US4938995A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Fluoropolymer thin film coatings and method of preparation by plasma polymerization
Assignee: Standard Oil Co
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Filing: 1989-05-10
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Granted: 1990-07-03
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Expires: 2009-05-10
Abstract
Abstract The subject invention relates to a process for the deposition of an oxygen-containing high fluoropolymer thin film onto an approxpriate substrate comprising loading the substrate in an enclosed reactor; evacuating the reactor; charging the reactor with an inert carrier gas and an oxygen-containing fluorocarbon monomer feed gas; and plasma-polymerizing the feed gas such that a thin film of polymerized monomer is deposited onto the substrate. The invention further relates to an insulation material comprising the fluoropolymer thin film recited above, a plasma polymerized thin film of an oxygen-containing fluoropolymer, and the use of a polymerization precursor monomer for such thin films that is an oxygen-containing fluorocarbon monomer.
Inventors
- 👤 Paul J. Giordano
- 👤 George W. Prohaska
- 👤 Richard C. Smierciak
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 23:17
CPC Classifications
B; B05; B05D; B05D1/00; B05D1/62
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
156 words
A process for the deposition of an oxygen-containing, high fluoropolymer thin film onto an appropriate substrate comprising: (a) loading said substrate in an enclosed reactor; (b) evacuating said reactor; (c) charging said reactor with an inert carrier gas and an oxygen-containing fluorocarbon monomer feed gas; and (d) plasma-polymerizing said feed gas such that a thin film of polymerized monomer is deposited onto said substrate, wherein said monomer is a compound selected from the group consisting of: ##STR3## wherein at least one R is defined as a per fluorinated linear, branched or cyclic saturated alkyl group having at least 1 to 9 carbons, and the remaining R groups are selected from the group consisting of H; linear, branched or cyclic saturated alkyl groups; fluorinated linear, branched or cyclic saturated alkyl groups; perfluorinated linear, branched or cyclic saturated alkyl groups; and each of said alkyl groups may optionally contain one or more alcohol, ether, peroxide or epoxide functionalities.
Claim 2
Dependent Claim
156 words
A process for the deposition of an oxygen-containing, high fluoropolymer thin film onto an appropriate substrate comprising: (a) loading said substrate in an enclosed reactor; (b) evacuating said reactor; (c) charging said reactor with an inert carrier gas and an oxygen-containing fluorocarbon monomer feed gas; and (d) plasma-polymerizing said feed gas such that a thin film of polymerized monomer is deposited onto said substrate, wherein said monomer is a compound selected from the group consisting of: ##STR3## wherein at least one R is defined as a per fluorinated linear, branched or cyclic saturated alkyl group having at least 1 to 9 carbons, and the remaining R groups are selected from the group consisting of H; linear, branched or cyclic saturated alkyl groups; fluorinated linear, branched or cyclic saturated alkyl groups; perfluorinated linear, branched or cyclic saturated alkyl groups; and each of said alkyl groups may optionally contain one or more alcohol, ether, peroxide or epoxide functionalities.
Claim 3
Dependent Claim
23 words
The process of claim 1 wherein said monomer is selected from the group consisting of heptafluorobutanol, pentafluorodimethyl ether, perfluoropropylene oxide, and bis(trifluoromethyl) peroxide.
Claim 4
Dependent Claim
10 words
The process of claim 1 wherein said monomer is heptafluorobutanol.
Claim 5
Dependent Claim
19 words
The process of claim 1 wherein said substrate is selected from the group consisting of glass, plastic and metal.
Claim 6
Dependent Claim
31 words
The process of claim 1 wherein said fluoropolymer thin film is deposited at a rate of about 1,000 Angstroms/minute for a period of from about 1 minute to about 60 minutes.
Claim 7
Dependent Claim
14 words
The process of claim 1 wherein said inert carrier gas is argon or helium.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-07-02 | 1994-01-01 | 1994-07-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-07-02 | 1998-01-01 | 1998-07-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-07-02 | 2002-01-01 | 2002-07-03 | $7700.00 | Window Closed / Lapsed |