Patent US5835677A successfully refreshed from Google Patents.
US5835677A
Expired / Lapsed
US
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Liquid vaporizer system and method
Assignee: Veeco Instruments Inc
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Filing: 1996-10-03
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Granted: 1998-11-10
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Expires: 2016-10-03
Abstract
Abstract A liquid vaporizer apparatus and method for chemical vapor deposition of liquid solutions into a controlled atmosphere of a CVD reaction chamber. The apparatus comprises an atomizer, gas curtain, heated porous media disks and a carrier gas mixer. The invention provides for the independent control of temperature, pressure and precursor stoichiometry during the atomizing and vaporization process thereby rendering the precise precursor vapor quality and quantity required for a given application. The invention employs the use of removable porous media disks which may be varied according to the desired operating pressure and precursors. In operation, the apparatus provides for a liquid precursor to first be atomized into a mist using an ultrasonic nozzle, then vaporized by heated media disks, and mixed with a carrier gas, then forced into CVD reaction chamber.
Inventors
- 👤 Ting Kai Li
- 👤 Alexander I. Gurary
- 👤 Dane C. Scott
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:48
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/448; C23C16/4486
Claims Analysis
Total Claims: 60
Claim 1
Independent Claim
131 words
A liquid vaporizer apparatus for use in connection with chemical vapor deposition processes comprising: (a) a chamber having at least one liquid precursor supply inlet and at least one vapor outlet; (b) an ultrasonic nozzle for converting said at least one liquid precursor into an atomized mist having a consistent droplet sizes distribution which is independent of gas pressures within said chamber; and (c) a heated contact surface disposed between said ultrasonic nozzle and said at least one vapor outlet for preventing said atomized mist from exiting said at least one vapor outlet without contacting said heated contact surface for vaporizing substantially all of said atomized mist by direct contact with said heated contact surface within said chamber, whereby a vapor can be supplied from said at least one vapor outlet.
Claim 2
Dependent Claim
131 words
A liquid vaporizer apparatus for use in connection with chemical vapor deposition processes comprising: (a) a chamber having at least one liquid precursor supply inlet and at least one vapor outlet; (b) an ultrasonic nozzle for converting said at least one liquid precursor into an atomized mist having a consistent droplet sizes distribution which is independent of gas pressures within said chamber; and (c) a heated contact surface disposed between said ultrasonic nozzle and said at least one vapor outlet for preventing said atomized mist from exiting said at least one vapor outlet without contacting said heated contact surface for vaporizing substantially all of said atomized mist by direct contact with said heated contact surface within said chamber, whereby a vapor can be supplied from said at least one vapor outlet.
Claim 3
Dependent Claim
55 words
The apparatus of claim 1 wherein said chamber includes inner walls, and including gas curtain means for introducing a curtain of unheated gas into said chamber for preventing said atomized mist from contacting said inner walls of said chamber and for preventing valorization of said atomized mist prior to contact with said heated contact surface.
Claim 4
Dependent Claim
17 words
The apparatus of claim 1 wherein said heated contact surface comprises at least one porous contact member.
Claim 5
Dependent Claim
19 words
The apparatus of claim 3 wherein said at least one porous contact member comprises at least one porous disk.
Claim 6
Dependent Claim
13 words
The apparatus of claim 3 including a plurality of said porous contact members.
Claim 7
Dependent Claim
25 words
The apparatus of claim 5 wherein said plurality of porous contact members are arranged in series, substantially perpendicularly aligned with respect to said ultrasound nozzle.
Claim 8
Dependent Claim
42 words
The apparatus of claim 1, including carrier gas means for introducing a heated carrier gas at a temperature substantially corresponding to that of said vapor proximate to said heated contact surface so as to mix said vapor with said heated carrier gas.
Claim 9
Dependent Claim
16 words
The apparatus of claim 1, wherein said chamber includes cooling means for cooling said ultrasound nozzle.
