Patent US7133114B2 successfully refreshed from Google Patents.
US7133114B2
Expired / Lapsed
US
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Lithographic apparatus and device manufacturing method
Assignee: ASML Netherlands BV
•
Filing: 2004-09-20
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Granted: 2006-11-07
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Expires: 2024-09-20
Abstract
Abstract In a scanning immersion lithographic apparatus, immersion liquid is supplied on one side of the space between the projection system and the substrate and drained on the other side so that the flow of liquid is substantially perpendicular to the scan direction.
Inventors
- 👤 Christiaan Alexander Hoogendam
- 👤 Nicolaas Ten Kate
- 👤 Frits Van Der Meulen
- 👤 Johannes Henricus Wilhelmus Jacobs
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 21:48
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03F7/20; G03F7/2041; G03F7/70358
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
97 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate using a projection system, while scanning the substrate relative to the projection system in a first direction, comprising: a liquid supply system arranged to supply liquid to a space between the projection system and the substrate, the liquid supply system comprising a liquid supply port and a liquid drain port, the supply port and the drain port being located on opposite sides of the space such that liquid flows across the space in a direction substantially perpendicular to the first direction.
Claim 2
Dependent Claim
97 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate using a projection system, while scanning the substrate relative to the projection system in a first direction, comprising: a liquid supply system arranged to supply liquid to a space between the projection system and the substrate, the liquid supply system comprising a liquid supply port and a liquid drain port, the supply port and the drain port being located on opposite sides of the space such that liquid flows across the space in a direction substantially perpendicular to the first direction.
Claim 3
Dependent Claim
50 words
The apparatus according to claim 1 , wherein the liquid supply system comprises a plurality of liquid supply ports located on a first side of the space and a plurality of liquid drain ports located on a second side of the space, the second side being opposite the first side.
Claim 4
Dependent Claim
39 words
The apparatus according to claim 2 , wherein the plurality of supply ports and the plurality of drain ports are located symmetrically about a plane perpendicular to the first direction and passing through a mid point of the space.
Claim 5
Dependent Claim
22 words
The apparatus according to claim 2 , wherein the number of supply ports is in the range of from 3 to 7.
Claim 6
Dependent Claim
22 words
The apparatus according to claim 2 , wherein the number of drain ports is in the range of from 3 to 7.
Claim 7
Dependent Claim
29 words
The apparatus according to claim 1 , wherein the drain port is located further from a plane comprising the nominal surface of the substrate than is the supply port.
Claim 8
Dependent Claim
37 words
The apparatus according to claim 1 , wherein the drain port is located further from a plane comprising the nominal surface of the substrate than is the final surface of a final element of the projection system.
Claim 9
Dependent Claim
44 words
The apparatus according to claim 1 , wherein the liquid supply system is configured to supply liquid to the space at a rate of supply sufficient to refresh the space completely within a time taken to expose a single target portion on the substrate.
Claim 10
Dependent Claim
26 words
The apparatus according to claim 1 , wherein the liquid supply system comprises a member configured to at least partly confine the liquid to the space.
Claim 11
Dependent Claim
51 words
The apparatus according to claim 9 , wherein the member comprises an extractor port configured to remove liquid from between the member and the substrate and a gas knife configured to supply gas to between the member and the substrate so as to direct liquid toward a center of the space.
Claim 12
Independent Claim
103 words
A device manufacturing method, comprising: supplying liquid through a supply port to a space between a projection system of a lithographic projection apparatus and a substrate, the supply port being located on a first side of the space; removing liquid via a drain port located on a second side of the space opposite to the first side such that liquid flows across the space in a direction substantially perpendicular to a scan direction; and projecting a patterned beam of radiation, using the projection system, through the liquid onto the substrate while scanning the substrate relative to the projection system in the scan direction.
Claim 13
Independent Claim
103 words
A device manufacturing method, comprising: supplying liquid through a supply port to a space between a projection system of a lithographic projection apparatus and a substrate, the supply port being located on a first side of the space; removing liquid via a drain port located on a second side of the space opposite to the first side such that liquid flows across the space in a direction substantially perpendicular to a scan direction; and projecting a patterned beam of radiation, using the projection system, through the liquid onto the substrate while scanning the substrate relative to the projection system in the scan direction.
Claim 14
Dependent Claim
53 words
The method according to claim 11 , comprising supplying the liquid through a plurality of liquid supply ports located on a first side of the space and removing the liquid through a plurality of liquid drain ports located on a second side of the space, the second side being opposite the first side.
Claim 15
Dependent Claim
39 words
The method according to claim 12 , wherein the plurality of supply ports and the plurality of drain ports are located symmetrically about a plane perpendicular to the scan direction and passing through a mid point of the space.
Claim 16
Dependent Claim
22 words
The method according to claim 12 , wherein the number of supply ports is in the range of from 3 to 7.
Claim 17
Dependent Claim
22 words
The method according to claim 12 , wherein the number of drain ports is in the range of from 3 to 7.
Claim 18
Dependent Claim
29 words
The method according to claim 11 , wherein the drain port is located further from a plane comprising the nominal surface of the substrate than is the supply port.
Claim 19
Dependent Claim
37 words
The method according to claim 11 , wherein the drain port is located further from a plane comprising the nominal surface of the substrate than is the final surface of a final element of the projection system.
Claim 20
Dependent Claim
37 words
The method according to claim 11 , wherein a rate of supply of liquid to the space is sufficient to refresh the space completely within a time taken to expose a single target portion on the substrate.
Claim 21
Dependent Claim
23 words
The method according to claim 11 , comprising at least partly confining the liquid to the space using a liquid supply system member.
Claim 22
Dependent Claim
38 words
The method according to claim 19 , comprising: removing liquid from between the member and the substrate; and supplying gas to between the member and the substrate so as to direct liquid toward a center of the space.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2009-11-06 | 2010-05-08 | 2010-11-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2013-11-06 | 2014-05-08 | 2014-11-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2017-11-06 | 2018-05-08 | 2018-11-07 | $7700.00 | Window Closed / Lapsed |