US8896806B2
Active / In Force
US
⏱️ 3.1 years remaining
Exposure apparatus, exposure method, and device manufacturing method
Assignee: Nikon Corp
•
Filing: 2009-12-22
•
Granted: 2014-11-25
•
Expires: 2029-12-22
Abstract
Abstract An exposure apparatus that exposes a substrate includes: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second surface that is disposed in at least a part of a surrounding of the first surface and at a position lower than the first surface; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers at least a part of the liquid flowing into the space portion. Here, the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Inventors
- 👤 Shinji Sato
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 06:28
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03F7/20; G03F7/2041; G03F7/708; G03F7/70908; G03F7/70916
Claims Analysis
Total Claims: 99
Claim 1
Independent Claim
216 words
An exposure apparatus that exposes a substrate, comprising: an optical system that includes an emission surface from which an exposure light is emitted; a first immersion member having a liquid supply port and a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second immersion member having a second surface that is disposed in at least a part of a surrounding of the first surface and at a position lower than the first surface, the second immersion member being movable relative to the first immersion member; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers at least a part of the liquid flowing into the space portion, wherein the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Claim 2
Dependent Claim
216 words
An exposure apparatus that exposes a substrate, comprising: an optical system that includes an emission surface from which an exposure light is emitted; a first immersion member having a liquid supply port and a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second immersion member having a second surface that is disposed in at least a part of a surrounding of the first surface and at a position lower than the first surface, the second immersion member being movable relative to the first immersion member; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers at least a part of the liquid flowing into the space portion, wherein the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Claim 3
Dependent Claim
21 words
The exposure apparatus according to claim 1 , wherein the first recovery portion recovers the liquid overflowing from the space portion.
Claim 4
Dependent Claim
49 words
The exposure apparatus according to claim 1 , wherein the first recovery portion includes a first recess portion, which is disposed facing upward, outside the space portion in a radial direction about an optical axis of the optical system and recovers the liquid flowing into the first recess portion.
Claim 5
Dependent Claim
27 words
The exposure apparatus according to claim 3 , wherein the first recovery portion includes a recovery port that recovers the liquid flowing into the first recess portion.
Claim 6
Dependent Claim
22 words
The exposure apparatus according to claim 4 , wherein the recovery port is opposed to the bottom of the first recess portion.
Claim 7
Dependent Claim
19 words
The exposure apparatus according to claim 4 , wherein the recovery port is disposed in the first recess portion.
Claim 8
Dependent Claim
22 words
The exposure apparatus according to claim 6 , wherein the recovery port is disposed at the bottom of the first recess portion.
Claim 9
Dependent Claim
18 words
The exposure apparatus according to claim 4 , further comprising a porous member disposed in the recovery port.
Claim 10
Dependent Claim
45 words
The exposure apparatus according to claim 8 , wherein a difference in pressure between at one side and at the other side of the porous member is controlled so that only the liquid passes from one side to the other side of the porous member.
Claim 11
Dependent Claim
25 words
The exposure apparatus according to claim 4 , wherein the recovery port recovers the liquid flowing into the first recess portion along with a gas.
Claim 12
Dependent Claim
18 words
The exposure apparatus according to claim 4 , wherein the second immersion member includes the first recess portion.
Claim 13
Dependent Claim
51 words
The exposure apparatus according to claim 1 , further comprising a top end portion defining a top end of the space portion, wherein at least a part of the first recovery portion is disposed outside the top end portion in the radial direction about the optical axis of the optical system.
Claim 14
Dependent Claim
57 words
The exposure apparatus according to claim 12 , wherein the first recovery portion includes a first recess portion, the bottom of which is formed lower than the top end portion, outside the top end portion in the radial direction about the optical axis of the optical system and recovers the liquid flowing into the first recess portion.
Claim 15
Dependent Claim
66 words
The exposure apparatus according to claim 13 , wherein the first recovery portion includes a liquid guide portion extending in the radial direction about the optical axis of the optical system from the top end portion, and wherein the first recess portion is disposed outside the liquid guide portion in the radial direction about the optical axis of the optical system from the top end portion.
Claim 16
Dependent Claim
20 words
The exposure apparatus according to claim 1 , wherein the first surface and the second surface cannot recover the liquid.