Claim 10
Dependent Claim
27 words
The apparatus of claim 8, wherein said chamber includes at least one thermocouple for monitoring the inside temperature of said chamber and for controlling said cooling means.
Claim 11
Dependent Claim
14 words
The apparatus of claim 7, including heating means for heating said heated contact surface.
Claim 12
Dependent Claim
36 words
The apparatus of claim 10, wherein said chamber includes a jacket surrounding said heating means and associated with said carrier gas means for preheating said carrier gas prior to introduction proximate to said heated contact surface.
Claim 13
Dependent Claim
18 words
The apparatus of claim 1, further comprising an outer evacuated jacket for insulating said chamber from ambient temperatures.
Claim 14
Dependent Claim
12 words
The apparatus of claim 1, wherein said heated contact surface is removable.
Claim 15
Dependent Claim
31 words
The apparatus of claim 5, wherein said plurality of porous contact members vary in porosity whereby a pressure gradient is formed between said chamber and said at least one vapor outlet.
Claim 16
Dependent Claim
23 words
The apparatus of claim 1, wherein said apparatus includes means for connecting said at least one vapor outlet to a CVD reaction chamber.
Claim 17
Dependent Claim
160 words
A liquid vaporizer apparatus for supplying a vapor to a chemical vapor deposition reaction chamber comprising: (a) a chamber having at least one liquid supply inlet for supplying at least one liquid precursor to said chamber and at least one vapor outlet; (b) an ultrasonic nozzle for ultrasonically atomizing said at least one liquid precursor into an atomized mist having a consistent droplet size distribution independent of gas pressures within said chamber; (c) a heated contact surface disposed between said ultrasonic nozzle and said at least one vapor outlet for preventing said atomized mist from exiting said at least one vapor outlet without contacting said heated contact surface for vaporizing substantially all of said atomized mist by direct contact with said heated contact surface within said chamber, whereby a vapor can be supplied from said at least one vapor outlet; and (d) control means for preventing premature vaporization of said atomized mist prior to contact with said heated contact surface.
Claim 18
Dependent Claim
160 words
A liquid vaporizer apparatus for supplying a vapor to a chemical vapor deposition reaction chamber comprising: (a) a chamber having at least one liquid supply inlet for supplying at least one liquid precursor to said chamber and at least one vapor outlet; (b) an ultrasonic nozzle for ultrasonically atomizing said at least one liquid precursor into an atomized mist having a consistent droplet size distribution independent of gas pressures within said chamber; (c) a heated contact surface disposed between said ultrasonic nozzle and said at least one vapor outlet for preventing said atomized mist from exiting said at least one vapor outlet without contacting said heated contact surface for vaporizing substantially all of said atomized mist by direct contact with said heated contact surface within said chamber, whereby a vapor can be supplied from said at least one vapor outlet; and (d) control means for preventing premature vaporization of said atomized mist prior to contact with said heated contact surface.
Claim 19
Dependent Claim
43 words
The apparatus of claim 16, wherein said chamber includes inner walls, and wherein said control means comprises gas curtain means for introducing a curtain of unheated gas into said chamber for preventing said atomized mist from contacting said inner walls of said chamber.
Claim 20
Dependent Claim
17 words
The apparatus of claim 16, wherein said heated contact surface comprises at least one porous contact member.
Claim 21
Dependent Claim
19 words
The apparatus of claim 18 wherein said at least one porous contact member comprises at least one porous disk.
Claim 22
Dependent Claim
13 words
The apparatus of claim 18 including a plurality of said porous contact members.
Claim 23
Dependent Claim
25 words
The apparatus of claim 14 wherein said plurality of porous contact members are arranged in series, substantially perpendicularly aligned with respect to said atomizing means.
Claim 24
Dependent Claim
30 words
The apparatus of claim 16, including carrier gas means for introducing a carrier gas proximate to said heated contact surface so as to mix said vapor with said carrier gas.
Claim 25
Dependent Claim
17 words
The apparatus of claim 16, wherein said control means comprises cooling means for cooling said ultrasonic nozzle.
