US6893972B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for sidewall amplification of resist structures and for the production of structures having reduced structure size
Assignee: Infineon Technologies AG
•
Filing: 2002-09-03
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Granted: 2005-05-17
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Expires: 2022-09-03
Abstract
Abstract The novel process lends itself to the production of highly resolved resist structures. A resist structure having webs is produced from a photoresist on a substrate and then the sidewalls of the webs are selectively chemically amplified so that chemically amplified sidewall structures are obtained. After the removal of the chemically unamplified sections, the amplified sidewall structures are transferred to the substrate. The process permits a resolution of structures that are not producible using the currently customary exposure wavelengths.
Inventors
- 👤 Jörg Rottstegge
- 👤 Eberhard Kühn
- 👤 Waltraud Herbst
- 👤 Christian Eschbaumer
- 👤 Christoph Hohle
- 👤 Gertrud Falk
- 👤 Michael Sebald
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 23:44
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/69; H10P50/691; H10P50/693; H10P50/696; G; G03; G03F; G03F7/00; G03F7/26; G03F7/40; H10P76/00; H10P76/20; H10P76/204; H10P76/2041
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
66 words
A process for producing highly resolved resist structures, which comprises the following steps: applying a resist film to a substrate; producing a resist structure with web from the resist film, the web having sidewall structures and sections disposed between the sidewall structures, the sidewall structures having a chemically amplified dry etching resistance and the sections having a chemically unamplified dry etching resistance; and removing the sections.
Claim 2
Dependent Claim
66 words
A process for producing highly resolved resist structures, which comprises the following steps: applying a resist film to a substrate; producing a resist structure with web from the resist film, the web having sidewall structures and sections disposed between the sidewall structures, the sidewall structures having a chemically amplified dry etching resistance and the sections having a chemically unamplified dry etching resistance; and removing the sections.
Claim 3
Dependent Claim
83 words
The process according to claim 1 , which comprises: subjecting the resist film, applied to the substrate and including a chemically amplifiable photoresist, to section-by-section exposure, heat, and development for structuring the resist film to obtain a structured resist with web having sidewalls and a top layer; and chemically amplifying the dry etching resistance of the sidewalls with an amplification agent to produce the resist structure having web with the chemically amplified sidewall structures and the chemically unamplified sections between the sidewall structures.
Claim 4
Dependent Claim
39 words
The process according to claim 2 , which comprises chemically amplifying the top layer of the web together with the sidewall structures, to obtain a top layer with chemically amplified dry etching resistance, and selectively removing the top layer.
Claim 5
Dependent Claim
100 words
The process according to claim 1 , which comprises: producing the resist film including a chemically amplified photoresist on a substrate; subjecting the resist film to section-by-section exposure and heating; and applying a developer solution containing an amplification agent for increasing the dry etching resistance to the exposed and heated resist film such that unexposed sections of the resist film are detached from the substrate and exposed sections of the photoresist remain on the substrate, whereby sidewall structures having chemically amplified dry etching resistance are produced in a section of the photoresist between exposed and unexposed parts of the photoresist.
Claim 6
Dependent Claim
42 words
The process according to claim 4 , which comprises chemically amplifying a top layer of the unexposed parts of the photoresist in addition to the section of the photoresist between exposed and unexposed sections of the photoresist, and removing the top layer.
Claim 7
Dependent Claim
123 words
The process according to claim 1 , which comprises: producing the resist film on the substrate by applying a first resist layer formed of a chemically amplified resist to the substrate and applying a second resist layer formed of a chemically amplified photoresist having no anchor groups for chemical amplification to the first resist layer; subjecting the resist film to section-by-section exposure, heating and developing, such that exposed parts of the second resist layer are removed and bared parts are obtained; removing the first resist layer in the bared parts, whereby sidewalls of the first resist layer are obtained; and chemically amplifying the dry etching resistance of the sidewalls with an amplification agent to obtain sidewall structures having chemically amplified dry etching resistance.
Claim 8
Dependent Claim
37 words
The process according to claim 6 , which comprises forming an intermediate layer between the first resist layer and the second resist layer, to prevent a mixing of the first resist layer and the second resist layer.
Claim 9
Dependent Claim
23 words
The process according to claim 1 , which comprises forming a layer of a bottom resist between the substrate and the resist film.
Claim 10
Dependent Claim
14 words
The process according to claim 1 , wherein the amplification agent comprises silicon-containing groups.
Claim 11
Dependent Claim
90 words
The process according to claim 2 , which comprises: forming the resist film from a positively amplified photoresist containing a photo acid generator; and after structuring of the resist film, applying a monomer capable of undergoing acid-catalyzed polymerization to the structured resist; heating the structured resist so that acid formed from the photo acid generator diffuses to the sidewalls of the web; and polymerizing the monomer capable of undergoing acid-catalyzed polymerization under influence of the acid, whereby sidewall structures having chemically amplified dry etching resistance are formed on the sidewalls.
Claim 12
Dependent Claim
32 words
A method of structuring a substrate, which comprises producing a highly resolved resist structure with the process according to claim 1 , and transferring the highly resolved resist structure to the substrate.
Claim 13
Dependent Claim
24 words
The method according to claim 11 , wherein the transferring step comprises transferring the highly resolved resist structure to the substrate by plasma etching.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2008-05-16 | 2008-11-15 | 2009-05-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2012-05-16 | 2012-11-15 | 2013-05-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2016-05-16 | 2016-11-15 | 2017-05-17 | $7700.00 | Window Closed / Lapsed |