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US4248957A Expired / Lapsed US ⏱️ 0.0 years remaining

Acid degradable radiation-sensitive mixture

Assignee: Hoechst AG
•
Filing: 1979-07-05
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Granted: 1981-02-03
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Expires: 1999-07-05
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Abstract

Abstract This invention relates to an improvement in a radiation-sensitive mixture containing (a) a compound which forms an acid under the influence of actinic radiation and (b) a compound which has at least one acid-cleavable C--O--C group and the solubility of which in a liquid developer is increased by the action of an acid, the improvement that the compound which is capable of being cleft by an acid contains at least one enol ether group as the acid-cleavable group. The invention also relates to a process for producing relief images using the radiation-sensitive mixture.

Inventors

  • 👤 Jurgen Sander
  • 👤 Detlef Skaletz
  • 👤 Gerhard Buhr
  • 👤 Gerhard Lohaus

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 11:37
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/0045; G03F7/016; G03F7/022

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 189 words
In a radiation-sensitive mixture containing (a) a compound which forms an acid under the influence of actinic radiation and (b) a compound which has at least one acid-cleavable C--O--C group and the solubility of which in a liquid developer is increased by the action of an acid, the improvement that compound (b) corresponds either to the general formula I ##STR15## wherein R 1 is an n-valent aliphatic group which has at least 2 carbon atoms, R 2 , R 3 , & R 4 are identical or different and are hydrogen atoms, alkyl or aryl groups or any two thereof are linked to form a saturated or olefinically unsaturated ring, and n is an integer from 1 to 4, or to the general formula II ##STR16## wherein R 2 and R 2 ' are groups which differ from each other, one of the groups representing the --O-group and the other a hydrogen atom, an alkyl or aryl group, R 5 to R 10 are identical or different and are hydrogen atoms or halogen atoms, alkyl, aryl or alkoxy groups, and R 1 and n have the meanings stated above.
Claim 2
Dependent Claim 189 words
In a radiation-sensitive mixture containing (a) a compound which forms an acid under the influence of actinic radiation and (b) a compound which has at least one acid-cleavable C--O--C group and the solubility of which in a liquid developer is increased by the action of an acid, the improvement that compound (b) corresponds either to the general formula I ##STR15## wherein R 1 is an n-valent aliphatic group which has at least 2 carbon atoms, R 2 , R 3 , & R 4 are identical or different and are hydrogen atoms, alkyl or aryl groups or any two thereof are linked to form a saturated or olefinically unsaturated ring, and n is an integer from 1 to 4, or to the general formula II ##STR16## wherein R 2 and R 2 ' are groups which differ from each other, one of the groups representing the --O-group and the other a hydrogen atom, an alkyl or aryl group, R 5 to R 10 are identical or different and are hydrogen atoms or halogen atoms, alkyl, aryl or alkoxy groups, and R 1 and n have the meanings stated above.
Claim 3
Dependent Claim 14 words
A radiation-sensitive mixture according to claim 1 in which n is 1 or 2.
Claim 4
Dependent Claim 14 words
A radiation-sensitive mixture according to claim 1 in which R 2 ' is --O--.
Claim 5
Dependent Claim 35 words
A radiation-sensitive mixture according to claim 1 in which another grouping of the Formula I is present as a substituent in one of the groups R 2 , R 3 , and R 4 .
Claim 6
Dependent Claim 30 words
A radiation-sensitive mixture according to claim 1 in which the compound which is capable of being cleft by an acid has a molecular weight in the range between 250and 800.
Claim 7
Dependent Claim 14 words
A radiation-sensitive mixture according to claim 1 which additionally contains a polymeric water-insoluble binder.
Claim 8
Dependent Claim 16 words
A radiation-sensitive mixture according to claim 6 in which the water-insoluble binder is a phenol resin.
Claim 9
Dependent Claim 25 words
A radiation-sensitive mixture according to claim 1 in which the compound (a) which forms an acid under the influence of actinic radiation is a 2-aryl-4,6-bis-trichloromethyl-s-triazine.

References Cited (Backward Citations)

US2891712A Cited
US3932514A Cited
US3779778A Cited
US3915704A Cited
US3917483A Cited
US3915706A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1984-02-03 1984-08-04 1985-02-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1988-02-03 1988-08-04 1989-02-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1992-02-03 1992-08-04 1993-02-03 $7700.00 Window Closed / Lapsed

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