Patent US6450117B1 successfully refreshed from Google Patents.
US6450117B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Directing a flow of gas in a substrate processing chamber
Assignee: Applied Materials Inc
•
Filing: 2000-08-07
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Granted: 2002-09-17
•
Expires: 2020-08-07
Abstract
Abstract A substrate processing chamber 30 comprising a first gas distributor 65 adapted to provide a process gas into the chamber 30 to process the substrate 25 , a second gas distributor 215 adapted to provide a cleaning gas into the chamber 30 to clean the chamber, and an exhaust 90 to exhaust the process gas or cleaning gas from the chamber 30.
Inventors
- 👤 Laxman Murugesh
- 👤 Padmanaban Krishnaraj
- 👤 Michael Cox
- 👤 Canfeng Lai
- 👤 Narendra Dubey
- 👤 Tom K. Cho
- 👤 Sudhir Ram Gondhalekar
- 👤 Lily L. Pang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:34
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45563; C23C16/45574; C23C16/4401; C23C16/4402; C23C16/4405; C23C16/448; C23C16/452; C23C16/45502; C23C16/45508; H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; H01J37/32798; H01J37/32853; H01J37/32862; Y; Y10; Y10S; Y10S438/00; Y10S438/905
Claims Analysis
Total Claims: 69
Claim 1
Independent Claim
91 words
A substrate processing chamber comprising a sidewall and a ceiling, a first gas distributor adapted to provide a process gas into the chamber to process a substrate, a second gas distributor comprising an inlet adapted to receive a remotely energized cleaning gas and an outlet adapted to direct the remotely energized cleaning gas preferentially across a surface of one or more of the sidewall and ceiling in the chamber to clean the surface, and an exhaust to exhaust one or more of the process gas and cleaning gas from the chamber.
Claim 2
Dependent Claim
91 words
A substrate processing chamber comprising a sidewall and a ceiling, a first gas distributor adapted to provide a process gas into the chamber to process a substrate, a second gas distributor comprising an inlet adapted to receive a remotely energized cleaning gas and an outlet adapted to direct the remotely energized cleaning gas preferentially across a surface of one or more of the sidewall and ceiling in the chamber to clean the surface, and an exhaust to exhaust one or more of the process gas and cleaning gas from the chamber.
Claim 3
Dependent Claim
23 words
A chamber according to claim 1 wherein the outlet of the second gas distributor is about an outlet of the first gas distributor.
Claim 4
Dependent Claim
27 words
A chamber according to claim 1 wherein the second gas distributor is adapted to direct the remotely energized cleaning gas across a surface of a chamber component.
Claim 5
Dependent Claim
23 words
A chamber according to claim 3 wherein the second gas distributor is adapted to spread the remotely energized cleaning gas across the surface.
Claim 6
Dependent Claim
15 words
A chamber according to claim 3 wherein the surface is adapted to face a substrate.
Claim 7
Dependent Claim
28 words
A chamber according to claim 3 wherein the surface is heated to a temperature of at least about 200° C. during processing of a substrate in the chamber.
Claim 8
Dependent Claim
14 words
A chamber according to claim 1 wherein the second gas distributor comprises a baffle.
Claim 9
Dependent Claim
44 words
A chamber according to claim 7 wherein the second gas distributor comprises one or more gas outlets disposed to provide the remotely energized cleaning gas into the chamber so that the flow of the remotely energized cleaning gas may be directed by the baffle.
Claim 10
Dependent Claim
14 words
A chamber according to claim 7 wherein the baffle comprises a plurality of ridges.
Claim 11
Dependent Claim
18 words
A chamber according to claim 9 wherein the baffle comprises one or more gas outlets between the ridges.
Claim 12
Dependent Claim
31 words
A chamber according to claim 1 further comprising a remote chamber comprising a gas energizer adapted to energize cleaning gas prior to introducing the remotely energized cleaning gas into the chamber.
Claim 13
Dependent Claim
24 words
A chamber according to claim 11 wherein the remote chamber is upstream of a process zone a distance of less than about 50 cm.
Claim 14
Dependent Claim
30 words
A chamber according to claim 1 wherein the exhaust comprises an exhaust conduit, and wherein the second gas distributor comprises one or more gas outlets distal from the exhaust conduit.
Claim 15
Dependent Claim
20 words
A chamber according to claim 13 wherein the gas outlets are at least about 10 cm from the exhaust conduit.
Claim 16
Dependent Claim
24 words
A chamber according to claim 1 wherein the first gas distributor comprises one or more gas outlets around a periphery of a substrate support.
Claim 17
Dependent Claim
34 words
A substrate processing chamber according to claim 1 further comprising a substrate support capable of supporting the substrate, and a gas energizer to energize one or more of the process gas and cleaning gas.
