EP0090586A1
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Gas flow in plasma treatment processes
Assignee: Fujitsu Ltd
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Filing: 1983-03-22
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Granted: —
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Expires: 2003-03-22
Abstract
Abstract in a process and apparatus for plasma treatment by the use of a separately provided plasma generating chamber (27) and a treating chamber (30) in which an activated gas excited in the plasma generating chamber is introduced into the treating chamber, the gas is distributed within the treating chamber by means of a gas diffusing plate (25) before being brought into contact with a material to be treated (33). The use of such a diffusing plate can enable more uniform treatment to be carried out.
Inventors
- 👤 Shuzo Fujimura
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-03 08:07
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; C; C23; C23C; C23C16/00; C23C16/44; C23C16/448; C23C16/452; C23C16/455
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
108 words
Apparatus for carrying out a plasma treatment process, which apparatus includes a plasma generation chamber in which a working gas is activated when the apparatus is in use and a treatment chamber for containing an item to be treated in the said process, the treatment chamber having an inlet aperture through which activated working gas passes into that chamber from the plasma generation chamber when the apparatus is in use, characterized in that baffle means are supported in the said treatment chamber in confronting relationship with the said inlet aperture so as to be interposed between that aperture and such an item when the apparatus is in use.
Claim 2
Dependent Claim
108 words
Apparatus for carrying out a plasma treatment process, which apparatus includes a plasma generation chamber in which a working gas is activated when the apparatus is in use and a treatment chamber for containing an item to be treated in the said process, the treatment chamber having an inlet aperture through which activated working gas passes into that chamber from the plasma generation chamber when the apparatus is in use, characterized in that baffle means are supported in the said treatment chamber in confronting relationship with the said inlet aperture so as to be interposed between that aperture and such an item when the apparatus is in use.
Claim 3
Dependent Claim
34 words
Apparatus as claimed in claim 1, wherein the gas-flow path between the plasma generation chamber and the treatment chamber is provided with flow-control means whereby the conductance of that path can be selectively changed.
Claim 4
Dependent Claim
30 words
Apparatus as claimed in claim 2, wherein such change of the said conductance is effected by changing the area of an opening through which the gas flows along said path.
Claim 5
Dependent Claim
20 words
Apparatus as claimed in claim 2 or 3, wherein the said flow-control means are provided at the said inlet aperture.
Claim 6
Dependent Claim
19 words
Apparatus as claimed in any preceding claim, wherein the effective baffle-area of the said baffle means can be changed.
Claim 7
Dependent Claim
29 words
Apparatus as claimed in any preceding claim, wherein the baffle means are adjustably mounted to permit selective variation of the distance between the inlet aperture and the baffle means.
Claim 8
Dependent Claim
41 words
Apparatus as claimed in any preceding claim, wherein the baffle means are adjust ably mounted to permit selective variation oi the angle between the axis of gas flow through the said inlet aperture and a main plane of the baffle means.
Claim 9
Dependent Claim
57 words
Apparatus as claimed in any preceding claim, wherein a gas-confining barrier is provided within the treatment chamber, in surrounding relationship to the said baffle means, to confine the activated gas laterally to a restricted region of the treatment chamber as the gas passes from the inlet aperture to such an item when the apparatus is in use.
Claim 10
Dependent Claim
88 words
A process for plasma treatment by the use of a separately provided plasma generating chamber and a treating chamber which comprises: introducing an activated gas excited in the plasma generating chamber into the treating chamber from an activated gas opening; distributing the activated gas within the treating chamber by means of a gas diffusing means provided in frontof the activated gas opening; and bringing the activated gas into contact with the surface of a material to be treated downstream of the gas diffusing means within the treating chamber.
Claim 11
Dependent Claim
88 words
A process for plasma treatment by the use of a separately provided plasma generating chamber and a treating chamber which comprises: introducing an activated gas excited in the plasma generating chamber into the treating chamber from an activated gas opening; distributing the activated gas within the treating chamber by means of a gas diffusing means provided in frontof the activated gas opening; and bringing the activated gas into contact with the surface of a material to be treated downstream of the gas diffusing means within the treating chamber.
Claim 12
Dependent Claim
19 words
A process as claimed in claim 9, using apparatus as claimed in any one of claims 2 to 8.
References Cited (Backward Citations)
GB2076587A
Cited
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