Patent US4584026A successfully refreshed from Google Patents.
US4584026A
Expired / Lapsed
US
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Ion-implantation of phosphorus, arsenic or boron by pre-amorphizing with fluorine ions
Assignee: Intersil Corp
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Filing: 1984-07-25
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Granted: 1986-04-22
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Expires: 2004-07-25
Abstract
Abstract A process of forming a low-dose ion implant of one or more of phosphorus, arsenic or boron is described. The desired impurity ion implant is preceded by an amorphizing implant of at least about 10 15 ions/cm 2 of fluorine ions. The implants are advantageously annealed at a temperature below about 800° C.
Inventors
- 👤 Chung P. Wu
- 👤 George L. Schnable
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 20:22
CPC Classifications
H; H10; H10P; H10P30/00; H10P30/20; H10P30/202; H10P30/204; H10P30/208; H10P30/21; H10P30/28; H10P95/00; H10P95/90; Y; Y10; Y10S; Y10S148/00; Y10S148/024
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
90 words
A process of forming a low-dose ion implantation of one or more impurity ions selected from phosphorus, arsenic and boron comprising the sequential steps of: implanting the substrate with a dosage of at least about 10 15 ions per square centimeter of fluorine ions: implanting with said impurity ion at a dosage of about 10 14 ions per square centimeter or less; and annealing in an inert ambient at a temperature of below about 800° C., wherein said fluorine ion implant is not substantially deeper than said impurity ion implant.
Claim 2
Dependent Claim
90 words
A process of forming a low-dose ion implantation of one or more impurity ions selected from phosphorus, arsenic and boron comprising the sequential steps of: implanting the substrate with a dosage of at least about 10 15 ions per square centimeter of fluorine ions: implanting with said impurity ion at a dosage of about 10 14 ions per square centimeter or less; and annealing in an inert ambient at a temperature of below about 800° C., wherein said fluorine ion implant is not substantially deeper than said impurity ion implant.
Claim 3
Dependent Claim
20 words
A process in accordance with claim 1, wherein the flourine ion implant is about 2×10 15 ions per square centimeter.
Claim 4
Dependent Claim
20 words
A process in accordance with claim 1, wherein the impurity ion implant is about 5×10 13 ions per square centimeter.
Claim 5
Dependent Claim
13 words
A process in accordance with claim 1, wherein the inert ambient is nitrogen.
Claim 6
Dependent Claim
30 words
A process in accordance with claim 1, wherein said impurity ion is phosphorus and the implant is annealed at a temperature of from about 600° C. to about 700° C.
Claim 7
Dependent Claim
30 words
A process in accordance with claim 1, wherein said impurity ion is arsenic and the implant is annealed at a temperature of from about 700° C. to about 800° C.
Claim 8
Dependent Claim
30 words
A process in accordance with claim 1, wherein said impurity ion is boron and the implant is annealed at a temperature of from about 700° C. to about 800° C.
Claim 9
Dependent Claim
18 words
A process in accordance with claim 1, wherein two or more of said impurity ions are implanted sequentially.
Claim 10
Dependent Claim
20 words
A process in accordance with claim 8, wherein said impurity ions are phosphorus and arsenic implanted sequentially in either order.
Claim 11
Dependent Claim
24 words
A process in accordance with claim 9, wherein said implant is annealed at a temperature of from about 700° C. to about 800° C.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-04-21 | 1989-10-21 | 1990-04-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-04-21 | 1993-10-21 | 1994-04-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-04-21 | 1997-10-21 | 1998-04-22 | $7700.00 | Window Closed / Lapsed |