Claim 18
Dependent Claim
74 words
A substrate processing chamber having a sidewall and a ceiling, the chamber comprising: first means for providing a process gas into the chamber to process the substrate; second means for energizing and directing a cleaning gas preferentially across a surface of one or more of the sidewall and ceiling in the chamber to clean the surface; and an exhaust to exhaust one or more of the process gas and cleaning gas from the chamber.
Claim 19
Dependent Claim
74 words
A substrate processing chamber having a sidewall and a ceiling, the chamber comprising: first means for providing a process gas into the chamber to process the substrate; second means for energizing and directing a cleaning gas preferentially across a surface of one or more of the sidewall and ceiling in the chamber to clean the surface; and an exhaust to exhaust one or more of the process gas and cleaning gas from the chamber.
Claim 20
Dependent Claim
20 words
A chamber according to claim 17 wherein the second means comprises an outlet about an outlet of the first means.
Claim 21
Dependent Claim
20 words
A chamber according to claim 17 wherein the second means is adapted to spread the cleaning gas across the surface.
Claim 22
Dependent Claim
37 words
A chamber according to claim 17 wherein the second means comprises a remote chamber that is upstream of a process zone in the chamber, and a gas energizer to energize the cleaning gas in the remote chamber.
Claim 23
Dependent Claim
30 words
A chamber according to claim 17 wherein the exhaust comprises an exhaust conduit, and wherein the second means provides the cleaning gas at a location distal from the exhaust conduit.
Claim 24
Dependent Claim
34 words
A substrate processing chamber according to claim 17 further comprising a substrate support capable of supporting the substrate, and a gas energizer to energize one or more of the process gas and cleaning gas.
Claim 25
Independent Claim
119 words
An apparatus capable of depositing material on a substrate, the apparatus comprising: a deposition chamber having a sidewall, a ceiling, a support to support a substrate, a first gas distributor to provide a deposition gas to the deposition chamber, a plasma generator to form a plasma from the deposition gas to deposit material on the substrate, and an exhaust to exhaust gas from the deposition chamber; a remote chamber adapted to energize a cleaning gas; and a second gas distributor connecting the remote chamber to the deposition chamber, the second gas distributor adapted to direct a flow of the energized cleaning gas preferentially across a surface of one or more of the sidewall and ceiling in the deposition chamber.
Claim 26
Independent Claim
119 words
An apparatus capable of depositing material on a substrate, the apparatus comprising: a deposition chamber having a sidewall, a ceiling, a support to support a substrate, a first gas distributor to provide a deposition gas to the deposition chamber, a plasma generator to form a plasma from the deposition gas to deposit material on the substrate, and an exhaust to exhaust gas from the deposition chamber; a remote chamber adapted to energize a cleaning gas; and a second gas distributor connecting the remote chamber to the deposition chamber, the second gas distributor adapted to direct a flow of the energized cleaning gas preferentially across a surface of one or more of the sidewall and ceiling in the deposition chamber.
Claim 27
Dependent Claim
22 words
An apparatus according to claim 23 wherein the second gas distributor comprises an outlet about an outlet of the first gas distributor.
Claim 28
Dependent Claim
22 words
An apparatus according to claim 23 wherein the second gas distributor is adapted to spread the cleaning gas flow across the surface.
Claim 29
Dependent Claim
14 words
An apparatus according to claim 23 wherein the second gas distributor comprises a baffle.
Claim 30
Dependent Claim
39 words
An apparatus according to claim 26 wherein the second gas distributor comprises one or more gas outlets disposed to provide cleaning gas into the chamber so that the flow of the cleaning gas may be directed by the baffle.
Claim 31
Dependent Claim
14 words
An apparatus according to claim 26 wherein the baffle comprises a plurality of ridges.
Claim 32
Dependent Claim
18 words
An apparatus according to claim 28 wherein the baffle comprises one or more gas outlets between the ridges.
Claim 33
Dependent Claim
15 words
An apparatus according to claim 23 wherein the surface at least partially faces the support.
Claim 34
Dependent Claim
28 words
An apparatus according to claim 23 wherein the surface is heated to a temperature of at least about 200° C. during processing of a substrate in the chamber.
Claim 35
Dependent Claim
30 words
An apparatus according to claim 23 wherein the exhaust comprises and exhaust conduit, and wherein the second gas distributor comprises second gas outlets that are distal from the exhaust conduit.
Claim 36
Dependent Claim
21 words
A substrate processing chamber according to claim 23 wherein the remote chamber comprises a gas energizer to energize the cleaning gas.