Claim 17
Dependent Claim
17 words
The exposure apparatus according to claim 1 , wherein the second surface is lyophobic to the liquid.
Claim 18
Dependent Claim
31 words
The exposure apparatus according to claim 1 , wherein the first aperture is opposed to the surface of the substrate in at least a part of the exposure of the substrate.
Claim 19
Dependent Claim
27 words
The exposure apparatus according to claim 1 , further comprising a gas supply port disposed in at least a part of a surrounding of the first aperture.
Claim 20
Dependent Claim
19 words
The exposure apparatus according to claim 18 , wherein the gas supply port is disposed in the second surface.
Claim 21
Dependent Claim
80 words
The exposure apparatus according to claim 18 , further comprising a second recess portion that is disposed between the first aperture and the second surface, wherein the second recess portion is opposed to the surface of the substrate in at least a part of the exposure of the substrate, and wherein the gas supply port is disposed in the inner surface defining the second recess portion and supplies the gas thereto to enhance the pressure of the second recess portion.
Claim 22
Dependent Claim
46 words
The exposure apparatus according to claim 18 , further comprising a suction port that is disposed outside the gas supply port in the radial direction about the optical axis of the optical system so as to suck at least one of the liquid and the gas.
Claim 23
Dependent Claim
20 words
The exposure apparatus according to claim 1 , wherein the liquid supply port supplies the liquid to the optical path.
Claim 24
Dependent Claim
48 words
The exposure apparatus according to claim 1 , wherein the optical system includes an optical member that has the emission surface, and wherein the liquid supply port is disposed at a position opposed to a surface of the optical member through which the exposure light does not pass.
Claim 25
Dependent Claim
42 words
The exposure apparatus according to claim 23 , wherein the surface of the optical member through which the exposure light does not pass includes a side surface of the optical member extending to the upside from the edge of the emission surface.
Claim 26
Dependent Claim
46 words
The exposure apparatus according to claim 1 , wherein the second immersion member has another supply port disposed at a position, which faces a first space facing the first surface, outside the first aperture in the radial direction about the optical axis of the optical system.
Claim 27
Dependent Claim
60 words
The exposure apparatus according to claim 1 , wherein the optical system includes an optical member that has the emission surface, and wherein the exposure apparatus further comprises a second recovery portion that recovers the liquid overflowing from a space which faces a side surface of the optical member extending to the upside from the edge of the emission surface.
Claim 28
Dependent Claim
22 words
A device manufacturing method comprising: exposing a substrate using the exposure apparatus according to claim 1 ; and developing the exposed substrate.
Claim 29
Dependent Claim
244 words
An exposure apparatus that exposes a substrate, comprising: an optical system that includes an emission surface from which an exposure light is emitted; a first immersion member having a liquid supply port and a first surface disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second immersion member which has a second surface that is disposed in at least a part of a surrounding of the first surface, the second immersion member being movable relative to the first immersion member; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; a top end portion defining a top end of the space portion; and a first recovery portion of which at least a part is disposed outside the top end portion in a radial direction about an optical axis of the optical system and which recovers at least a part of the liquid flowing into the space portion, wherein the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Claim 30
Dependent Claim
244 words
An exposure apparatus that exposes a substrate, comprising: an optical system that includes an emission surface from which an exposure light is emitted; a first immersion member having a liquid supply port and a first surface disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second immersion member which has a second surface that is disposed in at least a part of a surrounding of the first surface, the second immersion member being movable relative to the first immersion member; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; a top end portion defining a top end of the space portion; and a first recovery portion of which at least a part is disposed outside the top end portion in a radial direction about an optical axis of the optical system and which recovers at least a part of the liquid flowing into the space portion, wherein the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Claim 31
Dependent Claim
171 words
An exposure apparatus that exposes a substrate, comprising: an optical system that includes an emission surface from which an exposure light is emitted; a space portion into which a liquid can flow via a first aperture disposed in at least a part of a surrounding of an optical path of the exposure light and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers the liquid from the space portion, wherein the first recovery portion includes a reservoir portion that collects the liquid from the space portion so as not to return to the space portion, wherein at least a part of the liquid on the substrate is collected in the reservoir portion via the space portion from the first aperture in at least a part of the exposure of the substrate, and wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Claim 32
Dependent Claim
171 words
An exposure apparatus that exposes a substrate, comprising: an optical system that includes an emission surface from which an exposure light is emitted; a space portion into which a liquid can flow via a first aperture disposed in at least a part of a surrounding of an optical path of the exposure light and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers the liquid from the space portion, wherein the first recovery portion includes a reservoir portion that collects the liquid from the space portion so as not to return to the space portion, wherein at least a part of the liquid on the substrate is collected in the reservoir portion via the space portion from the first aperture in at least a part of the exposure of the substrate, and wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Claim 33
Dependent Claim
26 words
The exposure apparatus according to claim 29 , wherein the first recovery portion includes a recovery port that recovers the liquid collected in the reservoir portion.
