Patent US7251013B2 successfully refreshed from Google Patents.
US7251013B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Lithographic apparatus and device manufacturing method
Assignee: ASML Netherlands BV
•
Filing: 2004-11-12
•
Granted: 2007-07-31
•
Expires: 2024-11-12
Abstract
Abstract In an immersion lithography apparatus in which, for example, immersion liquid is supplied to a localized space, a plate is provided to divide the space into two parts. Such a division of the space may facilitate reduction of stray radiation, a temperature gradient, and the transportation of contaminants.
Inventors
- 👤 Nicolaas Ten Kate
- 👤 Johannes Henricus Wilhelmus Jacobs
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 05:30
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/708; G03F7/70808; G03F7/70216; G03F7/70341
Claims Analysis
Total Claims: 32
Claim 1
Independent Claim
98 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate, the space being smaller in plan than the substrate, the apparatus comprising a plate substantially parallel to the substrate to divide the space into two parts, the plate having a portion formed from a material that has a low transmissivity at a wavelength of radiation used to project the pattern from the patterning device and an aperture within the portion to allow transmission of the pattern through the aperture onto the substrate.
Claim 2
Dependent Claim
98 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate, the space being smaller in plan than the substrate, the apparatus comprising a plate substantially parallel to the substrate to divide the space into two parts, the plate having a portion formed from a material that has a low transmissivity at a wavelength of radiation used to project the pattern from the patterning device and an aperture within the portion to allow transmission of the pattern through the aperture onto the substrate.
Claim 3
Dependent Claim
12 words
The apparatus according to claim 1 , wherein the aperture is open.
Claim 4
Dependent Claim
48 words
The apparatus according to claim 2 , further comprising a projection system, a liquid supply port configured to supply liquid to a part of the space adjacent the projection system, and a liquid extraction port configured to extract liquid from a part of the space adjacent the substrate.
Claim 5
Dependent Claim
40 words
The apparatus according to claim 3 , wherein a pressure of the liquid in the part of the space adjacent the projection system is higher than the pressure of the liquid in the part of the space adjacent the substrate.
Claim 6
Dependent Claim
14 words
The apparatus according to claim 3 , wherein there are at least two plates.
Claim 7
Dependent Claim
18 words
The apparatus according to claim 1 , wherein an edge of the aperture in the plate is beveled.
Claim 8
Dependent Claim
14 words
The apparatus according to claim 1 , wherein there are at least two plates.
Claim 9
Dependent Claim
19 words
The apparatus according to claim 1 , wherein the aperture is closed by a window of substantially transparent material.
Claim 10
Dependent Claim
22 words
The apparatus according to claim 1 , wherein the material that forms the portion of the plate comprises a radiation absorptive material.
Claim 11
Dependent Claim
149 words
A lithographic apparatus, comprising: an illuminator configured to condition a radiation beam; a support constructed to hold a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and a plate substantially parallel to the substrate to divide the space into two parts, the plate having at least a portion thereof radiation transmissive to allow transmission of the pattern onto the substrate, wherein the portion comprises an open aperture.
Claim 12
Dependent Claim
149 words
A lithographic apparatus, comprising: an illuminator configured to condition a radiation beam; a support constructed to hold a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and a plate substantially parallel to the substrate to divide the space into two parts, the plate having at least a portion thereof radiation transmissive to allow transmission of the pattern onto the substrate, wherein the portion comprises an open aperture.
Claim 13
Dependent Claim
15 words
The apparatus according to claim 10 , wherein an edge of the aperture is beveled.
Claim 14
Dependent Claim
45 words
The apparatus according to claim 10 , further comprising a liquid supply port configured to supply liquid to a part of the space adjacent the projection system, and a liquid extraction port configured to extract liquid from a part of the space adjacent the substrate.
Claim 15
Dependent Claim
40 words
The apparatus according to claim 12 , wherein a pressure of the liquid in the part of the space adjacent the projection system is higher than the pressure of the liquid in the part of the space adjacent the substrate.
Claim 16
Dependent Claim
14 words
The apparatus according to claim 10 , wherein there are at least two plates.
Claim 17
Dependent Claim
22 words
The apparatus according to claim 10 , wherein the at least a portion of the plate is formed of substantially transparent material.
Claim 18
Dependent Claim
17 words
The apparatus according to claim 10 , wherein the space is smaller in plan than the substrate.
