Patent US8610873B2 successfully refreshed from Google Patents.
US8610873B2
Active / In Force
US
⏱️ 2.4 years remaining
Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
Assignee: Nikon Corp
•
Filing: 2009-03-09
•
Granted: 2013-12-17
•
Expires: 2029-03-09
Abstract
Abstract An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
Inventors
- 👤 Alex Ka Tim Poon
- 👤 Leonard Wai Fung Kho
- 👤 Derek Coon
- 👤 Gaurav Keswani
- 👤 Daishi Tanaka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 10:40
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03B; G03B27/00; G03B27/32; G03B27/52
Claims Analysis
Total Claims: 36
Claim 1
Independent Claim
359 words
An immersion lithography apparatus comprising: a substrate holder on which a substrate having an imaging surface is held; a projection system having a final optical element, the projection system projecting an image onto the imaging surface of the substrate held on the substrate holder through an immersion liquid filled in a gap between the imaging surface of the substrate and the final optical element during an exposure operation; a liquid confinement member that includes a lower surface having an aperture therein through which the image projected by the projection system passes, the liquid confinement member maintaining the immersion liquid in the gap between the imaging surface of the substrate and the final optical element during the exposure operation, the lower surface of the liquid confinement member including a non-fluid removal area that is directly adjacent to and surrounds the aperture through which the image projected by the projection system passes, the non-fluid removal area is spaced a first distance from the imaging surface of the substrate during the exposure operation, the lower surface of the liquid confinement member having a liquid recovery outlet from which the immersion liquid is recovered, the liquid recovery outlet being provided in the lower surface such that the liquid recovery outlet surrounds the non-fluid removal area; and a movable liquid diverter, positioned between the liquid confinement member and the substrate during the exposure operation and spaced a second distance, which is less than the first distance, from the imaging surface of the substrate during the exposure, the movable liquid diverter being movable relative to the liquid confinement member in a direction parallel to the imaging surface of the substrate during the exposure operation, the movable liquid diverter including an opening through which the image projected by the projection system passes, the movable liquid diverter having an upper surface and a lower surface that surround the opening, and the movable liquid diverter being provided such that a portion of the upper surface of the movable liquid diverter faces the non-fluid removal area in the lower surface of the liquid confinement member when the movable liquid diverter moves in a same direction as the substrate holder.
Claim 2
Dependent Claim
359 words
An immersion lithography apparatus comprising: a substrate holder on which a substrate having an imaging surface is held; a projection system having a final optical element, the projection system projecting an image onto the imaging surface of the substrate held on the substrate holder through an immersion liquid filled in a gap between the imaging surface of the substrate and the final optical element during an exposure operation; a liquid confinement member that includes a lower surface having an aperture therein through which the image projected by the projection system passes, the liquid confinement member maintaining the immersion liquid in the gap between the imaging surface of the substrate and the final optical element during the exposure operation, the lower surface of the liquid confinement member including a non-fluid removal area that is directly adjacent to and surrounds the aperture through which the image projected by the projection system passes, the non-fluid removal area is spaced a first distance from the imaging surface of the substrate during the exposure operation, the lower surface of the liquid confinement member having a liquid recovery outlet from which the immersion liquid is recovered, the liquid recovery outlet being provided in the lower surface such that the liquid recovery outlet surrounds the non-fluid removal area; and a movable liquid diverter, positioned between the liquid confinement member and the substrate during the exposure operation and spaced a second distance, which is less than the first distance, from the imaging surface of the substrate during the exposure, the movable liquid diverter being movable relative to the liquid confinement member in a direction parallel to the imaging surface of the substrate during the exposure operation, the movable liquid diverter including an opening through which the image projected by the projection system passes, the movable liquid diverter having an upper surface and a lower surface that surround the opening, and the movable liquid diverter being provided such that a portion of the upper surface of the movable liquid diverter faces the non-fluid removal area in the lower surface of the liquid confinement member when the movable liquid diverter moves in a same direction as the substrate holder.
Claim 3
Dependent Claim
29 words
The apparatus of claim 1 , wherein the opening is smaller than the immersion area such that the opening contacts the immersion area when the substrate holder is stationary.
