US5170293A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure mechanism
Assignee: Sharp Corp
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Filing: 1992-02-13
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Granted: 1992-12-08
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Expires: 2012-02-13
Abstract
Abstract An exposure mechanism having a hole pattern for forming a resist pattern to be used in a photolithography process when a semiconductor device is fabricated, the hole pattern including a central light transmitting portion provided on a transparent substrate, through which exposed light can pass, a plurality of slit-shaped light transmitting portions provided around the central light transmitting portion, and a light intercepting portion provided on the transparent substrate for forming the central light transmitting portion and the slit-shaped light transmitting portions.
Inventors
- 👤 Keisuke Tanimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 00:43
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70425; G03F7/70433; G02; G02B; G02B5/00; G02B5/005; G02B5/18; G02B5/1876; G02B5/188; G03F7/20; G03F7/2002
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
82 words
An exposure mechanism having a hole pattern for forming a resist pattern to be used in a photolithography process when a semiconductor device is fabricated, the hole pattern comprising; a central light transmitting portion provided on a transparent substrate, through which exposed light can pass, a plurality of slit-shaped light transmitting portions provided around the central light transmitting portion, and a light intercepting portion provided on the transparent substrate for forming the central light transmitting portion and the slit-shaped light transmitting portions.
Claim 2
Dependent Claim
82 words
An exposure mechanism having a hole pattern for forming a resist pattern to be used in a photolithography process when a semiconductor device is fabricated, the hole pattern comprising; a central light transmitting portion provided on a transparent substrate, through which exposed light can pass, a plurality of slit-shaped light transmitting portions provided around the central light transmitting portion, and a light intercepting portion provided on the transparent substrate for forming the central light transmitting portion and the slit-shaped light transmitting portions.
Claim 3
Dependent Claim
40 words
The exposure mechanism according to claim 1, wherein the central light transmitting portion is circular and the slit-shaped light transmitting portions are three slit-shaped light transmitting portions which are provided like concentric circles around said circular central light transmitting portion.
Claim 4
Dependent Claim
43 words
The exposure mechanism according to claim 1, wherein the central light transmitting portion is rectangular and the slit-shaped light transmitting portions are a plurality of slit-shaped light transmitting portions which are provided like frames to sequentially surround said rectangular central light transmitting portion.
Claim 5
Dependent Claim
47 words
The exposure mechanism according to claim 1, wherein the central light transmitting portion is rectangular and the slit-shaped light transmitting portions are a plurality of slit-shaped light transmitting portions which are provided like small rectangles to sequentially surround the sides of said rectangular central light transmitting portion.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-12-08 | 1996-06-08 | 1996-12-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-12-08 | 2000-06-08 | 2000-12-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-12-08 | 2004-06-08 | 2004-12-08 | $7700.00 | Window Closed / Lapsed |