Claim 19
Dependent Claim
35 words
The apparatus according to claim 10 , wherein a portion of the liquid confinement structure is between the projection system and the substrate and the plate is between the liquid confinement structure and the substrate.
Claim 20
Dependent Claim
62 words
The apparatus according to claim 17 , further comprising: a liquid supply port configured to supply liquid to a part of the space between the projection system and the liquid confinement structure; and a liquid extraction port configured to extract liquid from a part of the space between the liquid confinement structure and the plate and between the plate and the substrate.
Claim 21
Dependent Claim
62 words
The apparatus according to claim 17 , further comprising: a liquid supply port configured to supply liquid to a part of the space between the projection system and the liquid confinement structure and between the liquid confinement structure and the plate; and a liquid extraction port configured to extract liquid from a part of the space between the plate and the substrate.
Claim 22
Dependent Claim
62 words
The apparatus according to claim 17 , further comprising: a liquid supply port configured to supply liquid to a part of the space between the projection system and the liquid confinement structure and between the plate and the substrate; and a liquid extraction port configured to extract liquid from a part of the space between the liquid confinement structure and the plate.
Claim 23
Independent Claim
140 words
A device manufacturing method, comprising: supplying a liquid to a space adjacent a substrate, the space being smaller in plan than the substrate and divided into two parts by a plate substantially parallel to the substrate, the plate having at least a portion transmissive to radiation, wherein the portion comprises an open aperture formed in the plate to allow transmission of a patterned beam of radiation through the aperture onto the substrate or the portion comprises an aperture within a part of the plate, the part formed from a material that has a low transmissivity at a wavelength of radiation used to project the patterned beam of radiation, to allow transmission of the patterned beam of radiation through the aperture onto the substrate; and projecting a patterned beam of radiation through the liquid and through the portion onto the substrate.
Claim 24
Independent Claim
140 words
A device manufacturing method, comprising: supplying a liquid to a space adjacent a substrate, the space being smaller in plan than the substrate and divided into two parts by a plate substantially parallel to the substrate, the plate having at least a portion transmissive to radiation, wherein the portion comprises an open aperture formed in the plate to allow transmission of a patterned beam of radiation through the aperture onto the substrate or the portion comprises an aperture within a part of the plate, the part formed from a material that has a low transmissivity at a wavelength of radiation used to project the patterned beam of radiation, to allow transmission of the patterned beam of radiation through the aperture onto the substrate; and projecting a patterned beam of radiation through the liquid and through the portion onto the substrate.
Claim 25
Dependent Claim
39 words
The method according to claim 21 , further comprising supplying liquid to a part of the space adjacent a projection system used to project the patterned beam, and extracting liquid from a part of the space adjacent the substrate.
Claim 26
Dependent Claim
40 words
The method according to claim 22 , wherein a pressure of the liquid in the part of the space adjacent the projection system is higher than the pressure of the liquid in the part of the space adjacent the substrate.
Claim 27
Dependent Claim
17 words
The method according to claim 21 , wherein the space is divided by at least two plates.
Claim 28
Dependent Claim
23 words
The method according to claim 21 , wherein the aperture within the part of the plate comprises a window of substantially transparent material.
Claim 29
Dependent Claim
52 words
The method according to claim 21 , wherein a portion of a liquid confinement structure, configured to at least partly confine the liquid within the space, is between a projection system used to project the patterned beam and the substrate and the plate is between the liquid confinement structure and the substrate.
Claim 30
Dependent Claim
50 words
The method according to claim 26 , further comprising: supplying liquid to a part of the space between the projection system and the liquid confinement structure; and extracting liquid from a part of the space between the liquid confinement structure and the plate and between the plate and the substrate.
Claim 31
Dependent Claim
50 words
The method according to claim 26 , further comprising: supplying liquid to a part of the space between the projection system and the liquid confinement structure and between the liquid confinement structure and the plate; and extracting liquid from a part of the space between the plate and the substrate.
Claim 32
Dependent Claim
50 words
The method according to claim 26 , further comprising: supplying liquid to a part of the space between the projection system and the liquid confinement structure and between the plate and the substrate; and extracting liquid from a part of the space between the liquid confinement structure and the plate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2010-07-30 | 2011-01-29 | 2011-07-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2014-07-30 | 2015-01-29 | 2015-07-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2018-07-30 | 2019-01-29 | 2019-07-31 | $7700.00 | Window Closed / Lapsed |