Claim 37
Dependent Claim
121 words
A substrate processing apparatus comprising: a substrate processing chamber comprising a sidewall, a ceiling, a support to support a substrate, a first gas distributor to provide a process gas to the substrate processing chamber, a plasma generator to form a plasma from the process gas to process the substrate, and an exhaust to exhaust gas from the substrate processing chamber; a remote chamber adapted to energize a cleaning gas; and a second gas distributor connecting the remote chamber to the substrate processing chamber to introduce the energized cleaning gas at a location that is distal from the exhaust and direct the cleaning gas preferentially across a surface of one or more of the sidewall and ceiling in the substrate processing chamber.
Claim 38
Dependent Claim
121 words
A substrate processing apparatus comprising: a substrate processing chamber comprising a sidewall, a ceiling, a support to support a substrate, a first gas distributor to provide a process gas to the substrate processing chamber, a plasma generator to form a plasma from the process gas to process the substrate, and an exhaust to exhaust gas from the substrate processing chamber; a remote chamber adapted to energize a cleaning gas; and a second gas distributor connecting the remote chamber to the substrate processing chamber to introduce the energized cleaning gas at a location that is distal from the exhaust and direct the cleaning gas preferentially across a surface of one or more of the sidewall and ceiling in the substrate processing chamber.
Claim 39
Dependent Claim
39 words
An apparatus according to claim 34 wherein the first gas distributor comprises one or more first gas outlets around a periphery of the support and the second gas distributor comprises one or more second gas outlets above the support.
Claim 40
Dependent Claim
32 words
An apparatus according to claim 34 wherein the exhaust comprises an exhaust conduit, and wherein one or more second gas distributor outlets are at least about 10 cm from the exhaust conduit.
Claim 41
Dependent Claim
21 words
An apparatus according to claim 34 wherein the second gas distributor is adapted to spread the cleaning gas across the surface.
Claim 42
Dependent Claim
14 words
An apparatus according to claim 34 wherein the second gas distributor comprises a baffle.
Claim 43
Dependent Claim
41 words
An apparatus according to claim 38 wherein the second gas distributor comprises one or more gas outlets disposed to provide cleaning gas into the substrate processing chamber so that the flow of the cleaning gas may be directed by the baffle.
Claim 44
Dependent Claim
21 words
A substrate processing chamber according to claim 34 wherein the remote chamber comprises a gas energizer to energize the cleaning gas.
Claim 45
Dependent Claim
61 words
A gas distributor capable of distributing a gas in a substrate processing chamber, the gas distributor comprising an inlet for receiving a remotely energized cleaning gas and one or more gas outlets adapted to direct the remotely energized cleaning gas preferentially across a surface of one or more of a sidewall or a ceiling in the chamber to clean the surface.
Claim 46
Dependent Claim
61 words
A gas distributor capable of distributing a gas in a substrate processing chamber, the gas distributor comprising an inlet for receiving a remotely energized cleaning gas and one or more gas outlets adapted to direct the remotely energized cleaning gas preferentially across a surface of one or more of a sidewall or a ceiling in the chamber to clean the surface.
Claim 47
Dependent Claim
14 words
A gas distributor according to claim 41 wherein the gas distributor comprises a baffle.
Claim 48
Dependent Claim
42 words
A gas distributor according to claim 41 wherein the gas distributor comprises one or more outlets disposed to provide remotely energized cleaning gas into the chamber so that the flow of the remotely energized cleaning gas may be directed by the baffle.
Claim 49
Dependent Claim
15 words
A gas distributor according to claim 43 wherein the baffle comprises a plurality of ridges.
Claim 50
Dependent Claim
19 words
A gas distributor according to claim 44 wherein the baffle comprises one or more gas outlets between the ridges.
Claim 51
Dependent Claim
103 words
A substrate processing chamber having a sidewall and a ceiling, the chamber comprising: a first gas distributor adapted to provide a process gas into the chamber to process a substrate; a second gas distributor comprising an inlet adapted to receive a remotely energized cleaning gas, a gas outlet, and a baffle, wherein the gas outlet and baffle cooperate to direct the remotely energized cleaning gas preferentially across a surface of one or more of the sidewall or ceiling in the chamber to clean the surface; and an exhaust to exhaust one or more of the process gas and cleaning gas from the chamber.
Claim 52
Dependent Claim
103 words
A substrate processing chamber having a sidewall and a ceiling, the chamber comprising: a first gas distributor adapted to provide a process gas into the chamber to process a substrate; a second gas distributor comprising an inlet adapted to receive a remotely energized cleaning gas, a gas outlet, and a baffle, wherein the gas outlet and baffle cooperate to direct the remotely energized cleaning gas preferentially across a surface of one or more of the sidewall or ceiling in the chamber to clean the surface; and an exhaust to exhaust one or more of the process gas and cleaning gas from the chamber.