Claim 34
Dependent Claim
31 words
The exposure apparatus according to claim 29 , wherein the first aperture is opposed to the surface of the substrate in at least a part of the exposure of the substrate.
Claim 35
Dependent Claim
22 words
A device manufacturing method comprising: exposing a substrate using the exposure apparatus according to claim 29 ; and developing the exposed substrate.
Claim 36
Dependent Claim
175 words
An exposure method comprising: opposing a first surface of a first immersion member disposed in at least a part of a surrounding of an optical path of an exposure light emitted from an emission surface of an optical system to a substrate with a first gap interposed therebetween and holding a liquid between the first surface and the substrate, the first immersion member having a liquid supply port; opposing a second surface of a second immersion member disposed in at least a part of a surrounding of the first surface to the substrate with a second gap than the first gap, the second immersion member being movable relative to the first immersion member; recovering at least a part of the liquid flowing into a space portion, which is opened to the atmosphere via a second aperture different from a first aperture, from the first aperture between the first surface and the second surface; and exposing the substrate with the exposure light from the emission surface via the liquid between the emission surface and the substrate.
Claim 37
Dependent Claim
175 words
An exposure method comprising: opposing a first surface of a first immersion member disposed in at least a part of a surrounding of an optical path of an exposure light emitted from an emission surface of an optical system to a substrate with a first gap interposed therebetween and holding a liquid between the first surface and the substrate, the first immersion member having a liquid supply port; opposing a second surface of a second immersion member disposed in at least a part of a surrounding of the first surface to the substrate with a second gap than the first gap, the second immersion member being movable relative to the first immersion member; recovering at least a part of the liquid flowing into a space portion, which is opened to the atmosphere via a second aperture different from a first aperture, from the first aperture between the first surface and the second surface; and exposing the substrate with the exposure light from the emission surface via the liquid between the emission surface and the substrate.
Claim 38
Dependent Claim
22 words
A device manufacturing method comprising: exposing a substrate using the exposure method according to claim 33 ; and developing the exposed substrate.
Claim 39
Dependent Claim
187 words
An exposure method comprising: opposing a first surface of a first immersion member disposed in at least a part of a surrounding of an optical path of an exposure light emitted from an emission surface of an optical system to a substrate with a first gap interposed therebetween and holding a liquid between the first surface and the substrate, the first immersion member having a liquid supply port; opposing a second surface of a second immersion member disposed in at least a part of a surrounding of the first surface to the substrate, the second immersion member being movable relative to the first immersion member; recovering at least a part of the liquid flowing into a space portion, which is opened to the atmosphere via a second aperture different from a first aperture, from the first aperture between the first surface and the second surface outside a top end of the space portion in the radial direction about the optical axis of the optical system; and exposing the substrate with the exposure light from the emission surface via the liquid between the emission surface and the substrate.
Claim 40
Dependent Claim
187 words
An exposure method comprising: opposing a first surface of a first immersion member disposed in at least a part of a surrounding of an optical path of an exposure light emitted from an emission surface of an optical system to a substrate with a first gap interposed therebetween and holding a liquid between the first surface and the substrate, the first immersion member having a liquid supply port; opposing a second surface of a second immersion member disposed in at least a part of a surrounding of the first surface to the substrate, the second immersion member being movable relative to the first immersion member; recovering at least a part of the liquid flowing into a space portion, which is opened to the atmosphere via a second aperture different from a first aperture, from the first aperture between the first surface and the second surface outside a top end of the space portion in the radial direction about the optical axis of the optical system; and exposing the substrate with the exposure light from the emission surface via the liquid between the emission surface and the substrate.
