US5631773A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Image projection method and semiconductor device manufacturing method using the same
Assignee: Canon Inc
•
Filing: 1995-06-07
•
Granted: 1997-05-20
•
Expires: 2015-06-07
Abstract
Abstract An edge emphasis type phase shift reticle is illuminated obliquely, and zeroth order diffraction light and first order diffraction light caused by a fine pattern of the reticle and having substantially the same intensity are incident and distributed on a pupil of a projection optical system, symmetrically with respect to a predetermined axis, whereby the fine pattern is imaged with use of the zeroth order diffraction light and first order diffraction light.
Inventors
- 👤 Akiyoshi Suzuki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 15:38
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70591; G02; G02B; G02B27/00; G02B27/42; G02B27/46; G02B27/50; G02B27/52; G03F7/70058; G03F7/70091; G03F7/701; G03F7/70108; G03F7/70133; G03F7/70216; G03F7/70283
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
61 words
A projection exposure apparatus comprising: illumination means for illuminating a reticle; a projection optical system for projecting a pattern of the reticle onto a wafer; first detecting means for detecting a light intensity distribution on an image plane of said projection optical system; and second detecting means for detecting a light intensity distribution on a pupil of said projection optical system.
Claim 2
Dependent Claim
61 words
A projection exposure apparatus comprising: illumination means for illuminating a reticle; a projection optical system for projecting a pattern of the reticle onto a wafer; first detecting means for detecting a light intensity distribution on an image plane of said projection optical system; and second detecting means for detecting a light intensity distribution on a pupil of said projection optical system.
Claim 3
Dependent Claim
77 words
An apparatus according to claim 1, wherein said first detecting means comprises a movable stage for carrying the wafer and a first detecting unit mounted on said stage, said first detecting unit comprising a pinhole and a photodetector for detecting light through the pinhole, and wherein said second detecting means comprises a second detecting unit mounted on said stage, said second detecting unit comprising a pinhole and an array of photodetectors for receiving light from said pinhole.
Claim 4
Dependent Claim
56 words
An apparatus according to claim 2, wherein said illumination means comprises a fly's eye lens for receiving light from a light source, and an aperture stop disposed adjacent to a light exit surface of said fly's eye lens, wherein light from said fly's eye lens passing through an opening of said aperture stop irradiates the reticle.
Claim 5
Dependent Claim
18 words
An apparatus according to claim 3, wherein said aperture stop has four openings formed off an optical axis.
Claim 6
Dependent Claim
20 words
An apparatus according to claim 3, wherein said aperture stop has a plurality of openings formed off an optical axis.
Claim 7
Dependent Claim
61 words
An apparatus according to claim 3, wherein said illumination means comprises a first aperture stop having an opening formed off an optical axis, and a second aperture stop having an opening formed on the optical axis, wherein one of the first and second aperture stops is selectively supplied and placed adjacent to the light exit surface of said fly's eye lens.
Claim 8
Dependent Claim
42 words
An apparatus according to claim 6, wherein said illuminating means comprises first and second optical members, selectively insertable between said light source and said fly's eye lens, for changing the light intensity distribution of the light incident on the fly's eye lens.
Claim 9
Dependent Claim
15 words
An apparatus according to claim 7, wherein said optical members and said apertures are interrelated.
Claim 10
Dependent Claim
34 words
An apparatus according to claim 8, wherein said illuminating means comprises correcting means for correcting illuminance unevenness on the image plane, and said correcting means is interrelated with said optical members and said apertures.
Claim 11
Independent Claim
34 words
A device manufacturing method which comprises a printing step for printing a device pattern on a substrate by use of a projection exposure apparatus as recited in any one of claims 1 through 9.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-05-19 | 2000-11-18 | 2001-05-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-05-19 | 2004-11-18 | 2005-05-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-05-19 | 2008-11-18 | 2009-05-20 | $7700.00 | Window Closed / Lapsed |