Patent US5600165A successfully refreshed from Google Patents.
US5600165A
Expired / Lapsed
US
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Semiconductor device with antireflection film
Assignee: Sony Corp
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Filing: 1995-07-26
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Granted: 1997-02-04
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Expires: 2015-07-26
Abstract
Abstract A semiconductor device in which patterning is effected using a silicon oxynitride (SiON) based thin film as an anti-reflection film and in which electrical properties are prohibited from being deteriorated by hydrogen contained in the SiON based thin film. The semiconductor device has a substrate, a gate insulating film formed on the surface of the substrate, a gate electrode formed on the gate insulating film, and a first antireflection film having a pattern in common with the gate electrode. The semiconductor device also has a hydrogen permeation prohibiting film formed between the gate insulating film and the first antireflection film. The first antireflection film contains hydrogen and is formed on the gate electrode.
Inventors
- 👤 Masanori Tsukamoto
- 👤 Tetsuo Gocho
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 21:04
CPC Classifications
H; H10; H10D; H10D64/00; H10D64/01; H10D64/013; H10D64/01302; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10P76/2043
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
69 words
A semiconductor device comprising: a substrate; a gate insulating film formed on the surface of said substrate; a gate electrode formed on said gate insulating film; a first antireflection film having a pattern in common with said gate electrode, said first antireflection film containing hydrogen and being formed on said gate electrode; and a hydrogen permeation prohibiting film formed between said gate insulating film and said first antireflection film.
Claim 2
Dependent Claim
69 words
A semiconductor device comprising: a substrate; a gate insulating film formed on the surface of said substrate; a gate electrode formed on said gate insulating film; a first antireflection film having a pattern in common with said gate electrode, said first antireflection film containing hydrogen and being formed on said gate electrode; and a hydrogen permeation prohibiting film formed between said gate insulating film and said first antireflection film.
Claim 3
Dependent Claim
21 words
The semiconductor device as claimed in claim 1, wherein said gate insulating film is formed of a silicon oxide based material.
Claim 4
Dependent Claim
19 words
The semiconductor device as claimed in claim 1, wherein said first antireflection film is a silicon oxynitride based film.
Claim 5
Dependent Claim
46 words
The semiconductor device as claimed in claim 1, further comprising an upper metallization layer formed on said substrate, and a second antireflection film formed on said upper metallization layer, said second antireflection film containing hydrogen and having a pattern in common with said upper metallization layer.
Claim 6
Dependent Claim
21 words
The semiconductor device as claimed in claim 4, wherein said second antireflection film is formed of a silicon oxynitride based material.
Claim 7
Dependent Claim
21 words
The semiconductor device as claimed in claim 3, wherein said hydrogen permeation prohibiting film is formed for covering said gate electrode.
Claim 8
Dependent Claim
28 words
The semiconductor device as claimed in claim 6, wherein said hydrogen permeation prohibiting film is an interlayer insulating film between the gate electrode and the upper metallization layer.
Claim 9
Dependent Claim
27 words
The semiconductor device as claimed in claim 1, wherein said hydrogen permeation prohibiting film is a silicon nitride based film formed by low-pressure chemical vapor deposition method.
Claim 10
Dependent Claim
26 words
The semiconductor device as claimed in claim 1, wherein said hydrogen permeation prohibiting film is a silicon oxide based film formed by the plasma CVD method.
Claim 11
Dependent Claim
27 words
The semiconductor device as claimed in claim 1, wherein said hydrogen permeation prohibiting film is a titanium film and is formed as part of said gate electrode.
Claim 12
Dependent Claim
28 words
The semiconductor device as claimed in claim 1, wherein said hydrogen permeation prohibiting film is a titanium silicide film and is formed as part of said gate electrode.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-02-04 | 2000-08-05 | 2001-02-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-02-04 | 2004-08-05 | 2005-02-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-02-04 | 2008-08-05 | 2009-02-04 | $7700.00 | Window Closed / Lapsed |