US5085904A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Barrier materials useful for packaging
Assignee: EIDP Inc
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Filing: 1990-04-20
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Granted: 1992-02-04
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Expires: 2010-04-20
Abstract
Abstract Multilayer structures suitable for food packaging is provided, wherein barrier layers of SiO and SiO 2 are successively vacuum deposited on a resin substrate such as PET film. This combination of silicon oxide layers provides economical, color-free, microwaveable packaging. Barrier properties of the packaging after retorting can be improved by incorporation of a dopant of metallic material in the SiO 2 layer.
Inventors
- 👤 Gedeon I. Deak
- 👤 Scott C. Jackson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 13:57
CPC Classifications
B; B32; B32B; B32B37/00; B32B37/12; B32B38/00; C; C23; C23C; C23C14/00; C23C14/06; C23C14/10; Y; Y10; Y10T; Y10T428/00; Y10T428/13; Y10T428/1352; Y10T428/1355; Y10T428/1359; Y10T428/1379; Y10T428/31504; Y10T428/31725; Y10T428/31786
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
46 words
A multilayer structure comprising a resin substrate of polyester or polyamide, a vacuum deposited layer of SiO of about 10 to 75 nm thickness on said substrate, and a vacuum deposited layer of SiO 2 of at least about 20 nm thickness on said SiO layer.
Claim 2
Dependent Claim
46 words
A multilayer structure comprising a resin substrate of polyester or polyamide, a vacuum deposited layer of SiO of about 10 to 75 nm thickness on said substrate, and a vacuum deposited layer of SiO 2 of at least about 20 nm thickness on said SiO layer.
Claim 3
Dependent Claim
33 words
The multilayer structure of claim 1 wherein the thickness of said SiO layer is about 10 to 50 nm and the thickness of said SiO 2 layer is about 50 to 350 nm.
Claim 4
Dependent Claim
26 words
The multilayer structure of claim 1 wherein said SiO layer has an atomic ratio of oxygen to silicon in said layer of from 0.6:1 to 1.4:1.
Claim 5
Dependent Claim
28 words
The multilayer structure of claim 1 wherein said SiO 2 layer contains an effective amount of dopant to improve its barrier properties upon retorting of said multilayer structure.
Claim 6
Dependent Claim
62 words
The multilayer structure of claim 4 wherein said dopant is a metallic material selected from the group consisting of Ti, Zr, Zn, Al, In, Pb, W, Cu, Sn, Cr, Fe, Mn, Sb, Co, Ba, and Mg, and mixtures thereof, and the amount thereof present in said SiO 2 layer is about 0.5 to 30% based on the total weight of the layer.
Claim 7
Dependent Claim
35 words
The multilayer structure of claim 1 wherein said dopant is a metallic material is selected from the group consisting of Ti, Zr, Zn, Al, In, Pb, W, Cu, Sn, Cr, Fe, Mn, Sb, and Co.
Claim 8
Dependent Claim
23 words
The multilayer structure of claim 4 wherein said dopant is a metallic material is selected from the group consisting of Sn and Cu.
Claim 9
Dependent Claim
17 words
The multilayer structure of claim 1 and additionally a protective plastic layer on said SiO 2 layer.
Claim 10
Dependent Claim
21 words
The multilayer structure of claim 1 having an oxygen transmission rate (OTR) of less than about 7 ccm/ 2 Day Atm.
Claim 11
Dependent Claim
21 words
The multilayer structure of claim 1 having an oxygen transmission rate (OTR) of less than about 3 cc/m 2 Day Atm.
Claim 12
Dependent Claim
18 words
The multilayer structure of claim 10 wherein said oxygen transmission rate is present both before and after retorting.
Claim 13
Dependent Claim
23 words
The multilayer structure of claim 1 wherein said resin substrate is a film having a surface roughtness of less than about 50 nm.
Claim 14
Dependent Claim
20 words
The multilayer structure of claim 12 wherein said film has a surface roughness of no greater than about 10 nm.
Claim 15
Dependent Claim
12 words
The multilayer structure of claim 1 in the form of a film.
Claim 16
Dependent Claim
12 words
The multilayer structure of claim 1 in the form of a container.
Claim 17
Dependent Claim
72 words
A process for forming a barrier structure from a resin substrate of polyester or polyamide polymer comprising vacuum depositing a layer of SiO of about 10 to 75 nm thickness on said resin substrate and vacuum depositing a layer of SiO 2 of at least about 20 nm thickness on said SiO layer, the resultant multilayer structure having an oxygen transmission rate (OTR) of less than about 7 cc/m 2 Day Atm.
Claim 18
Dependent Claim
72 words
A process for forming a barrier structure from a resin substrate of polyester or polyamide polymer comprising vacuum depositing a layer of SiO of about 10 to 75 nm thickness on said resin substrate and vacuum depositing a layer of SiO 2 of at least about 20 nm thickness on said SiO layer, the resultant multilayer structure having an oxygen transmission rate (OTR) of less than about 7 cc/m 2 Day Atm.
Claim 19
Dependent Claim
46 words
The process of claim 16 wherein metal dopant is vacuum deposited along with the vacuum deposition of said layer of SiO 2 so that said metal dopant is incorporated in said SiO 2 layer in effective amount to provide said OTR after retorting of said structure.
Claim 20
Dependent Claim
16 words
The process of claim 16 wherein said resin substrate is in the form of a film.
Claim 21
Dependent Claim
16 words
The process of claim 16 wherein said resin substrate is in the form of a container.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-02-03 | 1995-08-05 | 1996-02-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-02-03 | 1999-08-05 | 2000-02-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-02-03 | 2003-08-05 | 2004-02-04 | $7700.00 | Window Closed / Lapsed |