Claim 26
Dependent Claim
18 words
The apparatus of claim 23, wherein said control means includes cooling control means for controlling said cooling means.
Claim 27
Dependent Claim
13 words
The apparatus of claim 24, wherein said cooling control means comprises a thermocouple.
Claim 28
Dependent Claim
14 words
The apparatus of claim 22 including heating means for heating said heated contact surface.
Claim 29
Dependent Claim
36 words
The apparatus of claim 26, wherein said chamber includes a jacket surrounding said heating means and associated with said carrier gas means for preheating said carrier gas prior to introduction proximate to said heated contact surface.
Claim 30
Dependent Claim
18 words
The apparatus of claim 16, further comprising an outer evacuated jacket for insulating said chamber from ambient temperatures.
Claim 31
Dependent Claim
12 words
The apparatus of claim 16, wherein said heated contact surface is removable.
Claim 32
Dependent Claim
30 words
The apparatus of claim 20, wherein said plurality of contact members vary in porosity whereby a pressure gradient is formed between said chamber and said at least one vapor outlet.
Claim 33
Independent Claim
109 words
A method of vaporizing a liquid precursor for use in a chemical vapor deposition process comprising the steps of: (a) providing a liquid precursor at a preselected temperature to an ultrasonic nozzle within a chamber; (b) ultrasonically atomizing said liquid precursor into an atomized mist substantially at said preselected temperature; (c) vaporizing said atomized mist into a vapor by contacting said atomized mist with a heated contact surface; and (d) maintaining said liquid precursor in the form of said atomized mist prior to contacting said atomized mist with said heated contact surface whereby substantially all of said atomized mist is vaporized by direct contact with said heated contact surface.
Claim 34
Independent Claim
109 words
A method of vaporizing a liquid precursor for use in a chemical vapor deposition process comprising the steps of: (a) providing a liquid precursor at a preselected temperature to an ultrasonic nozzle within a chamber; (b) ultrasonically atomizing said liquid precursor into an atomized mist substantially at said preselected temperature; (c) vaporizing said atomized mist into a vapor by contacting said atomized mist with a heated contact surface; and (d) maintaining said liquid precursor in the form of said atomized mist prior to contacting said atomized mist with said heated contact surface whereby substantially all of said atomized mist is vaporized by direct contact with said heated contact surface.
Claim 35
Dependent Claim
33 words
The method of claim 31 including providing a gas curtain within said chamber surrounding said liquid precursor mist so as to prevent said liquid precursor mist from contacting the walls of said chamber.
Claim 36
Dependent Claim
30 words
The method of claim 31 wherein said liquid precursor is intended for use in a chemical vapor deposition reactor, and including supplying said vapor to said chemical vapor deposition reactor.
Claim 37
Dependent Claim
20 words
The method of claim 31 including contacting said liquid precursor with a plurality of said heated contact surfaces in series.
Claim 38
Dependent Claim
29 words
The method of claim 31 including introducing a carrier gas at a location proximate to said heated contact surface so as to mix said vapor with said carrier gas.
Claim 39
Dependent Claim
12 words
The method of claim 31 including providing cooling during said atomizing step.
Claim 40
Dependent Claim
25 words
The method of claim 35 including preheating said carrier gas prior to introducing said carrier gas at a location proximate to said heated contact surface.
Claim 41
Dependent Claim
17 words
The method of claim 31, further comprising the step of removing said heated contact surface for cleaning.
Claim 42
Dependent Claim
19 words
The method of claim 31, wherein said liquid precursor comprises at least one liquid precursor for a BST film.
Claim 43
Dependent Claim
21 words
The method of claim 32, wherein said gas curtain comprises a gas selected from the group consisting of nitrogen and argon.
Claim 44
Dependent Claim
21 words
The method of claim 35, wherein said carrier gas comprises a gas selected from the group consisting of nitrogen and argon.
Claim 45
Dependent Claim
14 words
The method of claim 31, further comprising controlling the temperature during said vaporizing step.
