US5234794A
Expired / Lapsed
US
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Photostructuring method
Assignee: Infineon Technologies AG
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Filing: 1992-03-10
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Granted: 1993-08-10
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Expires: 2012-03-10
Abstract
Abstract A simple method for diminishing the trench width in a photoresist structure to below the resolution limit is provided. A photoresist structure is produced and treated with an agent then contains a bulging constituent that reacts with functional groups of the photoresist structure. The bulging constituent causes a volume increase of the photoresist structure. The extent of the volume increase of the photoresist structures is controllable by varying various parameters.
Inventors
- 👤 Michael Sebald
- 👤 Rainer Leuschner
- 👤 Recai Sezi
- 👤 Siegfried Birkle
- 👤 Hellmut Ahne
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 04:22
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/40; G03F7/405
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
153 words
A method for diminishing the width of a trench in a photoresist structure by bulging the photoresist structure, comprising the steps of: applying a layer of a photoresist on a substrate, the photoresist comprising a basic polymer and a photoactive constituent, wherein the basic polymer comprises anhydride groups; exposing the photoresist layer to ultraviolet radiation; developing the photoresist layer in a developing step, the photoresist structure that is thereby created; treating the photoresist structure with an agent immediately following the developing step, the agent including a bulging constituent that bonds chemically with the anhydride groups in the photoresist structure and bulges the photoresist structure, and wherein the bulging constituent comprises at least one amino group as a functional group and is present in a medium that includes at least water; and whereby the bulging of the photoresist structure causes a diminishing of the trench width in a range from 0.15 through 0.5 μm.
Claim 2
Independent Claim
153 words
A method for diminishing the width of a trench in a photoresist structure by bulging the photoresist structure, comprising the steps of: applying a layer of a photoresist on a substrate, the photoresist comprising a basic polymer and a photoactive constituent, wherein the basic polymer comprises anhydride groups; exposing the photoresist layer to ultraviolet radiation; developing the photoresist layer in a developing step, the photoresist structure that is thereby created; treating the photoresist structure with an agent immediately following the developing step, the agent including a bulging constituent that bonds chemically with the anhydride groups in the photoresist structure and bulges the photoresist structure, and wherein the bulging constituent comprises at least one amino group as a functional group and is present in a medium that includes at least water; and whereby the bulging of the photoresist structure causes a diminishing of the trench width in a range from 0.15 through 0.5 μm.
Claim 3
Dependent Claim
15 words
The method of claim 1 wherein the bulging constituent is present in an aqueous solution.
Claim 4
Dependent Claim
14 words
The method of claim 1 wherein the bulging constituent is present in an emulsion.
Claim 5
Dependent Claim
15 words
The method of claim 1 wherein the bulging agent is present in the vapor phase.
Claim 6
Dependent Claim
18 words
The method of claim 1 wherein the bulging constituent is hydrolysis-stable and is present in an aqueous-alcohol solution.
Claim 7
Dependent Claim
19 words
The method of claim 1 wherein the treatment with the bulging agent is performed at ambient pressure and temperature.
Claim 8
Dependent Claim
22 words
The method of claim 1 wherein a flood lighting of the photoresist structure is performed before the treatment with the bulging agent.
Claim 9
Dependent Claim
35 words
The method of claim 1 wherein the bulging constituent is selected such that the photoresist structure is designationally improved in terms of its physical and chemical properties simultaneously with the treatment with the bulging constituent.
Claim 10
Dependent Claim
21 words
The method of claim 1 wherein an etching resistance of the photoresist structure is intensified when treated with the bulging constituent.
Claim 11
Dependent Claim
22 words
The method of claim 1 wherein the etching resistance to an oxygen-containing etching plasma is intensified when treated with the bulging constituent.
Claim 12
Dependent Claim
11 words
The method of claim 1 wherein the bulging constituent includes silicon.
Claim 13
Dependent Claim
23 words
The method of claim 1 wherein a bulging constituent comprising aromatic groups is used for intensifying the etching resistance to a halogen-containing plasma.
Claim 14
Dependent Claim
30 words
The method of claim 1 wherein the bulging constituent includes a structure that cross-links with the photoresist in order to enhance the thermal and mechanical loadability of the photoresist structure.
Claim 15
Dependent Claim
23 words
The method of claim 1 wherein the extent of a bulging of the photoresist structure is controlled by the duration of the treatment.
Claim 16
Dependent Claim
21 words
The method of claim 1 wherein a bulging of the photoresist structure is controlled by the concentration of the bulging constituent.
Claim 17
Dependent Claim
19 words
The method of claim 1 wherein the extent of the bulging of the photoresist structure is controlled by temperature.
Claim 18
Dependent Claim
21 words
The method of claim 1 wherein the treatment of the photoresist structure is undertaken in a spray, puddle, or emersion developer.
References Cited (Backward Citations)
EP0052806A2
Cited
EP0130581A2
Cited
GB2154330A
Cited
US4751170A
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US4737425A
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US4945028A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-08-09 | 1997-02-08 | 1997-08-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-08-09 | 2001-02-08 | 2001-08-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-08-09 | 2005-02-08 | 2005-08-10 | $7700.00 | Window Closed / Lapsed |