Claim 41
Dependent Claim
128 words
An exposure method comprising: filling an optical path of an exposure light between an emission surface of an optical system and a substrate with a liquid; exposing the substrate with the exposure light from the emission surface via the liquid between the emission surface and the substrate; and recovering at least a part of the liquid on the substrate from a first aperture disposed in at least a part of a surrounding of the optical path via a space portion opened to the atmosphere via a second aperture different from the first aperture, wherein the recovering of at least a part of the liquid includes collecting the liquid from the space portion in a reservoir portion so that the recovered liquid does not return to the space portion.
Claim 42
Dependent Claim
128 words
An exposure method comprising: filling an optical path of an exposure light between an emission surface of an optical system and a substrate with a liquid; exposing the substrate with the exposure light from the emission surface via the liquid between the emission surface and the substrate; and recovering at least a part of the liquid on the substrate from a first aperture disposed in at least a part of a surrounding of the optical path via a space portion opened to the atmosphere via a second aperture different from the first aperture, wherein the recovering of at least a part of the liquid includes collecting the liquid from the space portion in a reservoir portion so that the recovered liquid does not return to the space portion.
Claim 43
Dependent Claim
202 words
An exposure apparatus that exposes a substrate, comprising: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a first recess portion that is disposed in at least a part of a surrounding of the first surface; a first gas supply port that is disposed in an inner surface defining the first recess portion so as to supply a gas, a space portion into which the liquid can flow from a first aperture between the first surface and the first recess portion and which is opened to atmosphere via a second aperture different from the first aperture; and a recovery portion that recovers at least a part of the liquid flowing into the space portion, wherein the surface of the substrate faces the emission surface, the first surface, and the first recess portion in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Claim 44
Dependent Claim
202 words
An exposure apparatus that exposes a substrate, comprising: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a first recess portion that is disposed in at least a part of a surrounding of the first surface; a first gas supply port that is disposed in an inner surface defining the first recess portion so as to supply a gas, a space portion into which the liquid can flow from a first aperture between the first surface and the first recess portion and which is opened to atmosphere via a second aperture different from the first aperture; and a recovery portion that recovers at least a part of the liquid flowing into the space portion, wherein the surface of the substrate faces the emission surface, the first surface, and the first recess portion in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Claim 45
Dependent Claim
62 words
The exposure apparatus according to claim 37 , further comprising a second surface that is disposed in at least a part of a surrounding of the first recess portion and directed in the same direction as the first surface, wherein the surface of the substrate is opposed to the second surface in at least a part of the exposure of the substrate.
Claim 46
Dependent Claim
19 words
The exposure apparatus according to claim 38 , wherein the second surface is disposed lower than the first surface.
Claim 47
Dependent Claim
20 words
The exposure apparatus according to claim 39 , further comprising a second gas supply port disposed in the second surface.
Claim 48
Dependent Claim
16 words
The exposure apparatus according to claim 38 , wherein the second surface cannot recover the liquid.
Claim 49
Dependent Claim
17 words
The exposure apparatus according to claim 38 , wherein the second surface is lyophobic to the liquid.
Claim 50
Dependent Claim
44 words
The exposure apparatus according to claim 37 , further comprising a first recovery port that is disposed between the first surface and the first recess portion in a radial direction about an optical axis of the optical system so as to recover the liquid.
Claim 51
Dependent Claim
28 words
The exposure apparatus according to claim 43 , wherein the liquid is recovered from the first recovery port by connecting the first recovery port to a vacuum source.
Claim 52
Dependent Claim
20 words
The exposure apparatus according to claim 37 , wherein the recovery portion recovers the liquid overflowing from the space portion.
Claim 53
Dependent Claim
51 words
The exposure apparatus according to claim 37 , further comprising a top end portion that defines a top end of the space portion, wherein at least a part of the recovery portion is disposed outside the top end portion in the radial direction about the optical axis of the optical system.
Claim 54
Dependent Claim
52 words
The exposure apparatus according to claim 37 , wherein the recovery portion includes a second recess portion disposed outside the space portion in the radial direction about the optical axis of the optical system so as to be directed to the upside and recovers the liquid flowing into the second recess portion.
