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US4830890A
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Method for forming a deposited film from a gaseous silane compound heated on a substrate and introducing an active species therewith
Assignee: Canon Inc
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Filing: 1986-12-22
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Granted: 1989-05-16
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Expires: 2006-12-22
Abstract
Abstract A process for forming a deposited film which comprises introducing a linear, branched or cyclic gaseous silane compound represented by a general formula: SixHyXz wherein X stands for a halogen atom, x is an integer 3, 4, 5 or 6, and y+z=2x or 2x+2; into a film forming space for forming a deposited film on a substrate, activating said silane compound on the surface of the heated substrate to generate a precursor functioning as a raw material for forming the deposited film, generating an active species capable of an interaction with said precursor in a separate activating space, and introducing said active species into the film forming space to form a deposited film on said substrate.
Inventors
- 👤 Masahiro Kanai
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:19
CPC Classifications
H; H10; H10F; H10F71/00; H10F71/10; H10F71/103; C; C23; C23C; C23C16/00; C23C16/22; C23C16/24; H10F77/00; H10F77/10; H10F77/16; H10F77/169; H10F77/1692; H10P; H10P14/00; H10P14/20; H10P14/24; H10P14/29; H10P14/2901; H10P14/2922; H10P14/2923; H10P14/32; H10P14/3202; H10P14/3204; H10P14/3211; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411; H10P14/3438; H10P14/3441; H10P14/3442; H10P14/3444; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02P; Y02P70/00; Y02P70/50
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
138 words
A process for forming a deposited film comprising the steps of heating a substrate in a film-forming space; introducing a gaseous silane compound into the film-forming space; activating the silane compound on the surface of the heated substrate to generate a precursor functioning as a raw material for forming the deposited film; generating in a separate activating space an active species capable of interacting with the precursor; and introducing the active species into the film-forming space to thereby form a deposited film on the substrate without the use of external discharge energy in the film-forming space; said gaseous silane compound being a linear, branched or cyclic gaseous silane compound having the formula: Si.sub.x H.sub.y X.sub.z wherein X is a halogen atom, x is 3, 4, 5 or 6; y and z are positive integers, and y+z=2x or 2x+2.
Claim 2
Dependent Claim
138 words
A process for forming a deposited film comprising the steps of heating a substrate in a film-forming space; introducing a gaseous silane compound into the film-forming space; activating the silane compound on the surface of the heated substrate to generate a precursor functioning as a raw material for forming the deposited film; generating in a separate activating space an active species capable of interacting with the precursor; and introducing the active species into the film-forming space to thereby form a deposited film on the substrate without the use of external discharge energy in the film-forming space; said gaseous silane compound being a linear, branched or cyclic gaseous silane compound having the formula: Si.sub.x H.sub.y X.sub.z wherein X is a halogen atom, x is 3, 4, 5 or 6; y and z are positive integers, and y+z=2x or 2x+2.
Claim 3
Dependent Claim
17 words
A process for forming a deposited film according to claim 1, wherein X is F or Cl.
Claim 4
Dependent Claim
17 words
A process for forming a deposited film according to claim 1, wherein y ranges 0≦y≦2x-2 if y+z=2x.
Claim 5
Dependent Claim
17 words
A process for forming a deposited film according to claim 1, wherein y ranges 0≦y≦2x if y+z=2x+2.
Claim 6
Dependent Claim
17 words
A process for forming a deposited film according to claim 1, wherein y ranges 0≦y≦2x-4 if y+z=2x.
Claim 7
Dependent Claim
17 words
A process for forming a deposited film according to claim 1, wherein y ranges 0≦y≦2x-2 if y+z=2x+2.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-05-15 | 1992-11-14 | 1993-05-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-05-15 | 1996-11-14 | 1997-05-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-05-15 | 2000-11-14 | 2001-05-16 | $7700.00 | Window Closed / Lapsed |