material; iii. an aligning and exposing work statiOn for individually aligning said semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; iv. a work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; b. means for conveying a series of individual semiconductor slices along a predetermined path from work station to work station; and c. computer means controlling all of said processing stations and said means for conveying and being programmed to regulate the initiation, progress, and termination of each operation performed on each individual slice at each process station and to regulate the progress of each individual slice along said predetermined path of said means for conveying.
Claim 28
Dependent Claim
46 words
The system of claim 15 wherein the control by said computer means of at least one of said work stations is dependent on signals to said computer means from said one work station and signals to said computer means from at least one other work station.
Claim 29
Dependent Claim
155 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material; ii. a work station for curing said photoresist material on said slices; iii. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; iv. a developing work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station including means for generating an air cushion and propelling jet along said predetermined path to carry said semiconductor slices from work station to work station.
Claim 30
Dependent Claim
155 words
A manufacturing system comprising: A. a plurality of semiconductor processing stations, each station performing a single manufacturing operation on individual semiconductor slices including: i. a work station for individually coating semiconductor slices with a photoresist material; ii. a work station for curing said photoresist material on said slices; iii. an aligning and exposing work station for individually aligning said coated semiconductor slices with a patterned mask and exposing said aligned slices to a light source through said mask; iv. a developing work station for removing portions of the photoresist layer on said individual slices which portions were not exposed to light at said aligning and exposing work station; and B means for conveying a series of said individual semiconductor slices along a predetermined path from work station to work station including means for generating an air cushion and propelling jet along said predetermined path to carry said semiconductor slices from work station to work station.
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USPTO Annuity & Maintenance Windows
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|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-10-15 | 1977-04-16 | 1977-10-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-10-15 | 1981-04-16 | 1981-10-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-10-15 | 1985-04-16 | 1985-10-16 | $7700.00 | Window Closed / Lapsed |