Transistor structure for high temperature logic circuits with insulation around source and drain regions

Claim 2

A field effect transistor device, comprising: a homogeneous monocrystalline silicon substrate having a surface and a thickness, and being of a first conductivity type and doping concentration substantially throughout its thickness, except as hereinafter defined; a source region of a second conductivity type, said source region being recessed in the substrate and adjacent the substrate surface and having a surface in the substrate; a drain region, spaced apart from the source region and being of the second conductivity type, said drain region being recessed in the substrate and adjacent the substrate surface and having a surface in the substrate; a channel region in said monocrystalline substrate disposed between the closest portions of the respective surfaces of the source and drain regions within the substrate, a channel in said channel region adjacent said substrate surface and being shallow relative to the greatest spacings of said surfaces of the source and drain regions from the substrate surface; source and drain region insulating layers, respectively contacting substantially the entirety of those portions of the surfaces of the source and drain regions disposed in said substrate, including the majority of facing surface portions of said source and drain regions but not including those facing surface portions intersecting the channel region; and an electronic gate on the substrate surface adjacent the channel region for affecting the electric field in the channel region.

Claim 3

The field effect transistor device of claim 1, wherein said second conductivity type is opposite said first conductivity type.

Claim 4

A field effect transistor device comprising: a homogeneous monocrystalline silicon substrate having a surface and a thickness, and being of a first conductivity type and doping concentration substantially throughout its thickness, except as hereinafter defined a source region of a second conductivity type, said source region being recessed in the substrate adjacent the substrate surface and having a bottom surface in the substrate and one or more side surfaces disposed between said substrate surface and said bottom surface; a drain region, spaced apart from the source region and being of the second conductivity type, said drain region being recessed in the substrate adjacent the substrate surface and having a bottom surface in the substrate and one or more side surfaces disposed between said substrate surface and said bottom surface; a channel region in said monocrystalline substrate connecting the closest portions of the respective side surfaces of the source and drain regions, said channel region having an electrically conducting surface path that is shallow relative to the spacings of the bottom surfaces of the source and drain regions from the substrate surface, effective to interconnect said source and drain regions along the substrate surface but not along a plane between bottom surfaces of the source and drain regions; source and drain region insulating layers, respectively contacting those portions of the surfaces of the source and drain regions disposed in substrate portions away from the channel region; and an electronic gate on the substrate surface adjacent the channel regions for affecting the electric fields in the channel region.

Claim 5

A field effect transistor device comprising: a homogeneous monocrystalline silicon substrate having a surface and a thickness, and being of a first conductivity type and doping concentration substantially throughout its thickness, except as hereinafter defined a source region of a second conductivity type, said source region being recessed in the substrate adjacent the substrate surface and having a bottom surface in the substrate and one or more side surfaces disposed between said substrate surface and said bottom surface; a drain region, spaced apart from the source region and being of the second conductivity type, said drain region being recessed in the substrate adjacent the substrate surface and having a bottom surface in the substrate and one or more side surfaces disposed between said substrate surface and said bottom surface; a channel region in said monocrystalline substrate connecting the closest portions of the respective side surfaces of the source and drain regions, said channel region having an electrically conducting surface path that is shallow relative to the spacings of the bottom surfaces of the source and drain regions from the substrate surface, effective to interconnect said source and drain regions along the substrate surface but not along a plane between bottom surfaces of the source and drain regions; source and drain region insulating layers, respectively contacting those portions of the surfaces of the source and drain regions disposed in substrate portions away from the channel region; and an electronic gate on the substrate surface adjacent the channel regions for affecting the electric fields in the channel region.

Claim 6

The field effect transistor device of claim 3, wherein said second conductivity type is opposite said first conductivity type.

Claim 7

The field effect transistor device of claim 3, wherein said bottom surfaces of said source and drain regions are substantially planar.

Claim 8

The field effect transistor device of claim 3, wherein said closest portions of the respective side surfaces of the source and drain regions are substantially planar surfaces.

Claim 9

The field effect transistor device of claim 6, wherein said closest portions of the respective side surfaces of the source and drain regions are substantially parallel and perpendicular to the substrate surface in the vicinity of the channel.