Claim 55
Dependent Claim
68 words
The exposure apparatus according to claim 47 , wherein the recovery portion includes a liquid guide portion extending in the radial direction about the optical axis of the optical system from the top end portion defining the top end of the space portion, and wherein the second recess portion is disposed outside the liquid guide portion in the radial direction about the optical axis of the optical system.
Claim 56
Dependent Claim
27 words
The exposure apparatus according to claim 47 , wherein the recovery portion includes a second recovery port that recovers the liquid flowing into the second recess portion.
Claim 57
Dependent Claim
23 words
The exposure apparatus according to claim 49 , wherein the second recovery port is opposed to the bottom of the second recess portion.
Claim 58
Dependent Claim
20 words
The exposure apparatus according to claim 49 , wherein the second recovery port is disposed in the second recess portion.
Claim 59
Dependent Claim
23 words
The exposure apparatus according to claim 51 , wherein the second recovery port is disposed at the bottom of the second recess portion.
Claim 60
Dependent Claim
19 words
The exposure apparatus according to claim 49 , further comprising a porous member disposed in the second recovery port.
Claim 61
Dependent Claim
45 words
The exposure apparatus according to claim 53 , wherein a difference in pressure between at one side and at the other side of the porous member is controlled so that only the liquid passes from one side to the other side of the porous member.
Claim 62
Dependent Claim
26 words
The exposure apparatus according to claim 49 , wherein the second recovery port recovers the liquid flowing into the second recess portion along with a gas.
Claim 63
Dependent Claim
21 words
The exposure apparatus according to claim 37 , further comprising a supply port that supplies the liquid to the optical path.
Claim 64
Dependent Claim
46 words
The exposure apparatus according to claim 56 , wherein the optical system includes an optical member having the emission surface, and wherein the supply port is disposed at a position opposed to a surface of the optical member through which the exposure light does not pass.
Claim 65
Dependent Claim
55 words
The exposure apparatus according to claim 57 , wherein the surface of the optical member through which the exposure light does not pass includes a side surface of the optical member extending to the upside from the edge of the emission surface and/or in the radial direction about the optical axis of the optical system.
Claim 66
Dependent Claim
52 words
The exposure apparatus according to claim 58 , wherein the optical system includes an optical member that has the emission surface and a holding member holding the optical member, and wherein the side surface includes at least one of the surface of the optical member and the surface of the holding member.
Claim 67
Dependent Claim
42 words
The exposure apparatus according to claim 56 , wherein the supply port is disposed at a position, which faces a first space facing the first surface, outside the first surface in the radial direction about the optical axis of the optical system.
Claim 68
Dependent Claim
22 words
A device manufacturing method comprising: exposing a substrate using the exposure apparatus according to claim 37 ; and developing the exposed substrate.
Claim 69
Dependent Claim
173 words
An exposure method comprising: causing a substrate to move so that an emission surface of an optical system and a first surface disposed in at least a part of a surrounding of an optical path of an exposure light emitted from the emission surface of the optical system are facing the substrate; supplying a gas from a first gas supply port disposed in an inner surface defining a first recess portion disposed in at least a part of a surrounding of the first surface to increase a pressure of the first recess portion; exposing the substrate with the exposure light from the emission surface via a liquid between the emission surface and the substrate; flowing the liquid into a space portion from a first aperture between the first surface and the first recess portion, the space portion being opened to atmosphere via a second aperture different from the first aperture; and recoverying at least a part of the liquid flowing into the space portion, the recoverying step being performed through a recovery portion.
Claim 70
Dependent Claim
173 words
An exposure method comprising: causing a substrate to move so that an emission surface of an optical system and a first surface disposed in at least a part of a surrounding of an optical path of an exposure light emitted from the emission surface of the optical system are facing the substrate; supplying a gas from a first gas supply port disposed in an inner surface defining a first recess portion disposed in at least a part of a surrounding of the first surface to increase a pressure of the first recess portion; exposing the substrate with the exposure light from the emission surface via a liquid between the emission surface and the substrate; flowing the liquid into a space portion from a first aperture between the first surface and the first recess portion, the space portion being opened to atmosphere via a second aperture different from the first aperture; and recoverying at least a part of the liquid flowing into the space portion, the recoverying step being performed through a recovery portion.
