Apparatus for mounting crystal

Claim 3

In a deposition or etching reactor system having a thickness monitor positioned in situ to monitor in the chamber of the reactor deposition or reduction in thickness of a film of material on the surface of a specimen, said monitor being of the type having a crystal-controlled oscillator; said system being capable of operating at temperatures up to and on the order of 250° C., characterized by: means for supporting a crystal having top and bottom major planar surfaces in a generally horizontal position within a metallic housing of good thermal stability such that heat of the housing heats the crystal and such that a portion of the crystal bottom surface is exposed to the reactor ambient to be subject to deposition or etching reactions within said chamber; means for controlling the temperature of said housing to a predetermined temperature whereby the temperature of the crystal is controlled to a substantially constant temperature; first electrode means comprising three commonly electrically connected electrodes arranged to contact by resting on said top crystal surface in a common plane to provide continuous electrical contact therewith; second electrode means comprising a ring-like conductive member supporting the bottom crystal surface by the combined weight of said crystal and said three-commonly connected electrodes resting on said top crystal surface to provide electrical contact with said bottom crystal surface; and conductor means connecting, respectively, said first and second electrode means to an oscillator, the frequency of said oscillator being determined by the frequency of said crystal, wherein said first electrode means comprises said three vertically oriented pins rigidly attached at the upper end respectively of each pin to a planar member of relatively large mass compared to the mass of said pins, insulator tubular means for guiding each of said three respective pins downwardly in a generally vertical path, said tubes being of substantially larger inside diameter than the outside diameter of said pins so that the lower end of each of said respective pins maintains contact with said top crystal surface even with temperature-induced surface deformations.

Claim 4

In a deposition or etching reactor system having a thickness monitor positioned in situ to monitor in the chamber of the reactor deposition or reduction in thickness of a film of material on the surface of a specimen, said monitor being of the type having a crystal-controlled oscillator; said system being capable of operating at temperatures up to and on the order of 250° C., characterized by: means for supporting a crystal having top and bottom major planar surfaces in a generally horizontal position within a metallic housing of good thermal stability such that heat of the housing heats the crystal and such that a portion of the crystal bottom surface is exposed to the reactor ambient to be subject to deposition or etching reactions within said chamber; means for controlling the temperature of said housing to a predetermined temperature whereby the temperature of the crystal is controlled to a substantially constant temperature; first electrode means comprising three commonly electrically connected electrodes arranged to contact by resting on said top crystal surface in a common plane to provide continuous electrical contact therewith; second electrode means comprising a ring-like conductive member supporting the bottom crystal surface by the combined weight of said crystal and said three-commonly connected electrodes resting on said top crystal surface to provide electrical contact with said bottom crystal surface; and conductor means connecting, respectively, said first and second electrode means to an oscillator, the frequency of said oscillator being determined by the frequency of said crystal, wherein said first electrode means comprises said three vertically oriented pins rigidly attached at the upper end respectively of each pin to a planar member of relatively large mass compared to the mass of said pins, insulator tubular means for guiding each of said three respective pins downwardly in a generally vertical path, said tubes being of substantially larger inside diameter than the outside diameter of said pins so that the lower end of each of said respective pins maintains contact with said top crystal surface even with temperature-induced surface deformations.

Claim 5

The system of claim 2 wherein said reactor system is a glow discharge system for depositing amorphous silicon on a substrate.

Claim 6

The system of claim 2 wherein said reactor is operated to provide plasma etching of a wafer having a layer of material, said crystal being coated with a film of said material on the bottom surface thereof, said crystal film being reduced in thickness as the surface of said wafer is etched, the frequency of said oscillator changing as a function of the reduction of film thickness on said crystal.

Claim 7

The system of claim 2 where said crystal is positioned within said housing so that stray radio frequency fields are substantially shielded from said crystal.