Patent US6048647A successfully refreshed from Google Patents.
US6048647A
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Phase shift mask of attenuation type and manufacturing method thereof
Assignee: Renesas Electronics Corp
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Filing: 1997-11-07
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Granted: 2000-04-11
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Expires: 2017-11-07
Abstract
Abstract In accordance with a phase shift mask of attenuation type and a manufacturing method thereof, at a prescribed region of a phase shifter portion near and around a light transmitting portion, an auxiliary pattern is provided for controlling an amount of exposure light onto a portion of an exposed material corresponding to this region. Auxiliary pattern enables to cancel light intensity of a side lobe, thereby preventing generation of a region having a high light intensity (a side lobe) at the periphery of the light transmitting portion of the phase shift mask of attenuation type.
Inventors
- 👤 Junji Miyazaki
- 👤 Akihiro Nakae
- 👤 Nobuyuki Yoshioka
- 👤 Hidehiko Kozawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 11:39
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/32; G03F1/36
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
121 words
A phase shift mask of the attenuation type, comprising: a first light transmitting portion formed of a semi-transparent film at a prescribed location on a photomask substrate, for controlling transmittance and phase of exposure light passing therethrough; a second light transmitting portion comprising openings formed in said semi-transparent film and surrounded by said first light transmitting portion for exposing a surface of said photomask substrate; and an auxiliary pattern formed within said first light transmitting portion and comprising a light shielding pattern having an area smaller than the area of said second light transmitting portion, said auxiliary pattern provided at a portion where a side lobe image generated by the exposure light transmitted through the first light transmitting portion is cancelled.
Claim 2
Dependent Claim
121 words
A phase shift mask of the attenuation type, comprising: a first light transmitting portion formed of a semi-transparent film at a prescribed location on a photomask substrate, for controlling transmittance and phase of exposure light passing therethrough; a second light transmitting portion comprising openings formed in said semi-transparent film and surrounded by said first light transmitting portion for exposing a surface of said photomask substrate; and an auxiliary pattern formed within said first light transmitting portion and comprising a light shielding pattern having an area smaller than the area of said second light transmitting portion, said auxiliary pattern provided at a portion where a side lobe image generated by the exposure light transmitted through the first light transmitting portion is cancelled.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-04-11 | 2003-10-11 | 2004-04-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-04-11 | 2007-10-11 | 2008-04-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-04-11 | 2011-10-11 | 2012-04-11 | $7700.00 | Window Closed / Lapsed |