US4411983A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for processing an image-forming material
Assignee: Fujifilm Holdings Corp
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Filing: 1982-03-11
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Granted: 1983-10-25
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Expires: 2002-03-11
Abstract
Abstract By treating an imagewise exposed and developed image-forming material comprising a support and a light-sensitive resin composition layer with organic solvents miscible with water or with a mixture of water and organic solvents miscible with water, elimination of non-image areas is completed.
Inventors
- 👤 Yasuo Washizawa
- 👤 Fumiaki Shinozaki
- 👤 Tomoaki Ikeda
- 👤 Sho Nakao
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 15:54
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
141 words
In a method of processing an image-forming material comprising a support having thereon an alkaline solution developable light-sensitive resin composition layer developable by fall-off development including image-wise exposure followed by contact with an alkaline developer solution and mechanical abrasion, the improvement which comprises said method comprising the sequential steps of (1) imagewise exposing said image-forming material, (2) contacting said image-wise exposed image-forming material obtained in (1) with said alkaline developer solution, and (3) subsequently treating the developer solution-contacted image-forming material obtained in (2) with a mixture of water and an organic solvent miscible with water in a volume ratio of water to organic solvent of 100:0.2 to 100:10, said organic solvent being selected from the group consisting of ethylene glycol monophenyl ether, benzyl alcohol, ethylene glycol monobutyl ether, ethylene glycol monoethyl ether, ethylene glycol monomethyl ether and diethylene glycol monomethyl ether.
Claim 2
Dependent Claim
141 words
In a method of processing an image-forming material comprising a support having thereon an alkaline solution developable light-sensitive resin composition layer developable by fall-off development including image-wise exposure followed by contact with an alkaline developer solution and mechanical abrasion, the improvement which comprises said method comprising the sequential steps of (1) imagewise exposing said image-forming material, (2) contacting said image-wise exposed image-forming material obtained in (1) with said alkaline developer solution, and (3) subsequently treating the developer solution-contacted image-forming material obtained in (2) with a mixture of water and an organic solvent miscible with water in a volume ratio of water to organic solvent of 100:0.2 to 100:10, said organic solvent being selected from the group consisting of ethylene glycol monophenyl ether, benzyl alcohol, ethylene glycol monobutyl ether, ethylene glycol monoethyl ether, ethylene glycol monomethyl ether and diethylene glycol monomethyl ether.
Claim 3
Dependent Claim
20 words
The method of claim 1, wherein said treatment with said organic solvent is carried out at 10° to 60° C.
Claim 4
Dependent Claim
14 words
The method of claim 1, wherein said light-sensitive resin is a photopolymerizable light-sensitive resin.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-10-24 | 1987-04-25 | 1987-10-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-10-24 | 1991-04-25 | 1991-10-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-10-24 | 1995-04-25 | 1995-10-25 | $7700.00 | Window Closed / Lapsed |