US4433228A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Microwave plasma source
Assignee: Hitachi Ltd
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Filing: 1981-11-10
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Granted: 1984-02-21
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Expires: 2001-11-10
Abstract
Abstract The microwave plasma source of this invention comprises a vacuum room which forms a discharging space with discharge gas introduced therein, a means for conducting the microwave to the discharging space so that the microwave electric field is provided in the discharging space, and a means for providing the magnetic field in the discharging space located on the microwave propagating path and made up of a permanent magnet which virtually propagates the microwave.
Inventors
- 👤 Shigeru Nishimatsu
- 👤 Keizo Suzuki
- 👤 Noriyuki Sakudo
- 👤 Ken Ninomiya
- 👤 Hidemi Koike
- 👤 Osami Okada
- 👤 Shinjiro Katagiri
- 👤 Sadayuki Okudaira
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 03:48
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/32293
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
66 words
A microwave plasma source comprising: a vacuum room which includes a discharging space in which discharge gas is introduced; means for introducing microwave energy through a propagating path leading to said discharging space to provide a microwave electric field in said discharging space; and a permanent magnet located in said propagating path leading to said discharging space for generating a magnetic field in said discharging space.
Claim 2
Dependent Claim
66 words
A microwave plasma source comprising: a vacuum room which includes a discharging space in which discharge gas is introduced; means for introducing microwave energy through a propagating path leading to said discharging space to provide a microwave electric field in said discharging space; and a permanent magnet located in said propagating path leading to said discharging space for generating a magnetic field in said discharging space.
Claim 3
Dependent Claim
93 words
A microwave plasma source comprising: a vacuum room which includes a discharging space in which discharge gas is introduced; means for introducing microwave energy through a propagating path leading to said discharging space to provide a microwave electric field in said discharging space; and first and second magnetic field providing means confronting each other with said discharging space located therebetween to provide a magnetic field in said discharging space, said first magnetic field providing means being located in said propagating path leading to said discharging space and being formed of a permanent magnet.
Claim 4
Dependent Claim
93 words
A microwave plasma source comprising: a vacuum room which includes a discharging space in which discharge gas is introduced; means for introducing microwave energy through a propagating path leading to said discharging space to provide a microwave electric field in said discharging space; and first and second magnetic field providing means confronting each other with said discharging space located therebetween to provide a magnetic field in said discharging space, said first magnetic field providing means being located in said propagating path leading to said discharging space and being formed of a permanent magnet.
Claim 5
Dependent Claim
25 words
A microwave plasma source according to claim 1 or 2, wherein said permanent magnet comprises a material having a high transmissivity for said microwave energy.
Claim 6
Dependent Claim
18 words
A microwave plasma source according to claim 3, wherein said permanent magnet is comprised of an insulating material.
Claim 7
Dependent Claim
18 words
A microwave plasma source according to claim 4, wherein said permanent magnet is a ferrite magnet including Ba.
Claim 8
Dependent Claim
18 words
A microwave plasma source according to claim 4, wherein said permanent magnet is a ferrite magnet including Sr.
Claim 9
Dependent Claim
21 words
A microwave plasma source according to claim 2, wherein said second magnetic field providing means is comprised of a permanent magnet.
Claim 10
Dependent Claim
25 words
A microwave plasma source according to claim 2 or 7, wherein said first and second magnetic field providing means are located in said vacuum room.
Claim 11
Dependent Claim
20 words
A microwave plasma source according to claim 1 or 2, further comprising an electromagnet located adjacent to said propagating path.
Claim 12
Dependent Claim
18 words
A microwave plasma source according to claim 3, further comprising an electromagnet located adjacent to said propagating path.
Claim 13
Dependent Claim
16 words
A microwave plasma source according to claim 3, wherein said propagating means comprises a circular waveguide.
Claim 14
Dependent Claim
22 words
A microwave plasma source according to claim 4, wherein said first magnetic field providing means is located outside of said vacuum room.
Claim 15
Dependent Claim
22 words
A microwave plasma source according to claim 4, wherein said second magnetic field providing means is located outside of said vacuum room.
Claim 16
Dependent Claim
25 words
A microwave plasma source according to claim 4, wherein said first and second magnetic field providing means are both located outside of said vacuum room.
Claim 17
Dependent Claim
23 words
A microwave plasma source according to claim 14, wherein said first and second magnetic field providing means are coupled by a magnetic circuit.
Claim 18
Dependent Claim
19 words
A microwave plasma source according to claim 15, wherein said magnetic circuit has the magnetic resistance thereof being variable.
Claim 19
Dependent Claim
26 words
A microwave plasma source according to claim 12, 13, 14, 15 or 16, wherein said second magnetic field providing means is comprised of a permanent magnet.
Claim 20
Dependent Claim
39 words
A microwave plasma source according to claim 4 wherein said second magnetic field providing means is located within said vacuum room and is comprised of a permanent magnet having a plurality of through holes provided in the thickness direction.
Claim 21
Dependent Claim
99 words
A microwave plasma source comprising: a vacuum room which includes a discharging space in which discharge gas is introduced; means for introducing microwave energy through a propagating waveguide leading to said discharging space to provide a microwave electric field in said discharging space; and first and second permanent magnets confronting each other with said discharging space located therebetween to provide a magnetic field in said discharging space, said first magnetic field providing means being located in said propagating waveguide leading to said discharging space and being formed of a material which has a high transmissivity for said microwave energy.
Claim 22
Dependent Claim
99 words
A microwave plasma source comprising: a vacuum room which includes a discharging space in which discharge gas is introduced; means for introducing microwave energy through a propagating waveguide leading to said discharging space to provide a microwave electric field in said discharging space; and first and second permanent magnets confronting each other with said discharging space located therebetween to provide a magnetic field in said discharging space, said first magnetic field providing means being located in said propagating waveguide leading to said discharging space and being formed of a material which has a high transmissivity for said microwave energy.
Claim 23
Dependent Claim
16 words
A microwave plasma source according to claim 19, wherein said propagating waveguide is a circular waveguide.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-02-20 | 1987-08-22 | 1988-02-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-02-20 | 1991-08-22 | 1992-02-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-02-20 | 1995-08-22 | 1996-02-21 | $7700.00 | Window Closed / Lapsed |