Claim 4
Dependent Claim
31 words
The apparatus of claim 1 , wherein the opening is larger than the immersion area such that the opening is spaced from the immersion area when the substrate holder is stationary.
Claim 5
Dependent Claim
27 words
The apparatus of claim 1 , wherein the movable liquid diverter moves at a speed that is slower than a speed at which the substrate holder moves.
Claim 6
Dependent Claim
27 words
The apparatus of claim 4 , wherein the movable liquid diverter moves by an amount that is less than an amount by which the substrate holder moves.
Claim 7
Dependent Claim
27 words
The apparatus of claim 1 , wherein the movable liquid diverter moves by an amount that is less than an amount by which the substrate holder moves.
Claim 8
Dependent Claim
22 words
The apparatus of claim 1 , further comprising an actuator coupled to the movable liquid diverter to move the movable liquid diverter.
Claim 9
Dependent Claim
20 words
The apparatus of claim 7 , wherein the actuator is one of a voice coil motor and a Lorentz-force actuator.
Claim 10
Dependent Claim
17 words
The apparatus of claim 1 , wherein the movable liquid diverter includes a plate having the opening.
Claim 11
Dependent Claim
21 words
The apparatus of claim 1 , wherein the movable liquid diverter includes a plurality of plates that collectively define the opening.
Claim 12
Dependent Claim
14 words
The apparatus of claim 1 , wherein the opening is larger than the aperture.
Claim 13
Dependent Claim
48 words
The apparatus of claim 1 , wherein the movable liquid diverter is movable to a closing position at which the upper surface of the movable liquid diverter covers the aperture to seal immersion liquid between the final optical element of the projection system and the liquid confinement member.
Claim 14
Dependent Claim
29 words
The apparatus of claim 12 , wherein the upper surface of the movable liquid diverter does not completely cover the liquid recovery outlet when moved to the closing position.
Claim 15
Dependent Claim
31 words
The apparatus of claim 12 , wherein the upper surface of the movable liquid diverter does not cover any portion of the liquid recovery outlet when moved to the closing position.
Claim 16
Dependent Claim
21 words
The apparatus of claim 1 , wherein the liquid confinement member substantially surrounds the final optical element of the projection system.
Claim 17
Dependent Claim
19 words
The apparatus of claim 1 , wherein the movable liquid diverter is angled upward toward the liquid confinement member.
Claim 18
Dependent Claim
19 words
The apparatus of claim 1 , wherein the movable liquid diverter includes a protrusion that extends toward the substrate.
Claim 19
Dependent Claim
36 words
A device manufacturing method comprising: exposing a substrate by projecting a pattern image onto the substrate through an immersion liquid and the projection system of the apparatus of claim 1 ; and developing the exposed substrate.
Claim 20
Dependent Claim
322 words
An immersion lithography apparatus comprising: a projection system having a final optical element; a movable stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap between the surface and the final optical element; a liquid confinement member that includes a lower surface having an aperture therein through which the image projected by the projection system passes, the liquid confinement member maintaining the immersion liquid in the gap between the surface and the final optical element, the lower surface of the liquid confinement member including a non-fluid removal area that is directly adjacent to and surrounds the aperture through which the image projected by the projection system passes, the non-fluid removal area is spaced a first distance from the surface of the stage, the lower surface of the liquid confinement member having a liquid recovery outlet from which the immersion liquid is recovered, the liquid recovery outlet being provided in the lower surface such that the liquid recovery outlet surrounds the non-fluid removal area; and a movable liquid diverter, positioned between the liquid confinement member and the stage and spaced a second distance, which is less than the first distance, from the surface of the stage, the movable liquid diverter being movable relative to the liquid confinement member in a direction parallel to the surface of the stage, the movable liquid diverter including an opening through which the image projected by the projection system passes, the movable liquid diverter having an upper surface and a lower surface that surround the opening, and the movable liquid diverter being provided such that a portion of the upper surface of the movable liquid diverter faces the non-fluid removal area in the lower surface of the liquid confinement member when the movable liquid diverter moves in a same direction as the stage.