Claim 71
Dependent Claim
22 words
A device manufacturing method comprising: exposing a substrate using the exposure method according to claim 62 ; and developing the exposed substrate.
Claim 72
Dependent Claim
291 words
An exposure apparatus that exposes a substrate, comprising: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second surface that is disposed in at least a part of a surrounding of the first surface; a first space portion which a side surface of the optical system extending to the upside from the edge of the emission surface and/or in a radial direction about the optical axis of the optical system faces; a second space portion into which a liquid can flow from a first aperture disposed between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a recovery portion of which at least a part is disposed at a position opposed to the side surface of the optical system and which recovers at least a part of the liquid flowing into the second space portion from the first aperture via the second aperture, wherein the optical system includes an optical member having the emission surface and a holding member holding the optical member, wherein the side surface includes at least one of the surface of the optical member and the surface of the holding member, wherein the surface of the substrate is opposed to the emission surface, the first surface, and the second surface in at least a part of the exposure of the substrate, and wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Claim 73
Dependent Claim
291 words
An exposure apparatus that exposes a substrate, comprising: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second surface that is disposed in at least a part of a surrounding of the first surface; a first space portion which a side surface of the optical system extending to the upside from the edge of the emission surface and/or in a radial direction about the optical axis of the optical system faces; a second space portion into which a liquid can flow from a first aperture disposed between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a recovery portion of which at least a part is disposed at a position opposed to the side surface of the optical system and which recovers at least a part of the liquid flowing into the second space portion from the first aperture via the second aperture, wherein the optical system includes an optical member having the emission surface and a holding member holding the optical member, wherein the side surface includes at least one of the surface of the optical member and the surface of the holding member, wherein the surface of the substrate is opposed to the emission surface, the first surface, and the second surface in at least a part of the exposure of the substrate, and wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Claim 74
Dependent Claim
45 words
The exposure apparatus according to claim 64 , wherein the first space portion includes a first portion and a second portion, and wherein at least a part of the recovery portion is opposed to a side surface of the optical system in the second portion.
Claim 75
Dependent Claim
37 words
The exposure apparatus according to claim 65 , further comprising a liquid supply port facing the first portion of the first space portion, wherein the liquid from the liquid supply port is supplied to the optical path.
Claim 76
Dependent Claim
38 words
The exposure apparatus according to claim 65 , further comprising an antivibration device that prevents at least a part of the liquid flowing into the second space portion from flowing from the second portion into the first portion.
Claim 77
Dependent Claim
64 words
The exposure apparatus according to claim 65 , wherein the antivibration device includes a wall portion having an opposing surface opposed to the side surface of the optical system, and wherein a gap between the opposing surface of the wall portion and the side surface of the optical system is smaller than the gap formed in the wall portion close to the second portion.
Claim 78
Dependent Claim
40 words
The exposure apparatus according to claim 68 , wherein at least one of the opposing surface of the wall portion and the side surface of the optical system facing the opposed to the opposing surface is lyophobic to the liquid.
Claim 79
Dependent Claim
21 words
The exposure apparatus according to claim 65 , wherein the first portion extends in the radial direction and to the upside.
Claim 80
Dependent Claim
19 words
The exposure apparatus according to claim 64 , wherein the second surface is disposed lower than the first surface.
Claim 81
Dependent Claim
21 words
The exposure apparatus according to claim 64 , wherein the recovery portion recovers the liquid overflowing from the second space portion.
Claim 82
Dependent Claim
52 words
The exposure apparatus according to claim 64 , further comprising a top end portion that defines a top end of the second space portion, wherein at least a part of the recovery portion is disposed outside the top end portion in the radial direction about the optical axis of the optical system.
Claim 83
Dependent Claim
57 words
The exposure apparatus according to claim 64 , wherein the recovery portion includes a recess portion, which is disposed to the upside, outside the top end portion defining the top end of the second space portion in a radial direction about the optical axis of the optical system and recovers the liquid flowing into the recess portion.
Claim 84
Dependent Claim
73 words
The exposure apparatus according to claim 74 , wherein the recovery portion includes a liquid guide portion extending in the radial direction about the optical axis of the optical system from the top end portion defining the top end of the second space portion, and wherein the recess portion is disposed outside the liquid guide portion in the radial direction about the optical axis of the optical system from the top end portion.
