US5597622A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for the production of a reflection-reducing coating on lenses
Assignee: Balzers und Leybold Deutschland Holding AG
•
Filing: 1994-01-04
•
Granted: 1997-01-28
•
Expires: 2014-01-04
Abstract
Abstract The invention relates to a process of providing a scratch-resistant coating for a lens made of an optical material comprising synthetics. In order for the synthetic material, for example a CR 39, to be protected against scratches, a very thin adhesion layer of SiO is applied first, and is subsequently provided with a thick SiO 2 layer. Both layers are deposited in a vacuum chamber which comprises both a thermal vaporizer for vaporizing the coating materials and a plasma source for irradiating the substrate simultaneously with application of the vaporized coating material.
Inventors
- 👤 Alfons Zoller
- 👤 Karl Matl
- 👤 Rainer Gotzelmann
- 👤 Gunther Sauer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:35
CPC Classifications
G; G02; G02B; G02B1/00; G02B1/10; G02B1/11; G02B1/113; G02B1/115; G02B1/111; G02B1/14
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
159 words
Process for applying thin layers onto a synthetic substrate, said process comprising arranging at least one synthetic substrate in a substrate holder, vaporizing SiO to form layer of SiO on said substrate, said layer having a thickness of one molecule to 50 nm, concurrently with the vaporizing of SiO, irradiating the substrate and the layer of SiO being formed with a first plasma, following formation of said layer of SiO, vaporizing SiO 2 to form a layer of SiO 2 at least 500 nm thick, concurrently with the vaporizing of SiO 2 , irradiating the layer of SiO and the layer of SiO 2 being formed with a second plasma, and concurrently with the vaporizing of SiO 2 , varying process parameters including at least one of plasma power, gas pressure, and coating rate so that the layer of SiO 2 has a hardness gradient wherein the SiO 2 has a hardness which increases from the SiO layer outward.
Claim 2
Dependent Claim
159 words
Process for applying thin layers onto a synthetic substrate, said process comprising arranging at least one synthetic substrate in a substrate holder, vaporizing SiO to form layer of SiO on said substrate, said layer having a thickness of one molecule to 50 nm, concurrently with the vaporizing of SiO, irradiating the substrate and the layer of SiO being formed with a first plasma, following formation of said layer of SiO, vaporizing SiO 2 to form a layer of SiO 2 at least 500 nm thick, concurrently with the vaporizing of SiO 2 , irradiating the layer of SiO and the layer of SiO 2 being formed with a second plasma, and concurrently with the vaporizing of SiO 2 , varying process parameters including at least one of plasma power, gas pressure, and coating rate so that the layer of SiO 2 has a hardness gradient wherein the SiO 2 has a hardness which increases from the SiO layer outward.
Claim 3
Dependent Claim
19 words
Process as in claim 1 wherein said plasma power is increased over time by increasing the plasma discharge current.
Claim 4
Dependent Claim
18 words
Process as in claim 2 wherein said plasma discharge current is increased from 10 amp to 100 amp.
Claim 5
Dependent Claim
15 words
Process as in claim 1 wherein said gas pressure is decreased from 8×10 -4 mbar.
Claim 6
Dependent Claim
17 words
Process as in claim 1 wherein said coating rate is decreased from 10 nm/s to 0.1 nm/s.
Claim 7
Dependent Claim
21 words
Process as in claim 1 wherein said layer of SiO 2 is formed within a time of 5 to 30 minutes.
Claim 8
Dependent Claim
31 words
Process as in claim 1 wherein said process parameters are varied so that said layer of SiO 2 is formed with said hardness gradient from 500N/mm 2 to 4500N/mm 2 .
Claim 9
Dependent Claim
50 words
Process as in claim 1 wherein during formation of said layer of SiO 2 , the discharge current increases from 10 A to 100 A, the gas pressure decreases from 8×10 -4 mbar, and the coating rate decreases from 10 nm/s to 0.1 nm/s, all within 5 to 30 minutes.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-01-28 | 2000-07-29 | 2001-01-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-01-28 | 2004-07-29 | 2005-01-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-01-28 | 2008-07-29 | 2009-01-28 | $7700.00 | Window Closed / Lapsed |