EP0313814A2
Expired / Lapsed
EP
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Organic sidewall structures
Assignee: International Business Machines Corp
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Filing: 1988-09-22
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Granted: —
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Expires: 2008-09-22
Abstract
Abstract A conformal organic layer is used to define spacers on the sidewalls of an organic mandrel. The organic layer (e.g., parylene) can be deposited at low temperatures, and as such are compatible with temperature-sensitive mandrel materials that reflow at high deposition temperatures. The conformal organic material can be dry etched as the same rate as the organic mandrels, while being resistant to wet strip solvents that remove the organic mandrels. This series of etch characteristics make the organic mandrel-organic spacer combination compatible with a host of masking applications.
Inventors
- 👤 William J. Cote
- 👤 Michael L. Kerbaugh
- 👤 Donald M. Kenney
- 👤 Michael A. Leach
- 👤 Jeffrey A. Robinson
- 👤 Robert W. Sweetser
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 10:08
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; H10P76/00; H10P76/20
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
49 words
Process for defining a masking structure on a substrate, comprising the steps of: defining a plurality of organic mandrel structures on the substrate; depositing a conformal organic layer on the substrate and said mandrels; and anisotropically etching said conformal organic layer so as to define spacers on said mandrels.
Claim 2
Dependent Claim
49 words
Process for defining a masking structure on a substrate, comprising the steps of: defining a plurality of organic mandrel structures on the substrate; depositing a conformal organic layer on the substrate and said mandrels; and anisotropically etching said conformal organic layer so as to define spacers on said mandrels.
Claim 3
Dependent Claim
13 words
Method as recited in claim 1 wherein said mandrels are comprised of polyimide.
Claim 4
Dependent Claim
15 words
Method as recited in claim 1 wherein said mandrels are comprised of a photosensitive polymer.
Claim 5
Dependent Claim
13 words
Method as recited in claim 1 wherein said conformal organic layer comprises parylene.
Claim 6
Dependent Claim
19 words
Method as recited in claim 1, further comprising the step of: removing said mandrels without appreciably attacking said spacers.
Claim 7
Dependent Claim
27 words
Method as recited in claim 5, wherein said mandrels are removed by exposure to a solvent selected from the group consisting of NMP, sulfuric-nitric, KOH, and acetone.
Claim 8
Dependent Claim
74 words
Method for defining a masking structure on a substrate, comprising the steps of: defining a plurality of organic mandrels having substantially vertical sidewalls on the substrate; depositing a layer of parylene on the substrate and said mandrels; and anisotropically etching said layer of parylene so as to define spacers on said sidewalls of said mandrels, said spacers and said mandrels having analogous etch rates in dry etchants and differing etch rates in wet etchants.
Claim 9
Dependent Claim
74 words
Method for defining a masking structure on a substrate, comprising the steps of: defining a plurality of organic mandrels having substantially vertical sidewalls on the substrate; depositing a layer of parylene on the substrate and said mandrels; and anisotropically etching said layer of parylene so as to define spacers on said sidewalls of said mandrels, said spacers and said mandrels having analogous etch rates in dry etchants and differing etch rates in wet etchants.
Claim 10
Dependent Claim
24 words
Method as recited in claim 7, wherein said dry etchants comprise gaseous plasmas selected from the group consisting of oxygen plasmas and halocarbon-based plasmas.
Claim 11
Dependent Claim
22 words
Method as recited in claim 8, wherein said wet etchant is selected from the group consisting of NMP, sulfuric-nitric, KOH, and acetone.
Claim 12
Dependent Claim
15 words
Method as recited in claim 9, wherein said mandrels are comprised of a photosensitive polymer.
Claim 13
Dependent Claim
77 words
Method of providing a masking structure on a surface of a processed semiconductor substrate, comprising the steps of: forming a mandrel of a photosensitive polymer on the surface, said mandrel having substantially horizontal and substantially vertical surfaces; coating said mandrel with a conformal layer of a parylene polymer; and anisotropically etching said parylene polymer and said photosensitive polymer so that portions of said parylene polymer remains on said vertical surfaces of said mandrel to form spacers thereon.
Claim 14
Dependent Claim
77 words
Method of providing a masking structure on a surface of a processed semiconductor substrate, comprising the steps of: forming a mandrel of a photosensitive polymer on the surface, said mandrel having substantially horizontal and substantially vertical surfaces; coating said mandrel with a conformal layer of a parylene polymer; and anisotropically etching said parylene polymer and said photosensitive polymer so that portions of said parylene polymer remains on said vertical surfaces of said mandrel to form spacers thereon.
References Cited (Backward Citations)
No citation records indexed.
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