US3586504A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresist developers and methods
Assignee: Eastman Kodak Co
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Filing: 1969-10-24
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Granted: 1971-06-22
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Expires: 1989-10-24
Abstract
Abstract ALKYLPHENOXY POLY(HYDROXYALKYLENE OXIDE), E.G., PNONYLPHENOXY POLYGLYCIDOL, ARE INCLUDED IN AQUEOUS ALKALI SOLUTIONS WHICH ARE USED IN METHODS FOR DEVELOPING PHOTORESIST COMPOSITIONS WHICH ON EPXOSURE TO LIGHT IMAGE ARE CONVERTED IN EXPOSED AREAS FROM AQUEOUS ALKALI INSOLUBLE TO AQUEOUS ALKALI SOLUBLE.
Inventors
- 👤 Alfred E Coates
- 👤 Bertalan J Vegh
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 12:52
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-06-21 | 1974-12-21 | 1975-06-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-06-21 | 1978-12-21 | 1979-06-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-06-21 | 1982-12-21 | 1983-06-22 | $7700.00 | Window Closed / Lapsed |