US5747113A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of chemical vapor deposition for producing layer variation by planetary susceptor rotation
Assignee: Individual
•
Filing: 1996-07-29
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Granted: 1998-05-05
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Expires: 2016-07-29
Abstract
Abstract A chemical vapor deposition process for depositing at least one layer of material onto a plurality of substrates is disclosed, which comprises providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two significantly different rotation rates for said secondary susceptors, and rotating said secondary susceptors simultaneouly at said two or more rotation rates during at least a portion of depositing said layer, wherein at least one of said two or more signicantly different rotation rates is not zero.
Inventors
- 👤 Charles Su-Chang Tsai
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:06
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/4583; C23C16/4584
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
96 words
A chemical vapor deposition method for depositing at least one layer of material onto a plurality of substrates, comprising the steps of: providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two significantly different rotation rates for said secondary susceptors, and rotating said secondary susceptors simultaneously at said two or more rotation rates during at least a portion of depositing said layer, wherein at least one of said two or more significantly different rotation rates is not zero.
Claim 2
Dependent Claim
96 words
A chemical vapor deposition method for depositing at least one layer of material onto a plurality of substrates, comprising the steps of: providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two significantly different rotation rates for said secondary susceptors, and rotating said secondary susceptors simultaneously at said two or more rotation rates during at least a portion of depositing said layer, wherein at least one of said two or more significantly different rotation rates is not zero.
Claim 3
Dependent Claim
33 words
A method according to claim 1, wherein said differeny rotation rates for said secondary susceptors result in different thicknesses and/or compositions associated with at least one of said layer deposited on said substrates.
Claim 4
Dependent Claim
24 words
A method according to claim 1, wherein one or more of said rotation rates of said secondary susceptors is changed during the deposition process.
Claim 5
Dependent Claim
24 words
A method according to claim 2, wherein one or more of said rotation rates of said secondary susceptors is changed during the deposition process.
Claim 6
Dependent Claim
96 words
A chemical vapor deposition method for depositing a plurality of layers of material onto a plurality of substrates, comprising the steps of: providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two independent rotation rates for said secondary susceptors, and rotating said secondary susceptors simultaneously at two or more significantly different rotation rates during at least a portion of depositing said layers, wherein at least one of said two or more significantly different rotation rates is not zero.
Claim 7
Dependent Claim
96 words
A chemical vapor deposition method for depositing a plurality of layers of material onto a plurality of substrates, comprising the steps of: providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two independent rotation rates for said secondary susceptors, and rotating said secondary susceptors simultaneously at two or more significantly different rotation rates during at least a portion of depositing said layers, wherein at least one of said two or more significantly different rotation rates is not zero.
Claim 8
Dependent Claim
33 words
A method according to claim 5, wherein said different rotation rates for said secondary susceptors result in different thicknesses and/or compositions associated with at least one of said layers deposited on said substrates.
Claim 9
Dependent Claim
29 words
A method according to claim 5, including the further step of: rotating said secondary susceptors simultaneously at same rotation rate during at least a portion of depositing said layers.
Claim 10
Dependent Claim
29 words
A method according to claim 6, including the further step of: rotating said secondary susceptors simultaneously at same rotation rate during at least a portion of depositing said layers.
Claim 11
Dependent Claim
24 words
A method according to claim 5, wherein one or more of said rotation rates of said secondary susceptors is changed during the deposition process.
Claim 12
Dependent Claim
24 words
A method according to claim 6, wherein one or more of said rotation rates of said secondary susceptors is changed during the deposition process.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-05-04 | 2001-11-03 | 2002-05-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-05-04 | 2005-11-03 | 2006-05-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-05-04 | 2009-11-03 | 2010-05-05 | $7700.00 | Window Closed / Lapsed |