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US5780902A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor device having LDD structure with pocket on drain side

Assignee: Longitude Semiconductor SARL
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Filing: 1996-12-06
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Granted: 1998-07-14
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Expires: 2016-12-06
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Abstract

Abstract A semiconductor device with an LDD structure type MOS transistor is fabricated by forming a gate electrode on a semiconductor layer of a first conductivity type and a source/drain region in the semiconductor layer, the source/drain region having a high impurity concentration region and a low impurity concentration region of a second conductivity type. A pocket of the first conductivity type is formed in contact with the low impurity concentration region only on a drain region side and immediately under the low concentration region of the second conductivity type. The pocket formed only on the drain side can suppress the short channel effect and also the hot carrier generation without lowering the current capacity on the source side where no pocket is present.

Inventors

  • 👤 Toshio Komuro

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 05:29
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/10; H10D62/17; H10D62/351; H10D62/357; H10D62/364; H10D62/371; H10D30/00; H10D30/01; H10D30/021; H10D30/0221; H10D30/60; H10D30/601; H10D30/603; H10P; H10P30/00; H10P30/20; H10P30/22; H10P30/221; H10P30/222

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 88 words
A semiconductor device comprising: an LDD structure type MOS transistor including a gate electrode formed on a semiconductor layer of a first conductivity type; a source/drain region formed in said semiconductor layer and having a high impurity concentration region and a low impurity concentration region of a second conductivity type; and a low impurity concentration region pocket of said first conductivity type formed only on a drain region side, said pocket being effective to suppress short channel effect as well as hot carrier generation, without reducing current capacity.
Claim 2
Dependent Claim 88 words
A semiconductor device comprising: an LDD structure type MOS transistor including a gate electrode formed on a semiconductor layer of a first conductivity type; a source/drain region formed in said semiconductor layer and having a high impurity concentration region and a low impurity concentration region of a second conductivity type; and a low impurity concentration region pocket of said first conductivity type formed only on a drain region side, said pocket being effective to suppress short channel effect as well as hot carrier generation, without reducing current capacity.
Claim 3
Dependent Claim 24 words
A semiconductor device according to claim 1, wherein said pocket is disposed immediately under said low impurity concentration region of the second conductivity type.
Claim 4
Dependent Claim 33 words
A semiconductor device according to claim 1, in which said pocket extends at least partly into a region between said low impurity concentration region of the second conductivity type and a channel region.
Claim 5
Dependent Claim 33 words
A semiconductor device according to claim 2, in which said pocket extends at least partly into a region between said low impurity concentration region of the second conductivity type and a channel region.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-07-13 2002-01-12 2002-07-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-07-13 2006-01-12 2006-07-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2009-07-13 2010-01-12 2010-07-14 $7700.00 Window Closed / Lapsed

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