Claim 85
Dependent Claim
21 words
The exposure apparatus according to claim 74 , wherein the recess portion includes a bottom lower than the top end portion.
Claim 86
Dependent Claim
24 words
The exposure apparatus according to claim 74 , wherein the recovery portion includes a recovery port recovering the liquid flowing into the recess portion.
Claim 87
Dependent Claim
18 words
The exposure apparatus according to claim 77 , wherein the recovery port is disposed in the recess portion.
Claim 88
Dependent Claim
21 words
The exposure apparatus according to claim 77 , wherein the recovery port is disposed at the bottom of the recess portion.
Claim 89
Dependent Claim
18 words
The exposure apparatus according to claim 77 , further comprising a porous member disposed in the recovery port.
Claim 90
Dependent Claim
45 words
The exposure apparatus according to claim 80 , wherein a difference in pressure between at one side and at the other side of the porous member is controlled so that only the liquid passes from one side to the other side of the porous member.
Claim 91
Dependent Claim
24 words
The exposure apparatus according to claim 77 , wherein the recovery port recovers the liquid flowing into the recess portion along with a gas.
Claim 92
Dependent Claim
17 words
The exposure apparatus according to claim 64 , wherein the second surface is lyophobic to the liquid.
Claim 93
Dependent Claim
31 words
The exposure apparatus according to claim 64 , wherein the first aperture is opposed to the surface of the substrate in at least a part of the exposure of the substrate.
Claim 94
Dependent Claim
27 words
The exposure apparatus according to claim 64 , further comprising a gas supply port disposed in at least a part of a surrounding of the first aperture.
Claim 95
Dependent Claim
19 words
The exposure apparatus according to claim 85 , wherein the gas supply port is disposed in the second surface.
Claim 96
Dependent Claim
22 words
A device manufacturing method comprising: exposing a substrate using the exposure apparatus according to claim 64 ; and developing the exposed substrate.
Claim 97
Dependent Claim
219 words
An exposure method comprising: causing a substrate to move so that an emission surface of an optical system and a first surface disposed in at least a part of a surrounding of an optical path of an exposure light emitted from the emission surface of the optical system are opposed to the substrate; exposing the substrate with the exposure light from the emission surface via a liquid between the emission surface and the surface of the substrate; and recovering at least a part of the liquid flowing into a second space portion, which is opened to the atmosphere via a second aperture different from a first aperture, from the first aperture between the first surface and a second surface disposed in at least a part of a surrounding of the first surface via the second aperture by the use of a recovery portion which a side surface of the optical system extending to the upside from the edge of the emission surface and/or in a radial direction about an optical axis of the optical system faces, wherein the optical system includes an optical member having the emission surface and a holding member holding the optical member, and wherein the side surface includes at least one of the surface of the optical member and the surface of the holding member.
Claim 98
Dependent Claim
219 words
An exposure method comprising: causing a substrate to move so that an emission surface of an optical system and a first surface disposed in at least a part of a surrounding of an optical path of an exposure light emitted from the emission surface of the optical system are opposed to the substrate; exposing the substrate with the exposure light from the emission surface via a liquid between the emission surface and the surface of the substrate; and recovering at least a part of the liquid flowing into a second space portion, which is opened to the atmosphere via a second aperture different from a first aperture, from the first aperture between the first surface and a second surface disposed in at least a part of a surrounding of the first surface via the second aperture by the use of a recovery portion which a side surface of the optical system extending to the upside from the edge of the emission surface and/or in a radial direction about an optical axis of the optical system faces, wherein the optical system includes an optical member having the emission surface and a holding member holding the optical member, and wherein the side surface includes at least one of the surface of the optical member and the surface of the holding member.
Claim 99
Dependent Claim
22 words
A device manufacturing method comprising: exposing a substrate using the exposure method according to claim 88 ; and developing the exposed substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2017-11-24 | 2018-05-26 | 2018-11-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2021-11-24 | 2022-05-26 | 2022-11-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2025-11-24 | 2026-05-26 | 2026-11-25 | $7700.00 | Surcharge Window Open |