Claim 46
Dependent Claim
156 words
A liquid vaporizer apparatus for supplying a vapor to a chemical vapor deposition reaction chamber comprising: (a) a chamber having at least one liquid precursor supply inlet and at least one vapor outlet; (b) an ultrasonic nozzle for ultrasonically converting said at least one liquid precursor into an atomized mist within said chamber; (c) a heated contact surface having a high thermal conductivity and high specific heat in order to obtain a uniform temperature distribution across said heated contact surface for vaporizing substantially all of said atomized mist by direct contact within said chamber, whereby a vapor can be supplied from said at least one vapor outlet; (d) heating means for heating said heated contact surface; and (e) temperature control means for maintaining the temperature of said heated contact surface at a predetermined temperature for vaporizing said atomized mist, whereby the temperature of said heated contact surface is independent of the temperature of said atomized mist.
Claim 47
Dependent Claim
156 words
A liquid vaporizer apparatus for supplying a vapor to a chemical vapor deposition reaction chamber comprising: (a) a chamber having at least one liquid precursor supply inlet and at least one vapor outlet; (b) an ultrasonic nozzle for ultrasonically converting said at least one liquid precursor into an atomized mist within said chamber; (c) a heated contact surface having a high thermal conductivity and high specific heat in order to obtain a uniform temperature distribution across said heated contact surface for vaporizing substantially all of said atomized mist by direct contact within said chamber, whereby a vapor can be supplied from said at least one vapor outlet; (d) heating means for heating said heated contact surface; and (e) temperature control means for maintaining the temperature of said heated contact surface at a predetermined temperature for vaporizing said atomized mist, whereby the temperature of said heated contact surface is independent of the temperature of said atomized mist.
Claim 48
Dependent Claim
38 words
The apparatus of claim 43 wherein said chamber includes inner walls, and including gas curtain means for introducing a curtain of gas into said chamber for preventing said atomized mist from contacting said inner walls of said chamber.
Claim 49
Dependent Claim
33 words
The apparatus of claim 43 wherein said heated contact surface has a predetermined porosity, pore size and high surface area sufficient to vaporize substantially all of said atomized mist by direct contact therewith.
Claim 50
Dependent Claim
30 words
The apparatus of claim 45 wherein said surface area of said heated contact surface is between about 500 m 2 /m 3 and about 7500 m 2 /m 3 .
Claim 51
Dependent Claim
36 words
The apparatus of claim 43, wherein said chamber includes a jacket surrounding said heating means and associated with said carrier gas means for preheating said carrier gas prior to introduction proximate to said heated contact surface.
Claim 52
Dependent Claim
158 words
A liquid vaporizer apparatus for use in connection with chemical vapor deposition processes comprising: (a) a chamber having at least one liquid precursor supply inlet and at least one vapor outlet; (b) an ultrasonic nozzle for converting said at least one liquid precursor into an atomized mist within said chamber; (c) a heated contact surface disposed perpendicularly between said ultrasonic nozzle and said at least one vapor outlet for preventing said atomized mist from exiting said at least one vapor outlet without contacting said heated contact surface for vaporizing substantially all of said atomized mist by direct contact with said heated contact surface within said chamber, whereby a vapor can be supplied from said at least one vapor outlet; and (d) carrier gas means for introducing a heated carrier gas proximate to said heated contact surface so as to avoid contacting said heated carrier gas with said atomized mist and mix said vapor with said heated carrier gas.
Claim 53
Dependent Claim
158 words
A liquid vaporizer apparatus for use in connection with chemical vapor deposition processes comprising: (a) a chamber having at least one liquid precursor supply inlet and at least one vapor outlet; (b) an ultrasonic nozzle for converting said at least one liquid precursor into an atomized mist within said chamber; (c) a heated contact surface disposed perpendicularly between said ultrasonic nozzle and said at least one vapor outlet for preventing said atomized mist from exiting said at least one vapor outlet without contacting said heated contact surface for vaporizing substantially all of said atomized mist by direct contact with said heated contact surface within said chamber, whereby a vapor can be supplied from said at least one vapor outlet; and (d) carrier gas means for introducing a heated carrier gas proximate to said heated contact surface so as to avoid contacting said heated carrier gas with said atomized mist and mix said vapor with said heated carrier gas.
