Removable gas injectors for use in chemical vapor deposition of aluminium oxide

Claim 2

A gas injector for use in chemical vapor deposition reactors that allows proper mixing of reactant gases comprising: an injector base fixed to a chemical vapor deposition chamber wall, said injector base having a plurality of axial passages for passing separate reactant gases from outside said chamber wall; a removable nozzle removably attached to said injector base, said removable nozzle having axial passages communicating with the axial passages of said injector base and a cross drilled hole pattern intercepting said axial passages for passing reactant gases into the reactor; and attachment means for aligning and removably attaching said nozzle to said injector base to form a gaseous leaktight seal between said nozzle and said base.

Claim 3

A gas injector as recited in claim 1 further comprising a baffle removably attached to an end of said removable nozzle projecting away from said injector base, said baffle sealing the axial passages in the removable nozzle and cooperating with the cross drilled hole pattern to distribute reactants with an equal flux into a mixing region of the reactor.

Claim 4

A gas injector as recited in claim 1 wherein said attachment means includes a locator pin for aligning said removable nozzle with said injector base and screws removably attaching said removable nozzle to said injector base.

Claim 5

A gas injector for use in chemical vapor deposition reactors comprising: an injector base attached to a wall of a reaction chamber; a removable nozzle to provide a gaseous leaktight seal to the injector base, said removable nozzle having a cross-drilled hole pattern that separately distributes a plurality of reactant gases to provide an equal flux into a mixing region of the reaction chamber of gases; a locator pin attached to said removable nozzle to insure correct alignment of said removable nozzle with said injector base; and a flow distribution baffle removably attached to said removable nozzle.

Claim 6

A gas injector for use in chemical vapor deposition reactors comprising: an injector base attached to a wall of a reaction chamber; a removable nozzle to provide a gaseous leaktight seal to the injector base, said removable nozzle having a cross-drilled hole pattern that separately distributes a plurality of reactant gases to provide an equal flux into a mixing region of the reaction chamber of gases; a locator pin attached to said removable nozzle to insure correct alignment of said removable nozzle with said injector base; and a flow distribution baffle removably attached to said removable nozzle.

Claim 7

A gas injector as recited in claim 4 wherein said injector base has axial passages for passing reactant gases from outside said chamber wall, said removable nozzle has axial passages communicating with the axial passages of said injector base, and said flow distribution baffle seals the axial passages in the removable nozzle and cooperates with the cross drilled hole pattern to distribute the reactants with an equal flux into the mixing region of the reactor.

Claim 8

A chemical vapor deposition reactor having gas injector that allows proper mixing of reactant gases within a reaction chamber of said reactor, said gas injector comprising: an injector base fixed to a chemical vapor deposition chamber wall, said injector base having a plurality of axial passages for passing separate reactant gases from outside said chamber wall; a removable nozzle removably attached to said injector base, said removable nozzle having axial passages communicating with the axial passages of said injector base and a cross drilled hole pattern intercepting said axial passages for passing reactant gases into the reactor; first attachment means for aligning and removably attaching said nozzle to said injector base to form a gaseous leaktight seal between said nozzle and said base; a flow distribution baffle removably attached to an end of said removable nozzle projecting within said reaction chamber, said flow distribution baffle sealing the axial passages in the removable nozzle and cooperating with the cross drilled hole pattern to distribute reactants with an equal flux into a mixing region of the reaction chamber.

Claim 9

A chemical vapor deposition reactor having gas injector that allows proper mixing of reactant gases within a reaction chamber of said reactor, said gas injector comprising: an injector base fixed to a chemical vapor deposition chamber wall, said injector base having a plurality of axial passages for passing separate reactant gases from outside said chamber wall; a removable nozzle removably attached to said injector base, said removable nozzle having axial passages communicating with the axial passages of said injector base and a cross drilled hole pattern intercepting said axial passages for passing reactant gases into the reactor; first attachment means for aligning and removably attaching said nozzle to said injector base to form a gaseous leaktight seal between said nozzle and said base; a flow distribution baffle removably attached to an end of said removable nozzle projecting within said reaction chamber, said flow distribution baffle sealing the axial passages in the removable nozzle and cooperating with the cross drilled hole pattern to distribute reactants with an equal flux into a mixing region of the reaction chamber.