Claim 21
Dependent Claim
322 words
An immersion lithography apparatus comprising: a projection system having a final optical element; a movable stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap between the surface and the final optical element; a liquid confinement member that includes a lower surface having an aperture therein through which the image projected by the projection system passes, the liquid confinement member maintaining the immersion liquid in the gap between the surface and the final optical element, the lower surface of the liquid confinement member including a non-fluid removal area that is directly adjacent to and surrounds the aperture through which the image projected by the projection system passes, the non-fluid removal area is spaced a first distance from the surface of the stage, the lower surface of the liquid confinement member having a liquid recovery outlet from which the immersion liquid is recovered, the liquid recovery outlet being provided in the lower surface such that the liquid recovery outlet surrounds the non-fluid removal area; and a movable liquid diverter, positioned between the liquid confinement member and the stage and spaced a second distance, which is less than the first distance, from the surface of the stage, the movable liquid diverter being movable relative to the liquid confinement member in a direction parallel to the surface of the stage, the movable liquid diverter including an opening through which the image projected by the projection system passes, the movable liquid diverter having an upper surface and a lower surface that surround the opening, and the movable liquid diverter being provided such that a portion of the upper surface of the movable liquid diverter faces the non-fluid removal area in the lower surface of the liquid confinement member when the movable liquid diverter moves in a same direction as the stage.
Claim 22
Dependent Claim
28 words
The apparatus of claim 19 , wherein the opening is smaller than the immersion area such that the opening contacts the immersion area when the stage is stationary.
Claim 23
Dependent Claim
30 words
The apparatus of claim 19 , wherein the opening is larger than the immersion area such that the opening is spaced from the immersion area when the stage is stationary.
Claim 24
Dependent Claim
26 words
The apparatus of claim 19 , wherein the movable liquid diverter moves at a speed that is slower than a speed at which the stage moves.
Claim 25
Dependent Claim
26 words
The apparatus of claim 22 , wherein the movable liquid diverter moves by an amount that is less than an amount by which the stage moves.
Claim 26
Dependent Claim
26 words
The apparatus of claim 19 , wherein the movable liquid diverter moves by an amount that is less than an amount by which the stage moves.
Claim 27
Dependent Claim
22 words
The apparatus of claim 19 , further comprising an actuator coupled to the movable liquid diverter to move the movable liquid diverter.
Claim 28
Dependent Claim
20 words
The apparatus of claim 25 , wherein the actuator is one of a voice coil motor and a Lorentz-force actuator.
Claim 29
Dependent Claim
17 words
The apparatus of claim 19 , wherein the movable liquid diverter includes a plate having the opening.
Claim 30
Dependent Claim
21 words
The apparatus of claim 19 , wherein the movable liquid diverter includes a plurality of plates that collectively define the opening.
Claim 31
Dependent Claim
14 words
The apparatus of claim 19 , wherein the opening is larger than the aperture.
Claim 32
Dependent Claim
48 words
The apparatus of claim 19 , wherein the movable liquid diverter is movable to a closing position at which the upper surface of the movable liquid diverter covers the aperture to seal immersion liquid between the final optical element of the projection system and the liquid confinement member.
Claim 33
Dependent Claim
29 words
The apparatus of claim 30 , wherein the upper surface of the movable liquid diverter does not completely cover the liquid recovery outlet when moved to the closing position.
Claim 34
Dependent Claim
31 words
The apparatus of claim 30 , wherein the upper surface of the movable liquid diverter does not cover any portion of the liquid recovery outlet when moved to the closing position.
Claim 35
Dependent Claim
21 words
The apparatus of claim 19 , wherein the liquid confinement member substantially surrounds the final optical element of the projection system.
Claim 36
Dependent Claim
49 words
The apparatus of claim 19 , wherein the stage includes a substrate holder, and an upper surface of the substrate holder, an upper surface of a substrate held by the substrate holder, or both, corresponds to the surface between which the gap is formed with the final optical element.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2016-12-16 | 2017-06-17 | 2017-12-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2020-12-16 | 2021-06-17 | 2021-12-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2024-12-16 | 2025-06-17 | 2025-12-17 | $7700.00 | Window Closed / Lapsed |