Claim 54
Dependent Claim
55 words
The apparatus of claim 48 wherein said chamber includes inner walls, and including gas curtain means for introducing a curtain of unheated gas into said chamber for preventing said atomized mist from contacting said inner walls of said chamber and for preventing vaporization of said atomized mist prior to contact with said heated contact surface.
Claim 55
Dependent Claim
16 words
The apparatus of claim 48 including cooling means within said chamber for cooling said ultrasonic nozzle.
Claim 56
Independent Claim
94 words
A method of vaporizing a liquid precursor for use in a chemical vapor deposition process comprising the steps of: (a) providing a liquid precursor to an ultrasonic nozzle within a chamber; (b) ultrasonically atomizing said precursor into an atomized mist; (c) vaporizing substantially all of said atomized mist into a vapor by contacting said atomized mist with a heated contact surface; and (d) delivering said atomized mist to said heated contact surface by means of an unheated gas whereby premature vaporizing of said atomized mist prior to contacting said heated contact surface is avoided.
Claim 57
Independent Claim
94 words
A method of vaporizing a liquid precursor for use in a chemical vapor deposition process comprising the steps of: (a) providing a liquid precursor to an ultrasonic nozzle within a chamber; (b) ultrasonically atomizing said precursor into an atomized mist; (c) vaporizing substantially all of said atomized mist into a vapor by contacting said atomized mist with a heated contact surface; and (d) delivering said atomized mist to said heated contact surface by means of an unheated gas whereby premature vaporizing of said atomized mist prior to contacting said heated contact surface is avoided.
Claim 58
Dependent Claim
31 words
The method of claim 51 wherein said unheated gas comprises a curtain gas surrounding said atomized mist so as to prevent said atomized mist from contacting the walls of said chamber.
Claim 59
Independent Claim
84 words
A method of vaporizing a liquid precursor for use in a chemical vapor deposition process comprising the steps of: (a) providing a liquid precursor including a solid material dissolved therein to an ultrafiltration nozzle within a chamber; (b) ultrasonically atomizing said liquid precursor into an atomized mist; and (c) vaporizing substantially all of said atomized mist into a vapor by contacting said atomized mist with a heated contact surface whereby both said liquid and solid portions of said atomized mist are substantially simultaneously vaporized.
Claim 60
Independent Claim
84 words
A method of vaporizing a liquid precursor for use in a chemical vapor deposition process comprising the steps of: (a) providing a liquid precursor including a solid material dissolved therein to an ultrafiltration nozzle within a chamber; (b) ultrasonically atomizing said liquid precursor into an atomized mist; and (c) vaporizing substantially all of said atomized mist into a vapor by contacting said atomized mist with a heated contact surface whereby both said liquid and solid portions of said atomized mist are substantially simultaneously vaporized.
References Cited (Backward Citations)
US1207664A
Cited
US1965144A
Cited
US2490547A
Cited
US2728321A
Cited
US2925329A
Cited
US2949900A
Cited
US3081946A
Cited
US3224677A
Cited
US4349723A
Cited
US4541564A
Cited
US4655393A
Cited
US5002928A
Cited
US4997677A
Cited
US4986216A
Cited
US5136975A
Cited
US5362328A
Cited
US5204314A
Cited
US5505782A
Cited
US5268034A
Cited
US5224202A
Cited
US5361800A
Cited
US5383970A
Cited
US5421895A
Cited
US5447568A
Cited
US5372754A
Cited
US5451260A
Cited
US5425810A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2001-11-09 | 2002-05-11 | 2002-11-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-11-09 | 2006-05-11 | 2006-11-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-11-09 | 2010-05-11 | 2010-11-10 | $7700.00 | Window Closed / Lapsed |