US5434647A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Projector for exposing photosensitive substrate
Assignee: NEC Corp
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Filing: 1994-04-19
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Granted: 1995-07-18
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Expires: 2014-04-19
Abstract
Abstract A projector for exposing a photosensitive substrate includes a mask having an exposure pattern thereon composed of half-transparent material which causes a phase difference among lights passing therethrough, a first optical system for illuminating the mask, a second optical system for projecting the exposure pattern on the photosensitive substrate, and a device, disposed ahead of the first optical system, for controlling a quantity of illumination light to be irradiated in a plurality of areas of the first optical system.
Inventors
- 👤 Hiroyoshi Tanabe
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 12:12
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70558; G03F7/70058; G03F7/70125; G03F7/70216; G03F7/70283
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
99 words
A projector for exposing a photosensitive substrate, comprising: a mask having an exposure pattern thereon composed of half-transparent material which cause a phase difference among lights passing therethrough, said pattern including an isolated pattern and an arranged pattern; a first optical system for illuminating said mask with light provided from a light source; a second optical system for projecting said exposure pattern on the photosensitive substrate; and control means, disposed between the light source and said first optical system, for controlling a quantity of illumination light to be irradiated in a plurality of areas of said first optical system.
Claim 2
Dependent Claim
99 words
A projector for exposing a photosensitive substrate, comprising: a mask having an exposure pattern thereon composed of half-transparent material which cause a phase difference among lights passing therethrough, said pattern including an isolated pattern and an arranged pattern; a first optical system for illuminating said mask with light provided from a light source; a second optical system for projecting said exposure pattern on the photosensitive substrate; and control means, disposed between the light source and said first optical system, for controlling a quantity of illumination light to be irradiated in a plurality of areas of said first optical system.
Claim 3
Dependent Claim
40 words
A projector in accordance with claim 1, wherein the quantity of illumination light to be irradiated in a central portion of the first optical system is smaller than the quantity of illumination light to be irradiated around said central portion.
Claim 4
Dependent Claim
23 words
A projector in accordance with claim 2, wherein said quantity of illumination light to be irradiated in the central portion is zero (0).
Claim 5
Dependent Claim
44 words
A projector in accordance with claim 1, wherein said control means comprise a plate for interrupting passage of light, said plate including a central circular portion and an annular portion disposed coaxially with the central circular portion, said portions interrupting light from passing therethrough.
Claim 6
Dependent Claim
15 words
A projector in accordance with claim 1, wherein said control means is detachable or interchangeable.
Claim 7
Dependent Claim
20 words
A projector in accordance with claim 1, wherein said control means comprise a moving or oscillating reflection mirror or prism.
Claim 8
Dependent Claim
99 words
A projector for exposing a photosensitive substrate, comprising: a mask having an exposure pattern thereon composed of half-transparent material which causes a phase difference among lights passing therethrough, said pattern including an isolated pattern and an arranged pattern; a first optical system for illuminating said mask with light provided from a light source; a second optical system for projecting said exposure pattern on the photosensitive substrate; and means, disposed between the light source and said first optical system, for darkening a central portion of the illumination light relative to a portion around said central portion of the illumination light.
Claim 9
Dependent Claim
99 words
A projector for exposing a photosensitive substrate, comprising: a mask having an exposure pattern thereon composed of half-transparent material which causes a phase difference among lights passing therethrough, said pattern including an isolated pattern and an arranged pattern; a first optical system for illuminating said mask with light provided from a light source; a second optical system for projecting said exposure pattern on the photosensitive substrate; and means, disposed between the light source and said first optical system, for darkening a central portion of the illumination light relative to a portion around said central portion of the illumination light.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-07-17 | 1999-01-16 | 1999-07-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-07-17 | 2003-01-16 | 2003-07-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-07-17 | 2007-01-16 | 2007-07-18 | $7700.00 | Window Closed / Lapsed |