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US6558756B2 Expired / Lapsed US ⏱️ 0.0 years remaining

Method of forming interlayer insulating film

Assignee: Panasonic Holdings Corp
•
Filing: 2001-07-09
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Granted: 2003-05-06
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Expires: 2021-07-09
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Abstract

Abstract A material containing, as a main component, an organic silicon compound represented by the following general formula:(where R1 is a phenyl group or a vinyl group; R2 is an alkyl group; and x is an integer of 1 to 3) is caused to undergo plasma polymerization or react with an oxidizing agent to form an interlayer insulating film composed of a silicon oxide film containing an organic component. As the organic silicon compound where R1 is a phenyl group, there can be listed phenyltrimethoxysilane or diphenyldimethoxysilane. As the organic silicon compound where R1 is a vinyl group, there can be listed vinyltrimethoxysilane or divinyldimethoxysilane.

Inventors

  • 👤 Gaku Sugahara
  • 👤 Nobuo Aoi
  • 👤 Koji Arai
  • 👤 Kazuyuki Sawada

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 13:45
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922; C; C23; C23C; C23C16/00; C23C16/22; C23C16/26; C23C16/30; C23C16/40; C23C16/401; H10P14/66; H10P14/668; H10P14/6681; H10P14/6684; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/081; H10W20/084; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6336; H10P14/6342; H10P14/6682; H10P14/6686; H10P14/68; H10P14/683; H10P14/687; H10P14/69215; H10P14/6924; H10P95/00; H10P95/06; H10P95/08

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 51 words
A method of forming an interlayer insulating film, wherein a material containing no oxygen atoms, and, as a main component, a fluorinated carbon compound having a polycyclic structure in a molecule thereof is caused to undergo plasma polymerization to form an interlayer insulating film composed of a fluorinated amorphous carbon film.
Claim 2
Independent Claim 51 words
A method of forming an interlayer insulating film, wherein a material containing no oxygen atoms, and, as a main component, a fluorinated carbon compound having a polycyclic structure in a molecule thereof is caused to undergo plasma polymerization to form an interlayer insulating film composed of a fluorinated amorphous carbon film.
Claim 3
Dependent Claim 27 words
A method of forming an interlayer insulating film according to claim 1 , wherein said fluorinated carbon compound is composed only of carbon atoms and fluorine atoms.
Claim 4
Dependent Claim 27 words
A method of forming an interlayer insulating film according to claim 1 , wherein said fluorinated carbon compound has a condensed cyclic structure in the molecule thereof.
Claim 5
Dependent Claim 23 words
A method of forming an interlayer insulating film, according to claim 3 , wherein said fluorinated carbon compound is perfluorodecalin, perfluorofluorene, or perfluoro(tetradecahydrophenanthrene).

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Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2006-05-05 2006-11-04 2007-05-06 $2000.00 Window Closed / Lapsed
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