Claim 53
Dependent Claim
34 words
A substrate processing chamber according to claim 46 wherein the baffle comprises a surface topography adapted to spread the remotely energized cleaning gas preferentially across a predefined portion of a ceiling of the chamber.
Claim 54
Dependent Claim
23 words
A substrate processing chamber according to claim 47 wherein the baffle has a surface topography that is substantially ridged, concave, or convex shaped.
Claim 55
Dependent Claim
24 words
A substrate processing chamber according to claim 46 wherein the baffle comprises a disc-shaped platen, and wherein the gas outlets are on the platen.
Claim 56
Dependent Claim
22 words
A substrate processing chamber according to claim 49 wherein the platen comprises ridges and wherein the gas outlets are between the ridges.
Claim 57
Dependent Claim
14 words
A substrate processing chamber according to claim 50 wherein the ridges comprise arcuate prongs.
Claim 58
Dependent Claim
18 words
A substrate processing chamber according to claim 51 wherein the arcuate prongs are arranged in a spiraling pattern.
Claim 59
Dependent Claim
34 words
A substrate processing chamber according to claim 46 further comprising a substrate support capable of supporting a substrate, and a gas energizer to energize one or more of the process gas and cleaning gas.
Claim 60
Dependent Claim
107 words
A substrate processing chamber comprising: a sidewall, a ceiling and a substrate support capable of supporting a substrate; a gas distributor adapted to provide a remotely energized gas into the chamber, the gas distributor comprising a gas inlet adapted to receive the remotely energized gas, a baffle having a substantially ridged surface, and gas outlets on the substantially ridged surface, wherein the substantially ridged surface and gas outlets cooperate to direct the remotely energized gas preferentially across a surface of one or more of the sidewall or ceiling in the chamber; a gas energizer to form the remotely energized gas; and an exhaust to exhaust the gas.
Claim 61
Dependent Claim
107 words
A substrate processing chamber comprising: a sidewall, a ceiling and a substrate support capable of supporting a substrate; a gas distributor adapted to provide a remotely energized gas into the chamber, the gas distributor comprising a gas inlet adapted to receive the remotely energized gas, a baffle having a substantially ridged surface, and gas outlets on the substantially ridged surface, wherein the substantially ridged surface and gas outlets cooperate to direct the remotely energized gas preferentially across a surface of one or more of the sidewall or ceiling in the chamber; a gas energizer to form the remotely energized gas; and an exhaust to exhaust the gas.
Claim 62
Dependent Claim
16 words
A substrate processing chamber according to claim 54 wherein the substantially ridged surface comprises arcuate prongs.
Claim 63
Dependent Claim
18 words
A substrate processing chamber according to claim 55 wherein the arcuate prongs are arranged in a spiraling pattern.
Claim 64
Dependent Claim
17 words
A substrate processing chamber according to claim 55 wherein the gas outlets are between the arcuate prongs.
Claim 65
Dependent Claim
15 words
A substrate processing chamber according to claim 55 wherein the baffle comprises a disc-shaped platen.
Claim 66
Dependent Claim
98 words
A substrate processing chamber comprising: a sidewall, a ceiling and a substrate support capable of supporting a substrate; a gas distributor adapted to provide a remotely energized gas into the chamber, the gas distributor comprising a gas inlet adapted to receive the remotely energized gas, and arcuate prongs having gas outlets therebetween, wherein the arcuate prongs and gas outlets cooperate to direct the remotely energized gas preferentially across a surface of one or more of the sidewall or ceiling in the chamber; a gas energizer to form the remotely energized gas; and an exhaust to exhaust the gas.
Claim 67
Dependent Claim
98 words
A substrate processing chamber comprising: a sidewall, a ceiling and a substrate support capable of supporting a substrate; a gas distributor adapted to provide a remotely energized gas into the chamber, the gas distributor comprising a gas inlet adapted to receive the remotely energized gas, and arcuate prongs having gas outlets therebetween, wherein the arcuate prongs and gas outlets cooperate to direct the remotely energized gas preferentially across a surface of one or more of the sidewall or ceiling in the chamber; a gas energizer to form the remotely energized gas; and an exhaust to exhaust the gas.
Claim 68
Dependent Claim
18 words
A substrate processing chamber according to claim 59 wherein the arcuate prongs are arranged in a spiraling pattern.
Claim 69
Dependent Claim
18 words
A substrate processing chamber according to claim 59 wherein the arcuate prongs are mounted on a disc-shaped platen.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2005-09-16 | 2006-03-18 | 2006-09-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-09-16 | 2010-03-18 | 2010-09-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-09-16 | 2014-03-18 | 2014-09-17 | $7700.00 | Window Closed / Lapsed |