Positive-working radiation-sensitive coating solution and positive photoresist material with monomethyl ether of 1,2-propanediol as solvent

Claim 2

A positive-working radiation-sensitive coating solution suitable as a photoresist, consisting essentially of, in admixture, (i) at least one polymeric binder which is soluble or swellable in alkaline media and soluble in monomethyl ether of 1,2 propanediol said binder being present in an amount between about 30 and 90 percent by weight, relative to the total solids of said coating solution; (ii) a sufficient amount of at least one radiation-sensitive compound to impart radiation sensitivity to said coating solution; and (iii) an organic solvent present in an amount sufficient to solubilize said binder, which organic solvent consists essentially of a monomethyl ether of 1,2 propanediol in an amount of between about 80% and 100% by weight of said organic solvent.

Claim 3

A coating solution as claimed in claim 1, wherein said radiation-sensitive compound is a 1,2-naphthoquinone-2-diazide.

Claim 4

A coating solution as claimed in claim 1, comprising a radiation-sensitive combination of (a) a compound containing at least one C--O--C bond which can be split by acid and (b) a compound which upon irradiation forms a strong acid.

Claim 5

A coating solution as claimed in claim 1, wherein said polymeric binder comprises a novolak.

Claim 6

A coating solution as claimed in claim 1, wherein said organic solvent comprises 1-methoxypropane-2-ol.

Claim 7

A coating solution as claimed in claim 1, wherein said organic solvent consists essentially of said ether.

Claim 8

A coating solution as claimed in claim 6, wherein said organic solvent consists of said ether.

Claim 9

A coating solution as claimed in claim 1, said coating solution consisting essentially of said components (i), (ii) and (iii).

Claim 10

A photoresist material, comprising a support and a light-sensitive layer provided on said support, said layer being the product of a process comprising the step of coating said support with a positive-working radiation-sensitive coating solution which is suitable as a photoresist and which consists essentially of, in admixture, (i) at least one polymeric binder which is soluble or swellable in alkaline media and soluble in monomethyl ether of 1,2 propanediol said binder being present in an amount between about 30 and 90 percent by weight, relative to the total solids of said coating solution; (ii) a sufficient amount of at least one radiation-sensitive compound to impart radiation sensitivity to said coating solution; and (iii) an organic solvent present in an amount sufficient to solubilize said binder, which organic solvent consists essentially of a monomethyl ether of 1,2 propanediol in an amount of between about 80% and 100% by weight of said organic solvent, such that said light-sensitive layer contains, after drying, about 1% of said organic solvent.

Claim 11

A photoresist material, comprising a support and a light-sensitive layer provided on said support, said layer being the product of a process comprising the step of coating said support with a positive-working radiation-sensitive coating solution which is suitable as a photoresist and which consists essentially of, in admixture, (i) at least one polymeric binder which is soluble or swellable in alkaline media and soluble in monomethyl ether of 1,2 propanediol said binder being present in an amount between about 30 and 90 percent by weight, relative to the total solids of said coating solution; (ii) a sufficient amount of at least one radiation-sensitive compound to impart radiation sensitivity to said coating solution; and (iii) an organic solvent present in an amount sufficient to solubilize said binder, which organic solvent consists essentially of a monomethyl ether of 1,2 propanediol in an amount of between about 80% and 100% by weight of said organic solvent, such that said light-sensitive layer contains, after drying, about 1% of said organic solvent.

Claim 12

A photoresist material as claimed in claim 9, wherein said organic solvent consists essentially of said ether.

Claim 13

A photoresist material as claimed in claim 10, wherein said organic solvent consists of said ether.

Claim 14

A photoresist material as claimed in claim 9, wherein said organic solvent comprises 1-methoxypropane-2-ol.

Claim 15

A photoresist material according to claim 9, wherein said organic solvent further consists essentially of a second, higher-boiling organic solvent, such that up to 2% of said higher-boiling solvent remains in said layer after drying.