Abstract A semiconductor manufacturing method analyzes topography variations in three dimensions for each photolithographic level and determines critical dimension (CD) bias compensation as inputs to mask layout creation. Accurate predictions of topography variation for a specific mask design are made at the die level using known pattern density and CMP planarization length characteristics for a specific pattern. Exhaustive characterization of the photoresist response to de-focus and mask bias is determined by artificially expanding loss of CD through focus. Mask compensation to an expanded range of focus over all lines and spaces is maintained within the specification. 3D mask density data is obtained to determine the height component at each pixel location in the die. The resulting 3D OPC model is then utilized for mask creation.
In a semiconductor manufacturing process having a stepper system for transferring a mask pattern onto a semiconductor wafer surface using an optical projection system, a method of compensating for topographic variations due to feature density on the wafer surface comprising: determining feature pattern density by location on the wafer surface; determining planarization length as a function of pattern density; computing feature elevation as a function of pattern density on the wafer surface; and adjusting focus of the stepper system to minimize out-of-focus exposure at high and low elevation features on the wafer surface.
Claim 2
Dependent Claim
93 words
In a semiconductor manufacturing process having a stepper system for transferring a mask pattern onto a semiconductor wafer surface using an optical projection system, a method of compensating for topographic variations due to feature density on the wafer surface comprising: determining feature pattern density by location on the wafer surface; determining planarization length as a function of pattern density; computing feature elevation as a function of pattern density on the wafer surface; and adjusting focus of the stepper system to minimize out-of-focus exposure at high and low elevation features on the wafer surface.
Claim 3
Dependent Claim
17 words
The method of claim 1 wherein setting of photolithographic characteristics comprises selecting photoresist and stepper response settings.
Claim 4
Dependent Claim
20 words
The method of claim 1 and including calculating mask density at a pixel size using feature height for each pixel.
Claim 5
Dependent Claim
19 words
The method of claim 3 and including using the calculated mask density as bias values for optical proximity correction.
Claim 6
Dependent Claim
37 words
The method of claim 1 and including obtaining a density profile of a processed semiconductor, correlating the density profile to 3D surface characteristics, and using the 3D surface characteristics to determine feature height on the semiconductor surface.