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US5942328A Expired / Lapsed US ⏱️ 0.0 years remaining

Low dielectric constant amorphous fluorinated carbon and method of preparation

Assignee: GlobalFoundries Inc
•
Filing: 1996-02-29
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Granted: 1999-08-24
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Expires: 2016-02-29
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Abstract

Abstract An amorphous fluorinated carbon film for use as a dielectric insulating layer in electrical devices is formed from a fluorinated cyclic hydrocarbon precursor. The precursor may be selected from the group consisting of hexafluorobenzene, 1,2-diethynyltetrafluorobenzene and 1,4-bis(trifluoromethyl) benzene. The film is deposited by a radiation or beam assisted deposition technique such as an ion beam assisted deposition method, a laser assisted deposition method, or a plasma assisted chemical vapor deposition method. The film is thermally stable in non-oxidizing environment at temperatures up to 400° C. and has a low dielectric constant of less than 3.0. The film can be suitably used as an insulator for spacing apart conductors in an interconnect structure.

Inventors

  • 👤 Alfred Grill
  • 👤 Vishnubhai Vitthalbhai Patel

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 23:53
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/68; H10P14/683; H10P14/687; H10W; H10W20/00; H10W20/01; H10W20/071; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6336; H10P14/69; H10P14/6902; H10W20/081; H10W20/084; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802; Y10T428/30; Y10T428/31504; Y10T428/31678

Claims Analysis

Total Claims: 16
Claim 1
Independent Claim 26 words
An amorphous fluorinated carbon film formed from a fluorinated cyclic hydrocarbon precursor comprising fluorine in a concentration range between about 22 and about 42 atomic percent.
Claim 2
Dependent Claim 26 words
An amorphous fluorinated carbon film formed from a fluorinated cyclic hydrocarbon precursor comprising fluorine in a concentration range between about 22 and about 42 atomic percent.
Claim 3
Dependent Claim 26 words
An amorphous fluorinated carbon film according to claim 1, wherein said fluorinated cyclic hydrocarbon is selected from the group consisting of hexafluorobenzene, 1,2-diethynyltetrafluorobenzene and 1,4-bis(trifluoromethyl) benzene.
Claim 4
Dependent Claim 22 words
An amorphous fluorinated carbon film according to claim 1, wherein said film is formed by a radiation or beam assisted deposition technique.
Claim 5
Dependent Claim 42 words
An amorphous fluorinated carbon film according to claim 1, wherein said film is formed by a technique selected from the group consisting of an ion beam assisted deposition technique, a laser assisted deposition technique and a plasma assisted chemical vapor deposition technique.
Claim 6
Dependent Claim 24 words
An amorphous fluorinated carbon film according to claim 1, wherein said film is thermally stable in non-oxidizing environment at temperatures up to 400° C.
Claim 7
Dependent Claim 20 words
An amorphous fluorinated carbon film according to claim 1, wherein said film has a dielectric constant of less than 3.0.
Claim 8
Dependent Claim 23 words
An amorphous fluorinated carbon film according to claim 1, wherein said film is used as an interconnect dielectric layer in an electronic device.
Claim 9
Dependent Claim 28 words
A cross linked amorphous fluorinated carbon film formed from a fluorinated cyclic hydrocarbon precursor comprising fluorine in a concentration range between about 22 and about 42 atomic percent.
Claim 10
Dependent Claim 28 words
A cross linked amorphous fluorinated carbon film formed from a fluorinated cyclic hydrocarbon precursor comprising fluorine in a concentration range between about 22 and about 42 atomic percent.
Claim 11
Dependent Claim 26 words
An amorphous fluorinated carbon film according to claim 8, wherein said fluorinated cyclic hydrocarbon is selected from the group consisting of hexafluorobenzene, 1,2-diethynyltetrafluorobenzene and 1,4-bis(trifluoromethyl) benzene.
Claim 12
Dependent Claim 22 words
An amorphous fluorinated carbon film according to claim 8, wherein said film is formed by a radiation or beam assisted deposition technique.
Claim 13
Dependent Claim 53 words
An amorphous fluorinated carbon film according to claim 8, wherein said film is formed by a technique selected from the group consisting of an ion beam assisted deposition technique, a laser assisted deposition technique and a plasma assisted chemical vapor deposition technique such as plasma enhanced chemical vapor deposition or high density plasma.
Claim 14
Dependent Claim 24 words
An amorphous fluorinated carbon film according to claim 8, wherein said film is thermally stable in non-oxidizing environment at temperatures up to 400° C.
Claim 15
Dependent Claim 20 words
An amorphous fluorinated carbon film according to claim 8, wherein said film has a dielectric constant of less than 3.0.
Claim 16
Dependent Claim 23 words
An amorphous fluorinated carbon film according to claim 8, wherein said film is used as an interconnect dielectric layer in an electronic device.

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3.5 Years (Year 4) 2002-08-23 2003-02-22 2003-08-24 $2000.00 Window Closed / Lapsed
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